EBPG 5200: 100 kV Electron Beam Lithography: Difference between revisions

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* [https://caltech.box.com/s/55zji9vfs8kuxl0aye1sw1iy8xi0rd9c Information Archive Beam]
* [https://caltech.box.com/s/55zji9vfs8kuxl0aye1sw1iy8xi0rd9c Information Archive Beam]
* [https://caltech.box.com/s/afdyjxjo54l1v2ukubon5ntin73aflc1 Lindgren MACS SOP]
* [https://caltech.box.com/s/afdyjxjo54l1v2ukubon5ntin73aflc1 Lindgren MACS SOP]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l SAEHT not initialized]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l SAEHT not initialized SOP]
* [https://caltech.box.com/s/tf87blqopht0y51hy4agn2fsfjh7wot9 EBPG Emergency air cylinder SOP]
* [https://caltech.box.com/s/tf87blqopht0y51hy4agn2fsfjh7wot9 EBPG Emergency air cylinder SOP]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l EBPG SAEHT no route to host recovery ]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l EBPG SAEHT no route to host recovery SOP]
* [https://caltech.box.com/s/1fe4803rl38fa7a7w50r77c4nf64818l EBPG hotbox slave communications fault recovery SOP]


===== Video Tutorials =====
===== Video Tutorials =====

Revision as of 04:27, 7 May 2019

EBPG 5200
File:EBPG-5200-Research-Image.jpg
Instrument Type Lithography
Techniques Electron Beam Lithography
Staff Manager Guy A. DeRose, PhD
Staff Email derose@caltech.edu
Staff Phone 626-395-3423
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B233C Steele
Lab Phone 626-395-1531 /1540
Manufacturer Raith Lithography BV
Model {{{Model}}}
EBPG-5200-Instrument-Image.jpg

Description

The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.

Opertional Applications
  • Non-aligned electron beam lithography
  • Aligned (AKA direct-write) electron beam lithography
Scientific / technical Applications
  • Nanophotonics
  • Nano-optics
  • Waveguides

Resources

SOPs & Troubleshooting
Sample Prep and Writing SOPs
Troubleshooting SOPs
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals

Specifications

Manufacturer Specifications
Specifications
  • Voltage Range: 20, 50 or 100 kV
  • Current Range: 50 pA - >200 nA
  • Main Field size: Up to 1mm x 1mm
  • Main Field resolution: 20 bit
  • Maximum writing frequency: 100 MHz
  • Aperture Sizes: 200um, 300um, 400um
  • etc.
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