Provided Chemicals: Difference between revisions
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===== Chemicals Provided by the KNI with typical SDS===== | ===== Chemicals Provided by the KNI with typical SDS===== | ||
* [https://caltech.box.com/s/41v6o6ewk4sp7zk9jwi1j6qizanourm5 495 PMMA Series Resists in Anisole] | |||
* [https://caltech.box.com/s/dje0cyngzsw0s9bh94gfttaf196wlfkg 495 PMMA Series Resists in Chlorobenzene] | |||
* [https://caltech.box.com/s/emml8gjinzd2ltvkoaxjcfmhf1lbfuir 950 PMMA Series Resists in Anisole] | |||
* [https://caltech.box.com/s/b9236z0q5mwrlieztlmz6yashjpd9qtk 950 PMMA Series Resists in Chlorobenzene] | |||
* [https://caltech.box.com/s/vi41cjm27b45uqjfiusl3vh87y8v5de4 Acetic Acid Glacial] | * [https://caltech.box.com/s/vi41cjm27b45uqjfiusl3vh87y8v5de4 Acetic Acid Glacial] | ||
* [https://caltech.box.com/s/3zz1ugq1qgtwmc29o54313sy8u7an9hd Acetone] | * [https://caltech.box.com/s/3zz1ugq1qgtwmc29o54313sy8u7an9hd Acetone] | ||
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* [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist] | * [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist] | ||
* [https://caltech.box.com/s/xsouakt5afpirwsj2t2otve9bqo6nkzx AZ 726 MIF Developer] | * [https://caltech.box.com/s/xsouakt5afpirwsj2t2otve9bqo6nkzx AZ 726 MIF Developer] | ||
* AZ | * [https://caltech.box.com/s/o7qjg43cnvb55k6w0sx067y5netfifbx AZ 9245 Photoresist] | ||
* [https://caltech.box.com/s/tzlrksotkvvxffn057pzm4sxmvfxr602 AZ 9260 Photoresist] | |||
* [https://caltech.box.com/s/k57xhduqj2oq0vquptvs9f4yd4lnasht AZ NLOF 2020 Photoresist] | |||
* [https://caltech.box.com/s/wq6fke9gwznukrb8yt4cpbgjb247w5x2 AZ NLOF 2035 Photoresist] | |||
* [https://caltech.box.com/s/3e4noqd5y54kq52n2hzxrswsc59j32q2 AZ NLOF 2070 Photoresist] | |||
* [https://caltech.box.com/s/awbuaoxtg1ezbl08r39wsadxt9eeni9c AZ P4620 Photoresist] | |||
* [https://caltech.box.com/s/nbbptm14e4ejc5kc9bjm8x0aa074pnla CD 26 Developer] | * [https://caltech.box.com/s/nbbptm14e4ejc5kc9bjm8x0aa074pnla CD 26 Developer] | ||
* [https://caltech.box.com/s/ejr2qph7nits1eaelm1f21s1oowrou0d Chromium Etchant CR-7S] | * [https://caltech.box.com/s/ejr2qph7nits1eaelm1f21s1oowrou0d Chromium Etchant CR-7S] | ||
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* [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] | * [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] | ||
* [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | * [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | ||
* [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 | * [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nanostrip] | ||
* [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)] | * [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)] | ||
* [https://caltech.box.com/s/cmq0uvsm78jj0hxzp2q5bozdhrttz5sx PGMEA (Propylene glycol monomethyl ether acetate)] | * [https://caltech.box.com/s/cmq0uvsm78jj0hxzp2q5bozdhrttz5sx PGMEA (Propylene glycol monomethyl ether acetate)] | ||
* [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)] | * [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)] | ||
* [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] | * [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] | ||
* [https://caltech.box.com/s/clxx77yqllfxz7us1tmih29v3vhiyvnl S1805 Photoresist] | |||
* [https://caltech.box.com/s/osts75gximolfc9o5sag2u1xwzyfrzpy S1813 Photoresist] | * [https://caltech.box.com/s/osts75gximolfc9o5sag2u1xwzyfrzpy S1813 Photoresist] | ||
* [https://caltech.box.com/s/698pk3xjr6feh9wv9q8gojeyyp9ogpl7 S1818 Photoresist] | |||
* [https://caltech.box.com/s/avqs14mt28i1epom0n6w37p55rjqvkbe SU-8 Developer] | * [https://caltech.box.com/s/avqs14mt28i1epom0n6w37p55rjqvkbe SU-8 Developer] | ||
* [https://caltech.box.com/s/89j0lgduzv1hqnewgfr5rrkigxcpw5b3 Sulfuric Acid (H<sub>2</sub>SO<sub>4</sub>)] | * [https://caltech.box.com/s/89j0lgduzv1hqnewgfr5rrkigxcpw5b3 Sulfuric Acid (H<sub>2</sub>SO<sub>4</sub>)] | ||
Revision as of 16:59, 28 July 2022
Chemicals Provided by the KNI with typical SDS
- 495 PMMA Series Resists in Anisole
- 495 PMMA Series Resists in Chlorobenzene
- 950 PMMA Series Resists in Anisole
- 950 PMMA Series Resists in Chlorobenzene
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- AZ 3330-F Photoresist
- AZ 400K Developer
- AZ 5214-E Photoresist
- AZ 726 MIF Developer
- AZ 9245 Photoresist
- AZ 9260 Photoresist
- AZ NLOF 2020 Photoresist
- AZ NLOF 2035 Photoresist
- AZ NLOF 2070 Photoresist
- AZ P4620 Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Dichloromethane (Methylene Chlorine)
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid Improved (BHF)
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol (Methyl alcohol)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- MF 319 Developer
- Nanostrip
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- PGMEA (Propylene glycol monomethyl ether acetate)
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- S1805 Photoresist
- S1813 Photoresist
- S1818 Photoresist
- SU-8 Developer
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)