Difference between revisions of "Process Recipe Library"

From the KNI Lab at Caltech
Jump to navigation Jump to search
 
(11 intermediate revisions by 4 users not shown)
Line 11: Line 11:
* [https://caltech.box.com/s/lijnz00qwpk7z5qbz8kn9tjo0kqfgz4a HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)]
* [https://caltech.box.com/s/lijnz00qwpk7z5qbz8kn9tjo0kqfgz4a HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)]
* [https://caltech.box.com/s/vg9rpa4ac9e1eki79hfecccpohl3qp6u Performing Aligned EBL Patterning Steps with NPGS on an SEM] | [https://caltech.box.com/s/tl4bliegxptu5tfmzu0p7vs1hcnxtyj8 Alignment Template Files]
* [https://caltech.box.com/s/vg9rpa4ac9e1eki79hfecccpohl3qp6u Performing Aligned EBL Patterning Steps with NPGS on an SEM] | [https://caltech.box.com/s/tl4bliegxptu5tfmzu0p7vs1hcnxtyj8 Alignment Template Files]
* [https://caltech.box.com/s/nwuxjbfm0fp0lb4k12albsr3zbnqk9po Bi-Layer PMMA Resist Spinning Recipe]
* [https://caltech.app.box.com/file/634677863695 ma-N Chrome Mask Writing/Etching Recipe]


===== Helium Ion Beam Lithography =====
===== Helium Ion Beam Lithography =====
Line 19: Line 21:


===== Optical Lithography =====
===== Optical Lithography =====
* [https://caltech.box.com/s/5ls5rk4oanod66pfilsuendthutcmfqu AZ5214 Photoresist spinning procedure]
* [https://caltech.box.com/s/5ls5rk4oanod66pfilsuendthutcmfqu AZ5214 Photoresist Recipe]
* [https://caltech.box.com/s/xqwbmcj7l4itj6nqp6lbo7h4vexee0tr AZ9260 Photoresist spinning procedure]
* [https://caltech.box.com/s/sq7yuzpfhuanmsrs4nswk5t05vt3adk9 Suss Mask Aligner - Double Side Alignment using AZ5214 Resist]
* [https://caltech.box.com/s/xqwbmcj7l4itj6nqp6lbo7h4vexee0tr AZ9260 Photoresist Recipe]
* [https://caltech.box.com/s/6et86m5wlrjf80ew9yo0v8rgjifsdzfs AZ nLof 2000 Photoresist Recipe]
* [https://caltech.box.com/s/6et86m5wlrjf80ew9yo0v8rgjifsdzfs AZ nLof 2000 Photoresist Recipe]
* [https://caltech.box.com/s/3pa2im5jj1e86rdozwigt8yfnb8fi5k3 S1813 Photoresist spinning procedure]
* [https://caltech.box.com/s/zpnz9i72rrzn2jzfn2gxd8cf0yw19uig NR9-1000PY Photoresist Recipe]
* [https://caltech.box.com/s/3pa2im5jj1e86rdozwigt8yfnb8fi5k3 S1813 Photoresist Recipe]
* [https://caltech.app.box.com/file/634671303816 SU-8 Photoresist Recipe]
* [https://caltech.box.com/s/3bw1oifk4uysj4ehmyeivhngmkpt0r4p Lift-Off with LOR7B & S1805 Photoresist Recipe]


== Deposition Process Recipes ==
== Deposition Process Recipes ==
Line 42: Line 48:
* [https://caltech.box.com/s/3b9zbdj1uoazz7zbz8png25c2ba65vas Comparison of etch rates using different sample-fixing oils]
* [https://caltech.box.com/s/3b9zbdj1uoazz7zbz8png25c2ba65vas Comparison of etch rates using different sample-fixing oils]
* [https://caltech.box.com/s/vbjlzmbprhw1sg3auoz1oso5clwrme87 In-situ (dielectric sputter) RF plasma etch of thermal SiO2]
* [https://caltech.box.com/s/vbjlzmbprhw1sg3auoz1oso5clwrme87 In-situ (dielectric sputter) RF plasma etch of thermal SiO2]
* [https://caltech.box.com/s/40kaaqur8ohyg55uq2pv3jqrzlgi98ts Comparison of Pseudo-Bosch ICP-RIE Etch of SiO2-SiNx]
* [https://caltech.box.com/s/wemw91xtjrh7ac34ks9ai3lv1oujivxa Al2O3 Etch in Oxford ICP and Plasmatherm RIE]


===== Wet Etching =====
===== Wet Etching =====
Line 65: Line 73:
* [https://caltech.box.com/s/lstv8e5zy94fnt3o0y7urfw41mpesd38 Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns]
* [https://caltech.box.com/s/lstv8e5zy94fnt3o0y7urfw41mpesd38 Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns]
**[https://caltech.box.com/s/59upcnvhlqulnazm51b0dihd942xebn3 All Resources for SAED Evaluation, including DPs captured of standard samples]
**[https://caltech.box.com/s/59upcnvhlqulnazm51b0dihd942xebn3 All Resources for SAED Evaluation, including DPs captured of standard samples]
== Thermal Processing ==
===== Wet Oxidation =====
* [https://caltech.box.com/s/nqiiqwlhip4dcult2mtuvvdlxw0gv086 Wet Oxidation at 1000C on Tystar Tube Furnaces]


== Multi-Technique Fabrication Processes ==
== Multi-Technique Fabrication Processes ==
* [https://caltech.box.com/s/ohm3fp2h3203yxi6j8peo8bf4v1mz0yt Si-W notched nanopillar fabrication]
* [https://caltech.box.com/s/ohm3fp2h3203yxi6j8peo8bf4v1mz0yt Si-W notched nanopillar fabrication]

Latest revision as of 23:48, 31 March 2020

You can browse the available recipes below, by lab area. You can also browse directly within the KNI's Box directory. Note that the vast majority of recipes are being made publicly available; only a select few are password-protected for members of the Caltech community:

  1. All Content (requires login with a caltech.edu email address)
  2. Publicly available content (no login required)


Lithography Process Recipes

Electron Beam Lithography
Helium Ion Beam Lithography
Neon Ion Beam Lithography
Optical Lithography

Deposition Process Recipes

Sputtering
Chemical Vapor Deposition (CVD)

Etching Process Recipes

Dry Etching
Wet Etching

Microscopy Process Recipes

Focused Ion Beam (FIB) Systems
Scanning Electron Microscopes (SEMs)
Transmission Electron Microscopes (TEMs)

Thermal Processing

Wet Oxidation

Multi-Technique Fabrication Processes