EBPG 5200: 100 kV Electron Beam Lithography: Difference between revisions

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|InstrumentName = EBPG 5200
|InstrumentName = EBPG 5200
|HeaderColor = #FFFFFF
|HeaderColor = #FFFFFF
|ImageOne = EBPG-5200-Research-Image.jpg
|ImageOne = Wavelength-scale-Piezoelectric-Transducer_Alp-Sipahigil.jpg
|ImageTwo = EBPG-5200-A230.jpg
|ImageTwo = EBPG-5200.jpg
|InstrumentType = [[Equipment_List#Lithography|Lithography]]
|InstrumentType = [[Equipment_List#Lithography|Lithography]]
|RoomLocation = B233C Steele
|RoomLocation = B233C Steele
|LabPhone = 626-395-1531 /1540
|LabPhone = 626-395-1531 & -1540
|PrimaryStaff = [[Guy A. DeRose, PhD]]
|PrimaryStaff = [[Guy A. DeRose, PhD]]
|StaffEmail = derose@caltech.edu
|StaffEmail = derose@caltech.edu
Line 12: Line 12:
|Manufacturer = Raith Lithography BV
|Manufacturer = Raith Lithography BV
|Techniques = Electron Beam Lithography
|Techniques = Electron Beam Lithography
|EmailList = kni-ebpg@caltech.edu
|EmailList = kni-ebpg
|EmailListName =  EBPG
|EmailListName =  EBPG
|Model = EBPG 5200
|Model = EBPG 5200
}}
}}
== Description ==
== Description ==
The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.
The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35 mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200 mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV). <p>
===== Opertional Applications =====
It is important that users have the time needed to prepare their data and job files without the pressure of being on the clock. This approach gives them a better chance of not having to repeat charged exposures through so much trial and error. Please note that we do not charge for the time required to prepare pattern files (in Layout Beamer and Tracer), or for preparing exposure job files (cjob).  Users will receive instructions for secure remote access during training.
===== Operational Applications =====
* Non-aligned electron beam lithography
* Non-aligned electron beam lithography
* Aligned (AKA direct-write) electron beam lithography  
* Aligned (aka direct-write) electron beam lithography  


===== Scientific / technical Applications =====
===== Scientific / Technical Applications =====
* Nanophotonics
* Nanophotonics
* Nano-optics
* Nano-optics
Line 28: Line 29:


== Resources ==
== Resources ==
===== SOPs & Troubleshooting =====
===== General SOPs =====
* EBPG SOP Type  ([https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn Short Version] | [https://caltech.box.com/s/xwjdudqdl793gkc5kl71zez5nnc5y2xb Long Version])
* [https://caltech.box.com/s/c217cz3i7crvafhlsssh6lauirixgji5 EBPG reservation and use policy (Updated April 2024)]
* [https://caltech.box.com/s/cwp88iw2q5t8eygl114zs8ywlhraxo16 EBPG reservation and use policy]
* [https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn EBPG SOP]
* [https://caltech.box.com/s/jq0s85sdsd069cv9aesdfixy5fueihyh User's Guide to the EBPG pg computer desktop]
* [https://caltech.box.com/s/9whswv26y0w6yua8073nw080r3lcfdz4 EBPG Troubleshooting Guide]
* [https://caltech.box.com/s/cf5ix7iraea7m3jepjwylf4nd51d8hrg Remote EBPG access via HP Remote Graphics Server (Caltech-Only)]
 
===== Training Materials =====
* [https://caltech.box.com/s/zq75pq1acpuhcef7xqr64bklhvknlqac EBPG Training Lecture video series (Caltech-only access)]
* [https://caltech.box.com/s/v58ny963v34uwm2ggxwjrn74sc8w7jx3 EBPG Pre-exposure Walkthrough procedure (video)]
* [https://caltech.box.com/s/4h37s09pg1lc2khlwjc67z95qlooa6az EBPG System Introduction main room training video]
* [https://caltech.box.com/s/fd9wzhdt2a0qmkgcwerqd27lvi26ca8x EBPG System Introduction service chase overview training video]
* [https://caltech.box.com/s/ykm83f8maelbqb65140rd6607hayjwa9 EBPG System Introduction UPS and alignment microscopes training video]
* [https://caltech.box.com/s/i2q9ow1pkkidt1z7st0czvazobpxours EBPG 5200 sample mounting training video (Caltech-only access)]
 
===== Sample Prep and Writing SOPs =====
===== Sample Prep and Writing SOPs =====
* [https://caltech.box.com/s/05w5x6u01gzpdn1ksa9r7967m2fdidai EBPG Handling Large Pattern Files SOP]
* [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP]
* [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP]
* [https://caltech.box.com/s/vpkguvtrdw9eup3rytljb5re9rfbe1fb EBPG 5200 Piece part prep SOP]
* [https://caltech.box.com/s/vpkguvtrdw9eup3rytljb5re9rfbe1fb EBPG 5200 Piece part prep SOP]
* [https://caltech.box.com/s/1vul3cyoudr1k3e8zoctne3oyt4irx3y EBPG 5200 Holder 200 SOP]
* [https://caltech.box.com/s/6yp4eq33y84y12hon075sbh1t7uukvay EBPG Preparing sample for exposure SOP]
* [https://caltech.box.com/s/6yp4eq33y84y12hon075sbh1t7uukvay EBPG Preparing sample for exposure SOP]
* [https://caltech.box.com/s/l42cjo7q7ughvvkqm8r6i4jzscq4lihe EBPG Beam Adjustment SOP]
* [https://caltech.box.com/s/rwhke2ck8539d3p9pfhgvu3f62uasfhq EBPG Holder Fixture handling SOP]
* [https://caltech.box.com/s/31qwx2yq8hisxgvelrsbpap3g4pgpcjl EBPG Marker definition Procedure]
* [https://caltech.box.com/s/c5gz16zs97vcsnlayr5kj7zffnv9mq81 EBPG Beam Adjustment SOP]
* [https://caltech.box.com/s/3cs4x9gw0b3jdrg1acpt9e0lt5wbphzb EBPG Adjust Aperture SOP]
* [https://caltech.box.com/s/dcdxqas5594rlgme00qbiuuapripgbiy EBPG Aperture changers SOP]
* [https://caltech.box.com/s/uoeq30e8bxh8r3dza33ju4sid5qycg8z EBPG Marker definition Procedure]
* [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure]
* [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure]
* [https://caltech.box.com/s/6mqfko3fswi0rwrt8zfaj8nwjfr9v2c7 EBPG Disable marker height check SOP]
* [https://caltech.box.com/s/6mqfko3fswi0rwrt8zfaj8nwjfr9v2c7 EBPG Disable marker height check SOP]
* [https://labrunr.caltech.edu/Equipment_2.aspx EBPG Remote Access SOP]
* [https://caltech.box.com/s/weqpi9oam0hbvxefqp8md1q4z8q14hze EBPG 5200 Secondary Electron Detector SOP]
* [https://caltech.box.com/s/k2sicwqfbin5ktns5m30ir8wtdjqhea0 EBPG Holderfix SOP]
* [https://labrunr.caltech.edu/Equipment_2.aspx EBPG Remote Access SOP] (log into ''LabRunr'' and download SOP from EBPG 5200 page)


===== Troubleshooting SOPs =====
===== Advanced Troubleshooting SOPs =====
* [https://caltech.box.com/s/sz9pai0icsntnef6me23veiwtwdui0gm Troubleshooting Guide]
* [https://caltech.box.com/s/55zji9vfs8kuxl0aye1sw1iy8xi0rd9c Information Archive Beam]
* [https://caltech.box.com/s/55zji9vfs8kuxl0aye1sw1iy8xi0rd9c Information Archive Beam]
* [https://caltech.box.com/s/qr7lqvsjc7cgv471f33smyn6gqjzdqfr EBPG BEAMS crash recovery SOP (run before a coldstart if BEAMS freezes)]
* [https://caltech.box.com/s/qnl5l52v936kql830kt0fyrmlaj8cbmo BEAMS $pg shutdown / coldstart SOP]
* [https://caltech.box.com/s/et1ak4l0t7cwermp3h51w1aolywe09vr EBPG Procedure to degauss the final lens (run after every coldstart)]
* [https://caltech.box.com/s/vvv20x3k5xd0g8ie5039ox9cz601h7nn Beam file Recovery SOP]
* [https://caltech.box.com/s/afdyjxjo54l1v2ukubon5ntin73aflc1 Lindgren MACS SOP]
* [https://caltech.box.com/s/afdyjxjo54l1v2ukubon5ntin73aflc1 Lindgren MACS SOP]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l SAEHT not initialized SOP]
* [https://caltech.box.com/s/tf87blqopht0y51hy4agn2fsfjh7wot9 EBPG Emergency air cylinder SOP]
* [https://caltech.box.com/s/tf87blqopht0y51hy4agn2fsfjh7wot9 EBPG Emergency air cylinder SOP]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l EBPG SAEHT no route to host recovery SOP]
* [https://caltech.box.com/s/e9jsz2kisfzjsyeomqr5gmjj3fc0nifx EBPG Unlocking the stage SOP]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l EBPG SAEHT not initialized SOP]
* [https://caltech.box.com/s/lsrjqc5n6pwqpc4al8qxaxq03k21y38i EBPG SAEHT no route to host recovery SOP]
* [https://caltech.box.com/s/1fe4803rl38fa7a7w50r77c4nf64818l EBPG hotbox slave communications fault recovery SOP]
* [https://caltech.box.com/s/1fe4803rl38fa7a7w50r77c4nf64818l EBPG hotbox slave communications fault recovery SOP]
* [https://caltech.box.com/s/emfc1i4qeg9psatj6enpm9g38f5a2u9r EBPG FEG recovery and new beam table SOP]
* [https://caltech.box.com/s/oxjf52qwvj0ocnx151aqd6tso8ykfkca Raith Common errors and solutions with aligned writing SOP]
* [https://caltech.box.com/s/3lt47igh9wcza5ck9nl3i4ansn1jy4q7 EBPG 5200 troubleshooting loader issues training video (Caltech-only access)]
===== Data Preparation Resources =====
* [https://caltech.box.com/s/0xofm2zqmhzm6tv85ihfnhdhzuo8jpjg SOP: KNI Introduction to Layout BEAMER]
* [https://caltech.box.com/s/fql3uk5i3j8kv7tkx9auveomg0clubhn App Note: 3D Surface Proximity Effect Correction (Caltech-only access)]
* [https://caltech.box.com/s/a0mym20drharh2fj1ne8nex6a0jw3te4 App Note: Fracture Optimization (Caltech-only access)]
* [https://caltech.box.com/s/ef3zou8b9xk597jxs7bs1s1yck1lo5cu App Note: Writing Time Optimization (Caltech-only access)]
* [https://caltech.box.com/s/c8hsz4opsgb0j8nmqq48v64wnlxth5l5 App Note: Formulas in Beamer Modules (Caltech-only access)]
* [https://caltech.box.com/s/g3haulnez2ls6r2ezklcjei7jl8nx03b App Note: Multipass Exposure (Caltech-only access)]
* [https://caltech.box.com/s/yh1ku02vjnf3ew8uvmjbyn8hv5t0em72 App Note: Mixed Export Options (Caltech-only access)]
* [https://caltech.box.com/s/9wbovly55qu2plfmoian6a7ocbw7pk2h App Note: GPF Formatter (Caltech-only access)]
* [https://www.genisys-gmbh.com/webinar-series-beamer-training.html Webinar Series - BEAMER Training]
* [https://www.genisys-gmbh.com/webinar-series-proximity-effect-in-e-beam-lithography.html Webinar Series: Proximity Effect in E-Beam Lithography]
* [https://www.genisys-gmbh.com/webinar-e-beam-lithography-simulation.html Webinar: e-Beam Lithography Simulation]
* [https://caltech.box.com/s/iaq5dsl4olmj1er5gfm805hfpy4gknk9 March 2020 Genisys BEAMeeting at Caltech]
* [https://caltech.box.com/s/uwlcuus2wny3hoplvszazhxgb6fzzzwq June 2020 Genisys BEAMeeting Layout Beamer training video (Caltech-only access)]
* [https://caltech.box.com/s/fgp1elkr3nfirkidd7shgbhwjx72ij9y September 2020 Genisys BEAMeeting MNE (virtual) Presentations and Training]
* [https://caltech.box.com/s/0tuq46h6qcgcg7fji6bpzjn01ayuj6la February - April 2021 Layout Beamer Training Webinars (Caltech-only access)]
* [https://caltech.box.com/s/8qj5nssyfr4mty8pwzba6lexco96mfmw GenIsys BEAMeeting presentations and notes (Caltech-only access)]
===== Lithography Process Information =====
* [https://caltech.box.com/s/nwuxjbfm0fp0lb4k12albsr3zbnqk9po Bi-Layer PMMA Resist Spinning Recipe]
* [https://caltech.box.com/s/db1hiyshj5vovhwr3mvxn0glzn0xnabp Recipe to prepare PMMA developer (MIBK:IPA 1:3)]
* [https://caltech.box.com/s/2pumpha7ywa8zenvfzjxlggglvm4u3h5 MAN Resist Data Sheet]
* [https://caltech.box.com/s/lw2h56h0lqabwo82yofu52dqgi61gcp9 PMMA Resist Data Sheet]
* [https://caltech.box.com/s/acjh5syhzh4zm55jp76ef2hrzkeo4htw SML Resist Data Sheet]
* [https://caltech.box.com/s/vfvq5l8apkzzefxiu6weexpt37xpx9os ZEP Resist Data Sheet]
* [https://caltech.app.box.com/file/549582924881 ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)]
* [https://caltech.box.com/s/lijnz00qwpk7z5qbz8kn9tjo0kqfgz4a HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)]
* [https://caltech.box.com/s/ji4zqki1wps2anyjy45on7cp0szvb3yk Supramolecular Resist processing (Caltech-only access)]
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP]
* [https://caltech.box.com/s/ybozdh0es8nzd6ujlx28lk7cnimlxwfm New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)]


===== Video Tutorials =====
* [https://youtu.be/UfF_ljwvepQ Video 1] | [https://youtu.be/luC-5TgNPsQ Video 2]
* Video Series: ([https://youtu.be/YeukVt1Fyi0 Part 1] | [https://youtu.be/WFfOi-rwlbA Part 2] | [https://youtu.be/1syySgnTEqU Part 3])
===== Graphical Handouts =====
* [https://caltech.box.com/s/14ffgscc39vhrvlyva0jbucsep7j6dvv Handout 1]
* [https://caltech.box.com/s/kxaxtslwol1o5a276f3lrqbhss8zvwje Handout 2]
===== Presentations =====
* [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Presentation 1]
* [https://caltech.box.com/s/f4k8jan85n5lf6f2tutjx4rkfzjq7y68 Presentation 2]
===== Manufacturer Manuals =====
===== Manufacturer Manuals =====
* [https://caltech.box.com/s/og4309108q4k2jwhkaxqtpiujg2al5iu Manual 1]
* [https://caltech.box.com/s/wob17hrfwphxuu2a897pwlx2sn0d0pmu EBPG 5200 system manual (Caltech-only access)]
* [https://caltech.box.com/s/j0t3w6i53jhfjcva8i4qvlatdh7t1tzw Manual 2]
* [https://caltech.box.com/s/wzeujygt2qof76x9r5wd5e5mrz5liy0i Raith cjob manual (Caltech-only access)]
* [https://caltech.box.com/s/gvgy6vpty5g33qvf9pdef629770vmjiw Layout Beamer Release Notes (Caltech-only access)]
* [https://caltech.box.com/s/6047un2cme4wwgs9ztvexjelp5x7e79p Layout Beamer Manual (Caltech-only access)]
* [https://caltech.box.com/s/e177zgemo96fddfrkdqsh3cu15k0snbg CEBUS 2021 Presentations (Caltech-only access)]
* [https://labrunr.caltech.edu/Equipment_2.aspx Laurell Spin Coater Manual] (log into ''LabRunr'' and download Manual from EBPG 5000+ page)
* [https://caltech.box.com/s/7gw32ios7yqj3d8ghj336u0ksm6gued6 Torrey Pines HS30A Programmable hotplate manual]


== Specifications ==
== Specifications ==
===== Manufacturer Specifications =====
* [https://caltech.box.com/s/nmws6w7643ne8mraljjar6c4epw0anpp Manufacturer Data Sheet]
===== Specifications =====
* Voltage Range: 20, 50 or 100 kV
* Voltage Range: 20, 50 or 100 kV
* Current Range: 50 pA - >200 nA
* Current Range: 50 pA to 200 nA
* Main Field size: Up to 1mm x 1mm
* Main Field Size: Up to 1 mm x 1 mm
* Main Field resolution: 20 bit
* Main Field Resolution: 20 bit
* Maximum writing frequency: 100 MHz
* Maximum Writing Frequency: 100 MHz
* Aperture Sizes: 200um, 300um, 400um
* Aperture Sizes: 200 &mu;m, 300 &mu;m, 400 &mu;m
* etc.
<br>
<br>
== Related Instrumentation in the KNI ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
<!---* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]--->
===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]

Latest revision as of 22:05, 11 November 2024

EBPG 5200
Wavelength-scale-Piezoelectric-Transducer Alp-Sipahigil.jpg
Instrument Type Lithography
Techniques Electron Beam Lithography
Staff Manager Guy A. DeRose, PhD
Staff Email derose@caltech.edu
Staff Phone 626-395-3423
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B233C Steele
Lab Phone 626-395-1531 & -1540
Manufacturer Raith Lithography BV
Model EBPG 5200
EBPG-5200.jpg

Description

The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35 mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200 mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).

It is important that users have the time needed to prepare their data and job files without the pressure of being on the clock. This approach gives them a better chance of not having to repeat charged exposures through so much trial and error. Please note that we do not charge for the time required to prepare pattern files (in Layout Beamer and Tracer), or for preparing exposure job files (cjob). Users will receive instructions for secure remote access during training.

Operational Applications
  • Non-aligned electron beam lithography
  • Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
  • Nanophotonics
  • Nano-optics
  • Waveguides

Resources

General SOPs
Training Materials
Sample Prep and Writing SOPs
Advanced Troubleshooting SOPs
Data Preparation Resources
Lithography Process Information
Manufacturer Manuals

Specifications

  • Voltage Range: 20, 50 or 100 kV
  • Current Range: 50 pA to 200 nA
  • Main Field Size: Up to 1 mm x 1 mm
  • Main Field Resolution: 20 bit
  • Maximum Writing Frequency: 100 MHz
  • Aperture Sizes: 200 μm, 300 μm, 400 μm



Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
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