EBPG 5200: 100 kV Electron Beam Lithography: Difference between revisions

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===== SOPs & Troubleshooting =====
===== SOPs & Troubleshooting =====
* EBPG SOP Type  ([https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn Short Version] | [https://caltech.box.com/s/xwjdudqdl793gkc5kl71zez5nnc5y2xb Long Version])
* EBPG SOP Type  ([https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn Short Version] | [https://caltech.box.com/s/xwjdudqdl793gkc5kl71zez5nnc5y2xb Long Version])
* [https://caltech.box.com/s/1nmp75l3166vj9t1vwwpwu2zyfc4j6ol KNI SOP]
* [https://caltech.box.com/s/cwp88iw2q5t8eygl114zs8ywlhraxo16 EBPG reservation and use policy]
* [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP]
* [https://caltech.box.com/s/vpkguvtrdw9eup3rytljb5re9rfbe1fb EBPG 5200 Piece part prep SOP]
* [https://caltech.box.com/s/vpkguvtrdw9eup3rytljb5re9rfbe1fb EBPG 5200 Piece part prep SOP]
* [https://labrunr.caltech.edu/Equipment_2.aspx Remote Access SOP]
* [https://caltech.box.com/s/31qwx2yq8hisxgvelrsbpap3g4pgpcjl EBPG Marker definition Procedure]
* [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure]
* [https://caltech.box.com/s/6mqfko3fswi0rwrt8zfaj8nwjfr9v2c7 EBPG Disable marker height check SOP]
* [https://labrunr.caltech.edu/Equipment_2.aspx EBPG Remote Access SOP]
* [https://caltech.box.com/s/sz9pai0icsntnef6me23veiwtwdui0gm Troubleshooting Guide]
* [https://caltech.box.com/s/sz9pai0icsntnef6me23veiwtwdui0gm Troubleshooting Guide]


Revision as of 03:39, 7 May 2019

EBPG 5200
File:EBPG-5200-Research-Image.jpg
Instrument Type Lithography
Techniques Electron Beam Lithography
Staff Manager Guy A. DeRose, PhD
Staff Email derose@caltech.edu
Staff Phone 626-395-3423
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B233C Steele
Lab Phone 626-395-1531 /1540
Manufacturer Raith Lithography BV
Model {{{Model}}}
EBPG-5200-Instrument-Image.jpg

Description

The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.

Opertional Applications
  • Non-aligned electron beam lithography
  • Aligned (AKA direct-write) electron beam lithography
Scientific / technical Applications
  • Nanophotonics
  • Nano-optics
  • Waveguides

Resources

SOPs & Troubleshooting
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals

Specifications

Manufacturer Specifications
Specifications
  • Voltage Range: 20, 50 or 100 kV
  • Current Range: 50 pA - >200 nA
  • Main Field size: Up to 1mm x 1mm
  • Main Field resolution: 20 bit
  • Maximum writing frequency: 100 MHz
  • Aperture Sizes: 200um, 300um, 400um
  • etc.
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