EBPG 5200: 100 kV Electron Beam Lithography

EBPG 5200 Instrument Type Lithography Techniques Electron Beam Lithography Staff Manager Guy A. DeRose, PhD Staff Email derose@caltech.edu Staff Phone 626-395-3423 Reserve time on FBS Request training via FBS User Dashboard Lab Location B233C Steele Lab Phone 626-395-1531 /1540 Manufacturer Raith Lithography BV Model EBPG 5200

Description

The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.

Opertional Applications

• Non-aligned electron beam lithography
• Aligned (AKA direct-write) electron beam lithography

Scientific / Technical Applications

• Nanophotonics
• Nano-optics
• Waveguides

Resources

General SOPs

• EBPG SOP
• EBPG reservation and use policy

Sample Prep and Writing SOPs

• EBPG High Resolution Mode SOP
• EBPG 5200 Piece part prep SOP
• EBPG Preparing sample for exposure SOP
• EBPG Beam Adjustment SOP
• EBPG Marker definition Procedure
• EBPG JOY Marker Procedure
• EBPG Disable marker height check SOP
• EBPG 5200 Secondary Electron Detector SOP
• EBPG Remote Access SOP

Troubleshooting SOPs

• Information Archive Beam
• Lindgren MACS SOP
• EBPG Emergency air cylinder SOP
• EBPG Unlocking the stage SOP
• EBPG SAEHT not initialized SOP
• EBPG SAEHT no route to host recovery SOP
• EBPG hotbox slave communications fault recovery SOP

Data Preparation Resources

• App Note: 3D Surface Proximity Effect Correction
• App Note: Fracture Optimization
• App Note: Writing Time Optimization
• App Note: Formulas in Beamer Modules
• App Note: Multipass
• App Note: Mixed Export Options
• App Note: GPF Formatter

Manufacturer Manuals

• Layout Beamer Release Notes
• Layout Beamer Manual

Specifications

Specifications

• Voltage Range: 20, 50 or 100 kV
• Current Range: 50 pA - > 200 nA
• Main Field size: Up to 1 mm x 1 mm
• Main Field resolution: 20 bit
• Maximum writing frequency: 100 MHz
• Aperture Sizes: 200 um, 300 um, 400 um
• etc.