Difference between revisions of "Wet Chemistry"

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==Facilities==
==Facilities==


'''Available Wet Benches located inside the Wet Chemistry Room:'''
'''Wet Benches inside the Wet Chemistry Room:'''


*ACID BENCH: Personal Protective Equipment required to be worn.
*ACID BENCH: Personal Protective Equipment required to be worn.
*BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn.
*BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn.
*ELECTROPLATING BENCH:  Double Nitrile Gloves and Safety Glasses required to be worn.
*ELECTROPLATING BENCH:  Protective Equipment required to be worn.
*HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn.
*HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn.
*KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
*KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
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*2)  Face Shield  - PUT ON SECOND, Remove Second
*2)  Face Shield  - PUT ON SECOND, Remove Second
*3)  Trionic E-194 Tripoly Acid Resistant Gloves - PUT ON LAST, Remove First
*3)  Trionic E-194 Tripoly Acid Resistant Gloves - PUT ON LAST, Remove First
Write Name and Date on the cuff of both Trionic gloves when opening package.




'''Available Wet Benches located inside the Optical Lithography Room:'''
'''Wet Benches inside the Optical Lithography Room:'''
*DEVELOP BENCH:  BASE/CAUSTIC processing only.  Double Nitrile Gloves and Safety Glasses required to be worn.  Solvent Develop must be done in SOLVENT BENCH in Wet Chemistry Room.
*DEVELOP BENCH:  BASE/CAUSTIC processing only.  Double Nitrile Gloves and Safety Glasses required to be worn.  Solvent Develop must be done in SOLVENT BENCH in Wet Chemistry Room.
'''Available Fume Hoods inside the Optical Lithography Room:'''
*SPINNER BENCH: Laurell 1 (SU8 only), Laurell 2, and Headway Spinner (Large Substrates and special Coatings) Solvents Only.
*Hot Plate Bench:  Solvents Only.


'''Available Wet Benches located inside the E-beam Lithography Area:'''
'''Wet Benches located inside the E-beam Lithography Area:'''
*DEVELOP and SPINNER BENCH:  SOLVENT processing only.  Double Nitrile Gloves and Safety Glasses required to be worn.
*DEVELOP and SPINNER BENCH:  SOLVENT processing only.  Double Nitrile Gloves and Safety Glasses required to be worn.
'''Hazardous Waste Handling:'''
'''Hazardous Waste Handling:'''
* [https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Hazardous Waste Handling Video]
*AUTOMATIC BOTTLE WASHER:  Located inside the Wet Chemistry Room
*AUTOMATIC BOTTLE WASHER:  Located inside the Wet Chemistry Room
*SATELLITE ACCUMULATION AREA:  For storage of TAGGED FULL WASTE BOTTLES, the cart is located in the Oxford Chase next to the Water Chiller.  There is a bin on the floor next to the cart for storage of "DOUBLE BAGGED AND TAGGED" waste which can also be used for TAGGED ITEMS that do not fit inside the cart.
*SATELLITE ACCUMULATION AREA:  For storage of TAGGED FULL WASTE BOTTLES, the cart is located in the Oxford Chase next to the Water Chiller.  There is a bin on the floor next to the cart for storage of "DOUBLE BAGGED AND TAGGED" waste which can also be used for TAGGED ITEMS that do not fit inside the cart.

Revision as of 17:05, 11 September 2020

Wet Chemistry
Wet-Chemistry Solvents-and-HF.jpg
Instrument Type Wet Chemistry
Techniques Wet Chemical Processing:
Acids, Bases, Solvents,
and Electroplating
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Reserve time on LabRunr
Request training by email
Lab Location B211 Steele
Lab Phone 626-395-1538
Manufacturer NA
Model NA

Facilities

Wet Benches inside the Wet Chemistry Room:

  • ACID BENCH: Personal Protective Equipment required to be worn.
  • BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn.
  • ELECTROPLATING BENCH: Protective Equipment required to be worn.
  • HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn.
  • KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
  • SOLVENTS BENCH: Double Nitrile Gloves and Safety Glasses required to be worn.

------> Note: Personal Protective Equipment or "PPE" consists of:

  • 1) Acid Resistant Apron (Green) - PUT ON FIRST, Remove Last
  • 2) Face Shield - PUT ON SECOND, Remove Second
  • 3) Trionic E-194 Tripoly Acid Resistant Gloves - PUT ON LAST, Remove First

Write Name and Date on the cuff of both Trionic gloves when opening package.


Wet Benches inside the Optical Lithography Room:

  • DEVELOP BENCH: BASE/CAUSTIC processing only. Double Nitrile Gloves and Safety Glasses required to be worn. Solvent Develop must be done in SOLVENT BENCH in Wet Chemistry Room.

Available Fume Hoods inside the Optical Lithography Room:

  • SPINNER BENCH: Laurell 1 (SU8 only), Laurell 2, and Headway Spinner (Large Substrates and special Coatings) Solvents Only.
  • Hot Plate Bench: Solvents Only.

Wet Benches located inside the E-beam Lithography Area:

  • DEVELOP and SPINNER BENCH: SOLVENT processing only. Double Nitrile Gloves and Safety Glasses required to be worn.

Hazardous Waste Handling:

  • KNI Hazardous Waste Handling Video
  • AUTOMATIC BOTTLE WASHER: Located inside the Wet Chemistry Room
  • SATELLITE ACCUMULATION AREA: For storage of TAGGED FULL WASTE BOTTLES, the cart is located in the Oxford Chase next to the Water Chiller. There is a bin on the floor next to the cart for storage of "DOUBLE BAGGED AND TAGGED" waste which can also be used for TAGGED ITEMS that do not fit inside the cart.

Chemistry Procedures and Safety

Chemical Lists