Difference between revisions of "Process Recipe Library"
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You can browse the available recipes below, by lab area. You can also browse directly within the KNI's | You can browse the available recipes below, by lab area. You can also browse directly within the KNI's Box directory. Note that the vast majority of recipes are being made publicly available; only a select few are password-protected for members of the Caltech community: | ||
# [https://caltech.app.box.com/folder/89929833301 All Content (requires login with a caltech.edu email address)] | # [https://caltech.app.box.com/folder/89929833301 All Content (requires login with a caltech.edu email address)] | ||
# [https://caltech.box.com/s/uqtkc7xev3xvda2ueykt7cj1886ok1mg Publicly available content (no login required)] | # [https://caltech.box.com/s/uqtkc7xev3xvda2ueykt7cj1886ok1mg Publicly available content (no login required)] | ||
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== Lithography Process Recipes == | == Lithography Process Recipes == | ||
===== Electron Beam Lithography ===== | ===== Electron Beam Lithography ===== | ||
* [https://caltech.app.box.com/file/549582924881 ZEP 520A | * [https://maebl.slab.com/public/topics/maeb-lpedia-o7iux3pl Meeting for Advanced EBeam Lithography (MAEBL) MAEBLpedia - no login required] | ||
* [https://caltech.box.com/s/0xofm2zqmhzm6tv85ihfnhdhzuo8jpjg KNI Introduction to BEAMER] | |||
* [https://youtu.be/AV-SeYZktu4 How to Spin Photoresist onto Wafers and Pieces (Video)] | |||
* [https://caltech.app.box.com/file/549582924881 ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)] | |||
* [https://caltech.box.com/s/lijnz00qwpk7z5qbz8kn9tjo0kqfgz4a HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)] | |||
* [https://caltech.box.com/s/vg9rpa4ac9e1eki79hfecccpohl3qp6u Performing Aligned EBL Patterning Steps with NPGS on an SEM] | [https://caltech.box.com/s/tl4bliegxptu5tfmzu0p7vs1hcnxtyj8 Alignment Template Files] | |||
* [https://caltech.box.com/s/nwuxjbfm0fp0lb4k12albsr3zbnqk9po Bi-Layer PMMA Resist Spinning Recipe] | |||
* [https://caltech.app.box.com/file/634677863695 ma-N Chrome Mask Writing/Etching Recipe] | |||
===== Helium Ion Beam Lithography ===== | |||
* [https://caltech.box.com/s/3s0k77mgx26ytfnafttpoalcknmk7npu Helium Ion Beam Lithography (HIBL) – Parameter Guide] | |||
===== Neon Ion Beam Lithography ===== | |||
* [https://caltech.box.com/s/y8k2a4xnan8x2jte2ss587gh2o2pfs4h Ne-FIB Hard Mask Lithography on ALD Films – Parameter Guide] | |||
===== Optical Lithography ===== | ===== Optical Lithography ===== | ||
* [https://caltech.box.com/s/5ls5rk4oanod66pfilsuendthutcmfqu AZ5214 | * [https://caltech.box.com/s/5ls5rk4oanod66pfilsuendthutcmfqu AZ5214 Photoresist Recipe] | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/sq7yuzpfhuanmsrs4nswk5t05vt3adk9 Suss Mask Aligner - Double Side Alignment using AZ5214 Resist] | ||
* [https://caltech.box.com/s/xqwbmcj7l4itj6nqp6lbo7h4vexee0tr AZ9260 Photoresist Recipe] | |||
* [https://caltech.box.com/s/6et86m5wlrjf80ew9yo0v8rgjifsdzfs AZ nLof 2000 Photoresist Recipe] | |||
* [https://caltech.box.com/s/zpnz9i72rrzn2jzfn2gxd8cf0yw19uig NR9-1000PY Photoresist Recipe] | |||
* [https://caltech.box.com/s/3pa2im5jj1e86rdozwigt8yfnb8fi5k3 S1813 Photoresist Recipe] | |||
* [https://caltech.app.box.com/file/634671303816 SU-8 Photoresist Recipe] | |||
* [https://caltech.box.com/s/3bw1oifk4uysj4ehmyeivhngmkpt0r4p Lift-Off with LOR7B & S1805 Photoresist Recipe] | |||
== Deposition Process Recipes == | == Deposition Process Recipes == | ||
===== Sputtering ===== | ===== Sputtering ===== | ||
* [https://caltech.box.com/s/z043k1ne91oowp70lzt69kau0u2nq79f SnO<sub>2</sub> sputtering recipe] | |||
* [https://caltech.box.com/s/oxxv5sy3j7wbqyjc8r9x2wqheabne2lg NbO<sub>x</sub> sputtering recipe] | |||
* [https://caltech.box.com/s/95qrpvvggcaztmpc7whd9v9o4d9rih5x TiO<sub>2</sub> sputtering recipe] | * [https://caltech.box.com/s/95qrpvvggcaztmpc7whd9v9o4d9rih5x TiO<sub>2</sub> sputtering recipe] | ||
* [https://caltech.box.com/s/k669kh04xglamkidhuo7xq04xan146xt AlN sputtering recipe] | |||
* [https://caltech.box.com/s/7cqdk2g5ic2wa35lu4y2fu03esfk7sdy Al<sub>2</sub>O<sub>3</sub> sputtering recipe] | |||
* [https://caltech.box.com/s/a49yh35hkb2x5qnskivzde0y8z0o4cpn Guide to maintaining a plasma using gradual pressure changes] | * [https://caltech.box.com/s/a49yh35hkb2x5qnskivzde0y8z0o4cpn Guide to maintaining a plasma using gradual pressure changes] | ||
===== Chemical Vapor Deposition (CVD) ===== | ===== Chemical Vapor Deposition (CVD) ===== | ||
* [https://caltech.box.com/s/qnxzioeoudzbnow9aopguf9xkysxsey3 PECVD amorphous Si recipe] | * [https://caltech.box.com/s/qnxzioeoudzbnow9aopguf9xkysxsey3 PECVD amorphous Si recipe] | ||
* [https://caltech.box.com/s/gy10uau7tikhvhakgpjvlzalb7boavbv PECVD SiO2 (350 C) recipe] | |||
== Etching Process Recipes == | == Etching Process Recipes == | ||
===== Dry Etching ===== | ===== Dry Etching ===== | ||
* [https://caltech.box.com/s/8zfqalb9u11l31mj3iwydofa8qecyp47 Aluminum Etch via Chlorine/Methane/Hydrogen] | |||
* [https://caltech.box.com/s/3b9zbdj1uoazz7zbz8png25c2ba65vas Comparison of etch rates using different sample-fixing oils] | * [https://caltech.box.com/s/3b9zbdj1uoazz7zbz8png25c2ba65vas Comparison of etch rates using different sample-fixing oils] | ||
* [https://caltech.box.com/s/vbjlzmbprhw1sg3auoz1oso5clwrme87 In-situ (dielectric sputter) RF plasma etch of thermal SiO2] | |||
* [https://caltech.box.com/s/40kaaqur8ohyg55uq2pv3jqrzlgi98ts Comparison of Pseudo-Bosch ICP-RIE Etch of SiO2-SiNx] | |||
* [https://caltech.box.com/s/wemw91xtjrh7ac34ks9ai3lv1oujivxa Al2O3 Etch in Oxford ICP and Plasmatherm RIE] | |||
===== Wet Etching ===== | |||
* [https://caltech.box.com/s/ob0wosa8tp79xo3wa3taxbjy24kya6qs HF etching of SiO2 deposited via wet thermal oxidation] | |||
* [https://caltech.box.com/s/fjww9pngq4fwzbd26iz5rci4cyc5jv0b HF etching of SiO2 deposited via PECVD] | |||
== Microscopy Process Recipes == | == Microscopy Process Recipes == | ||
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* [https://caltech.box.com/s/1nmp75l3166vj9t1vwwpwu2zyfc4j6ol Cutting & Imaging Cross-sections with SEM/Ga-FIB] | * [https://caltech.box.com/s/1nmp75l3166vj9t1vwwpwu2zyfc4j6ol Cutting & Imaging Cross-sections with SEM/Ga-FIB] | ||
* [https://caltech.box.com/s/3l3w507dxwosuya3nbxgk30tdqyp4qy9 Preparing TEM Lamella Samples with SEM/Ga-FIB] | * [https://caltech.box.com/s/3l3w507dxwosuya3nbxgk30tdqyp4qy9 Preparing TEM Lamella Samples with SEM/Ga-FIB] | ||
* [https://caltech.box.com/s/qobquoi3hs0izeyhdg5d8px9wmmdzuxw Source | ** [https://caltech.box.com/s/lhaweqbefmep8n79u4nvynsv0cjctuc1 Process Recipe for TEM Lamella prep for Thin Films on Si Substrates] | ||
* [https://caltech.box.com/s/3s0k77mgx26ytfnafttpoalcknmk7npu Helium Ion Beam Lithography (HIBL) – Parameter Guide] | |||
* [https://caltech.box.com/s/y8k2a4xnan8x2jte2ss587gh2o2pfs4h Ne-FIB Hard Mask Lithography on ALD Films – Parameter Guide] | |||
* [https://caltech.box.com/s/ybdwd4zi39p62bx13rc7f8o54444vuyz Helium Ion Beam Imaging with the Electron Flood Gun – Parameter Guide] | |||
* [https://caltech.box.com/s/qobquoi3hs0izeyhdg5d8px9wmmdzuxw Source Rebuild Guide for ORION NanoFab He- & Ne-FIB] | |||
===== Scanning Electron Microscopes (SEMs) ===== | ===== Scanning Electron Microscopes (SEMs) ===== | ||
* [https://caltech.box.com/s/e5cdnag69i2w9nm1d0p07fyun4k15b5c Environmental SEM (ESEM) Imaging Guide (for biological and highly non-conductive specimens)] | * [https://caltech.box.com/s/e5cdnag69i2w9nm1d0p07fyun4k15b5c Environmental SEM (ESEM) Imaging Guide (for biological and highly non-conductive specimens)] | ||
* [https://caltech.box.com/s/vg9rpa4ac9e1eki79hfecccpohl3qp6u Performing Aligned EBL Patterning Steps with NPGS on an SEM] | [https://caltech.box.com/s/tl4bliegxptu5tfmzu0p7vs1hcnxtyj8 Alignment Template Files] | |||
===== Transmission Electron Microscopes (TEMs) ===== | ===== Transmission Electron Microscopes (TEMs) ===== | ||
* [https://caltech.box.com/s/fwhkep9qf3bhdygshvfi4dycy2qpmi0i STEM mode EDS on TF-20 TEM (emphasis on high-resolution 2D mapping)] | * [https://caltech.box.com/s/fwhkep9qf3bhdygshvfi4dycy2qpmi0i STEM mode EDS on TF-20 TEM (emphasis on high-resolution 2D mapping)] | ||
* [https://caltech.box.com/s/lstv8e5zy94fnt3o0y7urfw41mpesd38 Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns] | |||
**[https://caltech.box.com/s/59upcnvhlqulnazm51b0dihd942xebn3 All Resources for SAED Evaluation, including DPs captured of standard samples] | |||
== Thermal Processing == | |||
===== Wet Oxidation ===== | |||
* [https://caltech.box.com/s/nqiiqwlhip4dcult2mtuvvdlxw0gv086 Wet Oxidation at 1000C on Tystar Tube Furnaces] | |||
== Multi-Technique Fabrication Processes == | |||
* [https://caltech.box.com/s/ohm3fp2h3203yxi6j8peo8bf4v1mz0yt Si-W notched nanopillar fabrication] | |||
Latest revision as of 04:28, 31 October 2022
You can browse the available recipes below, by lab area. You can also browse directly within the KNI's Box directory. Note that the vast majority of recipes are being made publicly available; only a select few are password-protected for members of the Caltech community:
- All Content (requires login with a caltech.edu email address)
- Publicly available content (no login required)
Lithography Process Recipes
Electron Beam Lithography
- Meeting for Advanced EBeam Lithography (MAEBL) MAEBLpedia - no login required
- KNI Introduction to BEAMER
- How to Spin Photoresist onto Wafers and Pieces (Video)
- ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
- HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
- Performing Aligned EBL Patterning Steps with NPGS on an SEM | Alignment Template Files
- Bi-Layer PMMA Resist Spinning Recipe
- ma-N Chrome Mask Writing/Etching Recipe
Helium Ion Beam Lithography
Neon Ion Beam Lithography
Optical Lithography
- AZ5214 Photoresist Recipe
- Suss Mask Aligner - Double Side Alignment using AZ5214 Resist
- AZ9260 Photoresist Recipe
- AZ nLof 2000 Photoresist Recipe
- NR9-1000PY Photoresist Recipe
- S1813 Photoresist Recipe
- SU-8 Photoresist Recipe
- Lift-Off with LOR7B & S1805 Photoresist Recipe
Deposition Process Recipes
Sputtering
- SnO2 sputtering recipe
- NbOx sputtering recipe
- TiO2 sputtering recipe
- AlN sputtering recipe
- Al2O3 sputtering recipe
- Guide to maintaining a plasma using gradual pressure changes
Chemical Vapor Deposition (CVD)
Etching Process Recipes
Dry Etching
- Aluminum Etch via Chlorine/Methane/Hydrogen
- Comparison of etch rates using different sample-fixing oils
- In-situ (dielectric sputter) RF plasma etch of thermal SiO2
- Comparison of Pseudo-Bosch ICP-RIE Etch of SiO2-SiNx
- Al2O3 Etch in Oxford ICP and Plasmatherm RIE
Wet Etching
Microscopy Process Recipes
Focused Ion Beam (FIB) Systems
- Cutting & Imaging Cross-sections with SEM/Ga-FIB
- Preparing TEM Lamella Samples with SEM/Ga-FIB
- Helium Ion Beam Lithography (HIBL) – Parameter Guide
- Ne-FIB Hard Mask Lithography on ALD Films – Parameter Guide
- Helium Ion Beam Imaging with the Electron Flood Gun – Parameter Guide
- Source Rebuild Guide for ORION NanoFab He- & Ne-FIB
Scanning Electron Microscopes (SEMs)
- Environmental SEM (ESEM) Imaging Guide (for biological and highly non-conductive specimens)
- Performing Aligned EBL Patterning Steps with NPGS on an SEM | Alignment Template Files
Transmission Electron Microscopes (TEMs)
- STEM mode EDS on TF-20 TEM (emphasis on high-resolution 2D mapping)
- Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns