EBPG 5000+: 100 kV Electron Beam Lithography: Difference between revisions
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* [https://caltech.box.com/s/ef3zou8b9xk597jxs7bs1s1yck1lo5cu App Note: Writing Time Optimization (Caltech-only access)] | * [https://caltech.box.com/s/ef3zou8b9xk597jxs7bs1s1yck1lo5cu App Note: Writing Time Optimization (Caltech-only access)] | ||
* [https://caltech.box.com/s/c8hsz4opsgb0j8nmqq48v64wnlxth5l5 App Note: Formulas in Beamer Modules (Caltech-only access)] | * [https://caltech.box.com/s/c8hsz4opsgb0j8nmqq48v64wnlxth5l5 App Note: Formulas in Beamer Modules (Caltech-only access)] | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/g3haulnez2ls6r2ezklcjei7jl8nx03b App Note: Multipass Exposure (Caltech-only access)] | ||
* [https://caltech.box.com/s/yh1ku02vjnf3ew8uvmjbyn8hv5t0em72 App Note: Mixed Export Options (Caltech-only access)] | * [https://caltech.box.com/s/yh1ku02vjnf3ew8uvmjbyn8hv5t0em72 App Note: Mixed Export Options (Caltech-only access)] | ||
* [https://caltech.box.com/s/9wbovly55qu2plfmoian6a7ocbw7pk2h App Note: GPF Formatter (Caltech-only access)] | * [https://caltech.box.com/s/9wbovly55qu2plfmoian6a7ocbw7pk2h App Note: GPF Formatter (Caltech-only access)] | ||
Revision as of 21:00, 31 August 2023
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Description
The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).
Operational Applications
- Non-aligned electron beam lithography
- Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
Equipment Status
- LabRunr Equipment Status (Select EBPG 5000+ from the dropdown menu)
General SOPs
- EBPG reservation and use policy (Updated 1 October 2022)
- EBPG SOP
- User's Guide to the EBPG pg computer desktop
- EBPG Troubleshooting Guide
- Remote EBPG access via HP Remote Graphics Server (Caltech-Only)
Training materials
- EBPG Training Lecture video series (Caltech-only access)
- EBPG Pre-exposure Walkthrough procedure (video)
- EBPG System Introduction main room training video
- EBPG System Introduction service chase overview training video
- EBPG System Introduction UPS and alignment microscopes training video
- EBPG 5000+ Airlock Operations video (Caltech-only access)
- EBPG 5000+ Sample Mounting video (Caltech-only access)
- EBPG 5000+ Sample Unmounting video (Caltech-only access)
Sample Prep and Writing SOPs
- EBPG Preparing pieces for exposure on 5000+ SOP
- EBPG 5000+ Holder 5 adapter plate SOP
- EBPG 5000+ Holder 8 SOP
- EBPG 5000+ Raith screwdriver SOP
- EBPG High Resolution Mode SOP
- EBPG Preparing sample for exposure SOP
- EBPG Beam Adjustment SOP
- EBPG Marker definition Procedure
- EBPG Adjust Aperture SOP
- EBPG Aperture changers SOP
- EBPG JOY Marker Procedure
- EBPG Disable marker height check SOP
- EBPG Holderfix SOP
- EBPG Remote Access SOP (log into LabRunr and download SOP from EBPG 5000+ page)
Advanced Troubleshooting SOPs
- Information Archive Beam
- EBPG BEAMS crash recovery SOP (run before a coldstart if BEAMS freezes)
- BEAMS $pg shutdown / coldstart SOP
- EBPG Procedure to degauss the final lens (run after every coldstart)
- Beam file Recovery SOP
- Lindgren MACS SOP
- EBPG Emergency air cylinder SOP
- EBPG Unlocking the stage SOP
- EBPG SAEHT not initialized SOP
- EBPG SAEHT no route to host recovery SOP
- EBPG hotbox slave communications fault recovery SOP
- EBPG FEG recovery and new beam table SOP
- Raith Common errors and solutions with aligned writing SOP
- EBPG 5000+ Troubleshooting Loader errors
- EBPG 5000+ Reattach alignment microscope coupling spring video (Caltech-only access)
Data Preparation Resources
- SOP: KNI Introduction to Layout BEAMER
- BEAMER Tutorial – Fracturing circles and angled features
- App Note: 3D Surface Proximity Effect Correction (Caltech-only access)
- App Note: Fracture Optimization (Caltech-only access)
- App Note: Writing Time Optimization (Caltech-only access)
- App Note: Formulas in Beamer Modules (Caltech-only access)
- App Note: Multipass Exposure (Caltech-only access)
- App Note: Mixed Export Options (Caltech-only access)
- App Note: GPF Formatter (Caltech-only access)
- Webinar Series - BEAMER Training
- Webinar Series: Proximity Effect in E-Beam Lithography
- Webinar: e-Beam Lithography Simulation
- March 2020 Genisys BEAMeeting at Caltech
- June 2020 Genisys BEAMeeting Layout Beamer training video
- September 2020 Genisys BEAMeeting MNE (virtual) Presentations and Training
- February - April 2021 Layout Beamer Training Webinars (Caltech-only access)
- GenIsys BEAMeeting presentations and notes (Caltech-only access)
Lithography Process Information
- Bi-Layer PMMA Resist Spinning Recipe
- Recipe to prepare PMMA developer (MIBK:IPA 1:3)
- MAN Resist Data Sheet
- PMMA Resist Data Sheet
- SML Resist Data Sheet
- ZEP Resist Data Sheet
- ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
- HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
- Supramolecular Resist processing (Caltech-only access)
- Laurell Spinner cleaning SOP
- New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)
Manufacturer Manuals
- Raith cjob manual (Caltech-only access)
- Layout Beamer Release Notes (Caltech-only access)
- Layout Beamer Manual (Caltech-only access)
- CEBUS 2021 Presentations (Caltech-only access)
- Laurell Spin Coater Manual (log into LabRunr and download Manual from EBPG 5000+ page)
- Torrey Pines HS30A Programmable hotplate manual
Specifications
Manufacturer Specifications and Manuals
- Raith cjob manual (Caltech-only access)
- Layout Beamer Release Notes (Caltech-only access)
- Layout Beamer Manual (Caltech-only access)
Specifications
- Voltage Range: 20, 50 or 100 kV
- Current Range: 50 pA to 200 nA
- Main Field Size: Up to 1 mm x 1 mm
- Main Field Resolution: 20 bit
- Maximum Writing Frequency: 100 MHz
- Aperture Sizes: 300μm, 300μm, 400μm
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography