EBPG 5200: 100 kV Electron Beam Lithography: Difference between revisions
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== Description == | == Description == | ||
The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35 mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200 mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV). | The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35 mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200 mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV). <p> | ||
It is important that users have the time needed to prepare their data and job files without the pressure of being on the clock. This approach gives them a better chance of not having to repeat charged exposures through so much trial and error. Please note that we do not charge for the time required to prepare pattern files (in Layout Beamer and Tracer), or for preparing exposure job files (cjob). Users will receive instructions for secure remote access during training. | |||
===== Operational Applications ===== | ===== Operational Applications ===== | ||
* Non-aligned electron beam lithography | * Non-aligned electron beam lithography | ||
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== Resources == | == Resources == | ||
===== General SOPs ===== | ===== General SOPs ===== | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/c217cz3i7crvafhlsssh6lauirixgji5 EBPG reservation and use policy (Updated April 2024)] | ||
* [https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn EBPG SOP] | * [https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn EBPG SOP] | ||
* [https://caltech.box.com/s/jq0s85sdsd069cv9aesdfixy5fueihyh User's Guide to the EBPG pg computer desktop] | * [https://caltech.box.com/s/jq0s85sdsd069cv9aesdfixy5fueihyh User's Guide to the EBPG pg computer desktop] | ||
* [https://caltech.box.com/s/9whswv26y0w6yua8073nw080r3lcfdz4 EBPG Troubleshooting Guide] | * [https://caltech.box.com/s/9whswv26y0w6yua8073nw080r3lcfdz4 EBPG Troubleshooting Guide] | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/cf5ix7iraea7m3jepjwylf4nd51d8hrg Remote EBPG access via HP Remote Graphics Server (Caltech-Only)] | ||
===== Training Materials ===== | ===== Training Materials ===== | ||
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===== Sample Prep and Writing SOPs ===== | ===== Sample Prep and Writing SOPs ===== | ||
* [https://caltech.box.com/s/05w5x6u01gzpdn1ksa9r7967m2fdidai EBPG Handling Large Pattern Files SOP] | |||
* [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP] | * [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP] | ||
* [https://caltech.box.com/s/vpkguvtrdw9eup3rytljb5re9rfbe1fb EBPG 5200 Piece part prep SOP] | * [https://caltech.box.com/s/vpkguvtrdw9eup3rytljb5re9rfbe1fb EBPG 5200 Piece part prep SOP] | ||
* [https://caltech.box.com/s/1vul3cyoudr1k3e8zoctne3oyt4irx3y EBPG 5200 Holder 200 SOP] | |||
* [https://caltech.box.com/s/6yp4eq33y84y12hon075sbh1t7uukvay EBPG Preparing sample for exposure SOP] | * [https://caltech.box.com/s/6yp4eq33y84y12hon075sbh1t7uukvay EBPG Preparing sample for exposure SOP] | ||
* [https://caltech.box.com/s/rwhke2ck8539d3p9pfhgvu3f62uasfhq EBPG Holder Fixture handling SOP] | |||
* [https://caltech.box.com/s/c5gz16zs97vcsnlayr5kj7zffnv9mq81 EBPG Beam Adjustment SOP] | * [https://caltech.box.com/s/c5gz16zs97vcsnlayr5kj7zffnv9mq81 EBPG Beam Adjustment SOP] | ||
* [https://caltech.box.com/s/3cs4x9gw0b3jdrg1acpt9e0lt5wbphzb EBPG Adjust Aperture SOP] | * [https://caltech.box.com/s/3cs4x9gw0b3jdrg1acpt9e0lt5wbphzb EBPG Adjust Aperture SOP] | ||
* [https://caltech.box.com/s/dcdxqas5594rlgme00qbiuuapripgbiy EBPG Aperture changers SOP] | |||
* [https://caltech.box.com/s/uoeq30e8bxh8r3dza33ju4sid5qycg8z EBPG Marker definition Procedure] | * [https://caltech.box.com/s/uoeq30e8bxh8r3dza33ju4sid5qycg8z EBPG Marker definition Procedure] | ||
* [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure] | * [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure] | ||
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===== Data Preparation Resources ===== | ===== Data Preparation Resources ===== | ||
* [https://caltech.box.com/s/0xofm2zqmhzm6tv85ihfnhdhzuo8jpjg SOP: KNI Introduction to Layout BEAMER] | * [https://caltech.box.com/s/0xofm2zqmhzm6tv85ihfnhdhzuo8jpjg SOP: KNI Introduction to Layout BEAMER] | ||
* [https://caltech.box.com/s/fql3uk5i3j8kv7tkx9auveomg0clubhn App Note: 3D Surface Proximity Effect Correction] | * [https://caltech.box.com/s/fql3uk5i3j8kv7tkx9auveomg0clubhn App Note: 3D Surface Proximity Effect Correction (Caltech-only access)] | ||
* [https://caltech.box.com/s/a0mym20drharh2fj1ne8nex6a0jw3te4 App Note: Fracture Optimization] | * [https://caltech.box.com/s/a0mym20drharh2fj1ne8nex6a0jw3te4 App Note: Fracture Optimization (Caltech-only access)] | ||
* [https://caltech.box.com/s/ef3zou8b9xk597jxs7bs1s1yck1lo5cu App Note: Writing Time Optimization] | * [https://caltech.box.com/s/ef3zou8b9xk597jxs7bs1s1yck1lo5cu App Note: Writing Time Optimization (Caltech-only access)] | ||
* [https://caltech.box.com/s/c8hsz4opsgb0j8nmqq48v64wnlxth5l5 App Note: Formulas in Beamer Modules] | * [https://caltech.box.com/s/c8hsz4opsgb0j8nmqq48v64wnlxth5l5 App Note: Formulas in Beamer Modules (Caltech-only access)] | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/g3haulnez2ls6r2ezklcjei7jl8nx03b App Note: Multipass Exposure (Caltech-only access)] | ||
* [https://caltech.box.com/s/yh1ku02vjnf3ew8uvmjbyn8hv5t0em72 App Note: Mixed Export Options] | * [https://caltech.box.com/s/yh1ku02vjnf3ew8uvmjbyn8hv5t0em72 App Note: Mixed Export Options (Caltech-only access)] | ||
* [https://caltech.box.com/s/9wbovly55qu2plfmoian6a7ocbw7pk2h App Note: GPF Formatter] | * [https://caltech.box.com/s/9wbovly55qu2plfmoian6a7ocbw7pk2h App Note: GPF Formatter (Caltech-only access)] | ||
* [https://www.genisys-gmbh.com/webinar-series-beamer-training.html Webinar Series - BEAMER Training] | |||
* [https://www.genisys-gmbh.com/webinar-series-proximity-effect-in-e-beam-lithography.html Webinar Series: Proximity Effect in E-Beam Lithography] | |||
* [https://www.genisys-gmbh.com/webinar-e-beam-lithography-simulation.html Webinar: e-Beam Lithography Simulation] | |||
* [https://caltech.box.com/s/iaq5dsl4olmj1er5gfm805hfpy4gknk9 March 2020 Genisys BEAMeeting at Caltech] | * [https://caltech.box.com/s/iaq5dsl4olmj1er5gfm805hfpy4gknk9 March 2020 Genisys BEAMeeting at Caltech] | ||
* [https://caltech.box.com/s/uwlcuus2wny3hoplvszazhxgb6fzzzwq June 2020 Genisys BEAMeeting Layout Beamer training video] | * [https://caltech.box.com/s/uwlcuus2wny3hoplvszazhxgb6fzzzwq June 2020 Genisys BEAMeeting Layout Beamer training video (Caltech-only access)] | ||
* [https://caltech.box.com/s/fgp1elkr3nfirkidd7shgbhwjx72ij9y September 2020 Genisys BEAMeeting MNE (virtual) Presentations and Training] | |||
* [https://caltech.box.com/s/0tuq46h6qcgcg7fji6bpzjn01ayuj6la February - April 2021 Layout Beamer Training Webinars (Caltech-only access)] | |||
* [https://caltech.box.com/s/8qj5nssyfr4mty8pwzba6lexco96mfmw GenIsys BEAMeeting presentations and notes (Caltech-only access)] | |||
===== Lithography Process Information ===== | ===== Lithography Process Information ===== | ||
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* [https://caltech.box.com/s/ji4zqki1wps2anyjy45on7cp0szvb3yk Supramolecular Resist processing (Caltech-only access)] | * [https://caltech.box.com/s/ji4zqki1wps2anyjy45on7cp0szvb3yk Supramolecular Resist processing (Caltech-only access)] | ||
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP] | * [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP] | ||
* [https://caltech.box.com/s/ybozdh0es8nzd6ujlx28lk7cnimlxwfm New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)] | |||
===== Manufacturer Manuals ===== | ===== Manufacturer Manuals ===== | ||
* [https://caltech.box.com/s/wob17hrfwphxuu2a897pwlx2sn0d0pmu EBPG 5200 system manual (Caltech-only access)] | * [https://caltech.box.com/s/wob17hrfwphxuu2a897pwlx2sn0d0pmu EBPG 5200 system manual (Caltech-only access)] | ||
* [https://caltech.box.com/s/wzeujygt2qof76x9r5wd5e5mrz5liy0i Raith cjob manual (Caltech-only access)] | * [https://caltech.box.com/s/wzeujygt2qof76x9r5wd5e5mrz5liy0i Raith cjob manual (Caltech-only access)] | ||
* [https://caltech.box.com/s/gvgy6vpty5g33qvf9pdef629770vmjiw Layout Beamer Release Notes] | * [https://caltech.box.com/s/gvgy6vpty5g33qvf9pdef629770vmjiw Layout Beamer Release Notes (Caltech-only access)] | ||
* [https://caltech.box.com/s/6047un2cme4wwgs9ztvexjelp5x7e79p Layout Beamer Manual] | * [https://caltech.box.com/s/6047un2cme4wwgs9ztvexjelp5x7e79p Layout Beamer Manual (Caltech-only access)] | ||
* [https://caltech.box.com/s/e177zgemo96fddfrkdqsh3cu15k0snbg CEBUS 2021 Presentations (Caltech-only access)] | |||
* [https://labrunr.caltech.edu/Equipment_2.aspx Laurell Spin Coater Manual] (log into ''LabRunr'' and download Manual from EBPG 5000+ page) | * [https://labrunr.caltech.edu/Equipment_2.aspx Laurell Spin Coater Manual] (log into ''LabRunr'' and download Manual from EBPG 5000+ page) | ||
* [https://caltech.box.com/s/7gw32ios7yqj3d8ghj336u0ksm6gued6 Torrey Pines HS30A Programmable hotplate manual] | |||
== Specifications == | == Specifications == | ||
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* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]] | * [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]] | ||
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]] | * [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]] | ||
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]] | <!---* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]---> | ||
===== Ion Beam Lithography ===== | ===== Ion Beam Lithography ===== | ||
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]] | * [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]] | ||
Latest revision as of 22:05, 11 November 2024
|
Description
The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35 mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200 mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).
It is important that users have the time needed to prepare their data and job files without the pressure of being on the clock. This approach gives them a better chance of not having to repeat charged exposures through so much trial and error. Please note that we do not charge for the time required to prepare pattern files (in Layout Beamer and Tracer), or for preparing exposure job files (cjob). Users will receive instructions for secure remote access during training.
Operational Applications
- Non-aligned electron beam lithography
- Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
General SOPs
- EBPG reservation and use policy (Updated April 2024)
- EBPG SOP
- User's Guide to the EBPG pg computer desktop
- EBPG Troubleshooting Guide
- Remote EBPG access via HP Remote Graphics Server (Caltech-Only)
Training Materials
- EBPG Training Lecture video series (Caltech-only access)
- EBPG Pre-exposure Walkthrough procedure (video)
- EBPG System Introduction main room training video
- EBPG System Introduction service chase overview training video
- EBPG System Introduction UPS and alignment microscopes training video
- EBPG 5200 sample mounting training video (Caltech-only access)
Sample Prep and Writing SOPs
- EBPG Handling Large Pattern Files SOP
- EBPG High Resolution Mode SOP
- EBPG 5200 Piece part prep SOP
- EBPG 5200 Holder 200 SOP
- EBPG Preparing sample for exposure SOP
- EBPG Holder Fixture handling SOP
- EBPG Beam Adjustment SOP
- EBPG Adjust Aperture SOP
- EBPG Aperture changers SOP
- EBPG Marker definition Procedure
- EBPG JOY Marker Procedure
- EBPG Disable marker height check SOP
- EBPG 5200 Secondary Electron Detector SOP
- EBPG Holderfix SOP
- EBPG Remote Access SOP (log into LabRunr and download SOP from EBPG 5200 page)
Advanced Troubleshooting SOPs
- Information Archive Beam
- EBPG BEAMS crash recovery SOP (run before a coldstart if BEAMS freezes)
- BEAMS $pg shutdown / coldstart SOP
- EBPG Procedure to degauss the final lens (run after every coldstart)
- Beam file Recovery SOP
- Lindgren MACS SOP
- EBPG Emergency air cylinder SOP
- EBPG Unlocking the stage SOP
- EBPG SAEHT not initialized SOP
- EBPG SAEHT no route to host recovery SOP
- EBPG hotbox slave communications fault recovery SOP
- EBPG FEG recovery and new beam table SOP
- Raith Common errors and solutions with aligned writing SOP
- EBPG 5200 troubleshooting loader issues training video (Caltech-only access)
Data Preparation Resources
- SOP: KNI Introduction to Layout BEAMER
- App Note: 3D Surface Proximity Effect Correction (Caltech-only access)
- App Note: Fracture Optimization (Caltech-only access)
- App Note: Writing Time Optimization (Caltech-only access)
- App Note: Formulas in Beamer Modules (Caltech-only access)
- App Note: Multipass Exposure (Caltech-only access)
- App Note: Mixed Export Options (Caltech-only access)
- App Note: GPF Formatter (Caltech-only access)
- Webinar Series - BEAMER Training
- Webinar Series: Proximity Effect in E-Beam Lithography
- Webinar: e-Beam Lithography Simulation
- March 2020 Genisys BEAMeeting at Caltech
- June 2020 Genisys BEAMeeting Layout Beamer training video (Caltech-only access)
- September 2020 Genisys BEAMeeting MNE (virtual) Presentations and Training
- February - April 2021 Layout Beamer Training Webinars (Caltech-only access)
- GenIsys BEAMeeting presentations and notes (Caltech-only access)
Lithography Process Information
- Bi-Layer PMMA Resist Spinning Recipe
- Recipe to prepare PMMA developer (MIBK:IPA 1:3)
- MAN Resist Data Sheet
- PMMA Resist Data Sheet
- SML Resist Data Sheet
- ZEP Resist Data Sheet
- ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
- HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
- Supramolecular Resist processing (Caltech-only access)
- Laurell Spinner cleaning SOP
- New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)
Manufacturer Manuals
- EBPG 5200 system manual (Caltech-only access)
- Raith cjob manual (Caltech-only access)
- Layout Beamer Release Notes (Caltech-only access)
- Layout Beamer Manual (Caltech-only access)
- CEBUS 2021 Presentations (Caltech-only access)
- Laurell Spin Coater Manual (log into LabRunr and download Manual from EBPG 5000+ page)
- Torrey Pines HS30A Programmable hotplate manual
Specifications
- Voltage Range: 20, 50 or 100 kV
- Current Range: 50 pA to 200 nA
- Main Field Size: Up to 1 mm x 1 mm
- Main Field Resolution: 20 bit
- Maximum Writing Frequency: 100 MHz
- Aperture Sizes: 200 μm, 300 μm, 400 μm
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography