EBPG 5000+: 100 kV Electron Beam Lithography: Difference between revisions

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m (Removed link to Equipment Status under Resources since the status can be viewed directly by users in FBS, per Tiffany 4/15/24 sg)
 
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== Resources ==
== Resources ==
===== General SOPs =====
===== General SOPs =====
* [https://caltech.box.com/s/c9t6f1bkxqqfhz5lovjmm1iwg34s2m5v EBPG reservation and use policy (Updated 1 October 2022)]
* [https://caltech.box.com/s/c217cz3i7crvafhlsssh6lauirixgji5 EBPG reservation and use policy (Updated April 2024)]
* [https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn EBPG SOP]
* [https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn EBPG SOP]
* [https://caltech.box.com/s/jq0s85sdsd069cv9aesdfixy5fueihyh User's Guide to the EBPG pg computer desktop]
* [https://caltech.box.com/s/jq0s85sdsd069cv9aesdfixy5fueihyh User's Guide to the EBPG pg computer desktop]
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===== Sample Prep and Writing SOPs =====
===== Sample Prep and Writing SOPs =====
* [https://caltech.box.com/s/05w5x6u01gzpdn1ksa9r7967m2fdidai EBPG Handling Large Pattern Files SOP]
* [https://caltech.box.com/s/xvj8jjzjyocr8kht8xfl7e6qb024t5a6 EBPG Preparing pieces for exposure on 5000+ SOP]
* [https://caltech.box.com/s/xvj8jjzjyocr8kht8xfl7e6qb024t5a6 EBPG Preparing pieces for exposure on 5000+ SOP]
* [https://caltech.box.com/s/s2p10a6r3ds8h8al8bejjv2yvkuc7pez EBPG 5000+ Holder 5 adapter plate SOP]
* [https://caltech.box.com/s/s2p10a6r3ds8h8al8bejjv2yvkuc7pez EBPG 5000+ Holder 5 adapter plate SOP]

Latest revision as of 22:06, 11 November 2024

EBPG 5000+
EBPG-5000+.jpg
Instrument Type Lithography
Techniques Electron Beam Lithography
Staff Manager Guy A. DeRose, PhD
Staff Email derose@caltech.edu
Staff Phone 626-395-3423
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B233C Steele
Lab Phone 626-395-1531 & -1540
Manufacturer Raith Lithography BV
Model EBPG 5000+

Description

The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).

It is important that users have the time needed to prepare their data and job files without the pressure of being on the clock. This approach gives them a better chance of not having to repeat charged exposures through so much trial and error. Please note that we do not charge for the time required to prepare pattern files (in Layout Beamer and Tracer), or for preparing exposure job files (cjob). Users will receive instructions for secure remote access during training.

Operational Applications
  • Non-aligned electron beam lithography
  • Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
  • Nanophotonics
  • Nano-optics
  • Waveguides

Resources

General SOPs
Training materials
Sample Prep and Writing SOPs
Advanced Troubleshooting SOPs
Data Preparation Resources
Lithography Process Information
Manufacturer Manuals

Specifications

Manufacturer Specifications and Manuals
Specifications
  • Voltage Range: 20, 50 or 100 kV
  • Current Range: 50 pA to 200 nA
  • Main Field Size: Up to 1 mm x 1 mm
  • Main Field Resolution: 20 bit
  • Maximum Writing Frequency: 100 MHz
  • Aperture Sizes: 300μm, 300μm, 400μm



Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
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