Tube Furnaces for Wet & Dry Processing

Tystar Tytan Tube Furnaces 1 & 2 Instrument Type Support Tools, Thermal Processing Techniques Oxidation, Annealing Staff Manager Kelly McKenzie Staff Email kmmckenz@caltech.edu Staff Phone 626-395-5732 Reserve time on FBS Request training via FBS User Dashboard Lab Location B235 Steele Lab Phone 626-395-1532 Manufacturer Tystar Corporation Model Tytan Horizontal Diffusion Furnace

Description

The system is designed for processing up to one-hundred, 150 mm (6") silicon or sapphire wafers per tube and can accommodate smaller sample sizes also. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.

Applications

• Dry & Wet oxidation
• Annealing

Allowed Materials

• Silicon or sapphire that is completely free of metal or organic contamination
  • Recommended to have undergone a standard RCA clean or similar beforehand
• No other sample material allowed
• No metal or organic contamination
  • Wafers must not have been contacted by metal tweezers, etc. without appropriate cleaning to remove metal contamination

Gas List

• Nitrogen
• Oxygen
• Water Vapor (Tube 1)

Resources

Equipment Data

• Deposition Pass-down equipment information

Tystar Oxidation Recipe

• Wet Oxidation 1000C

SOPs & Troubleshooting

• KNI SOP