Wet Chemistry

Wet Chemistry Instrument Type Wet Chemistry Techniques Wet Chemical Processing: Acids, Bases, Solvents, and Electroplating Staff Manager Bert Mendoza Staff Email bertm@caltech.edu Staff Phone 626-395-4075 Reserve time on LabRunr Request training by email Lab Location B211 Steele Lab Phone 626-395-1538 Manufacturer NA Model NA

Facilities

Available Wet Benches located inside the Wet Chemistry Room:

• ACID BENCH: Personal Protective Equipment required to be worn.
• BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn.
• ELECTROPLATING BENCH: Double Nitrile Gloves and Safety Glasses or Goggles required to be worn.
• HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn.
• KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
• SOLVENTS BENCH: Double Nitrile Gloves and Safety Glasses or Goggles required to be worn.

Available Wet Benches located inside the Optical Lithography Room:

• DEVELOP BENCH: BASE/CAUSTIC processing only. Double Nitrile Gloves and Safety Glasses or Goggles required to be worn. Solvent Develop must be done in SOLVENT BENCH in Wet Chemistry Room.

Available Wet Benches located inside the E-beam Lithography Area:

• DEVELOP and SPINNER BENCH: SOLVENT processing only. Double Nitrile Gloves and Safety Glasses or Goggles required to be worn.

Hazardous Waste Handling:

• AUTOMATIC BOTTLE WASHER:

Chemistry Procedures and Safety

• Lab Chemical Safety Procedures - Guides for PPE, equipment usage, chemical handling, storage and transfer.

• Wet Chemistry Resources Page - Contains fabrication recipes and procedures

• Search for Safety Data Sheets (SDS)

• Lab Rules & Safety - KNI cleanroom safety handbook

Chemical Lists

• Chemicals Provided by the KNI with typical SDS

• Approved Chemicals with typical SDS