EBPG 5000+: 100 kV Electron Beam Lithography: Difference between revisions
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* [https://caltech.box.com/s/ji4zqki1wps2anyjy45on7cp0szvb3yk Supramolecular Resist processing (Caltech-only access)] | * [https://caltech.box.com/s/ji4zqki1wps2anyjy45on7cp0szvb3yk Supramolecular Resist processing (Caltech-only access)] | ||
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP] | * [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP] | ||
* [https://caltech.box.com/s/ybozdh0es8nzd6ujlx28lk7cnimlxwfm New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)] | |||
===== Manufacturer Manuals ===== | ===== Manufacturer Manuals ===== | ||
Revision as of 04:58, 5 April 2023
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Description
The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).
Operational Applications
- Non-aligned electron beam lithography
- Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
Equipment Status
- LabRunr Equipment Status (Select EBPG 5000+ from the dropdown menu)
General SOPs
- EBPG reservation and use policy (Updated 1 October 2022)
- EBPG SOP
- User's Guide to the EBPG pg computer desktop
- EBPG Troubleshooting Guide
- Remote EBPG access via HP Remote Graphics Server (Caltech-Only)
Training materials
- EBPG Training Lecture video series (Caltech-only access)
- EBPG Pre-exposure Walkthrough procedure (video)
- EBPG System Introduction main room training video
- EBPG System Introduction service chase overview training video
- EBPG System Introduction UPS and alignment microscopes training video
- EBPG 5000+ Airlock Operations video (Caltech-only access)
- EBPG 5000+ Sample Mounting video (Caltech-only access)
- EBPG 5000+ Sample Unmounting video (Caltech-only access)
Sample Prep and Writing SOPs
- EBPG Preparing pieces for exposure on 5000+ SOP
- EBPG 5000+ Holder 5 adapter plate SOP
- EBPG 5000+ Holder 8 SOP
- EBPG 5000+ Raith screwdriver SOP
- EBPG High Resolution Mode SOP
- EBPG Preparing sample for exposure SOP
- EBPG Beam Adjustment SOP
- EBPG Marker definition Procedure
- EBPG Adjust Aperture SOP
- EBPG Aperture changers SOP
- EBPG JOY Marker Procedure
- EBPG Disable marker height check SOP
- EBPG Holderfix SOP
- EBPG Remote Access SOP (log into LabRunr and download SOP from EBPG 5000+ page)
Advanced Troubleshooting SOPs
- Information Archive Beam
- EBPG BEAMS crash recovery SOP (run before a coldstart if BEAMS freezes)
- BEAMS $pg shutdown / coldstart SOP
- EBPG Procedure to degauss the final lens (run after every coldstart)
- Beam file Recovery SOP
- Lindgren MACS SOP
- EBPG Emergency air cylinder SOP
- EBPG Unlocking the stage SOP
- EBPG SAEHT not initialized SOP
- EBPG SAEHT no route to host recovery SOP
- EBPG hotbox slave communications fault recovery SOP
- EBPG FEG recovery and new beam table SOP
- Raith Common errors and solutions with aligned writing SOP
- EBPG 5000+ Troubleshooting Loader errors
- EBPG 5000+ Reattach alignment microscope coupling spring video (Caltech-only access)
Data Preparation Resources
- SOP: KNI Introduction to Layout BEAMER
- BEAMER Tutorial – Fracturing circles and angled features
- App Note: 3D Surface Proximity Effect Correction (Caltech-only access)
- App Note: Fracture Optimization (Caltech-only access)
- App Note: Writing Time Optimization (Caltech-only access)
- App Note: Formulas in Beamer Modules (Caltech-only access)
- App Note: Multipass (Caltech-only access)
- App Note: Mixed Export Options (Caltech-only access)
- App Note: GPF Formatter (Caltech-only access)
- Webinar Series - BEAMER Training
- Webinar Series: Proximity Effect in E-Beam Lithography
- Webinar: e-Beam Lithography Simulation
- March 2020 Genisys BEAMeeting at Caltech
- June 2020 Genisys BEAMeeting Layout Beamer training video
- September 2020 Genisys BEAMeeting MNE (virtual) Presentations and Training
- February - April 2021 Layout Beamer Training Webinars (Caltech-only access)
- GenIsys BEAMeeting presentations and notes (Caltech-only access)
Lithography Process Information
- Bi-Layer PMMA Resist Spinning Recipe
- Recipe to prepare PMMA developer (MIBK:IPA 1:3)
- MAN Resist Data Sheet
- PMMA Resist Data Sheet
- SML Resist Data Sheet
- ZEP Resist Data Sheet
- ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
- HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
- Supramolecular Resist processing (Caltech-only access)
- Laurell Spinner cleaning SOP
- New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)
Manufacturer Manuals
- Raith cjob manual (Caltech-only access)
- Layout Beamer Release Notes (Caltech-only access)
- Layout Beamer Manual (Caltech-only access)
- CEBUS 2021 Presentations (Caltech-only access)
- Laurell Spin Coater Manual (log into LabRunr and download Manual from EBPG 5000+ page)
- Torrey Pines HS30A Programmable hotplate manual
Specifications
Manufacturer Specifications and Manuals
- Raith cjob manual (Caltech-only access)
- Layout Beamer Release Notes (Caltech-only access)
- Layout Beamer Manual (Caltech-only access)
Specifications
- Voltage Range: 20, 50 or 100 kV
- Current Range: 50 pA to 200 nA
- Main Field Size: Up to 1 mm x 1 mm
- Main Field Resolution: 20 bit
- Maximum Writing Frequency: 100 MHz
- Aperture Sizes: 300μm, 300μm, 400μm
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography