Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe

Nova 600 NanoLab Instrument Type Microscopy Techniques SEM, Ga-FIB, Omniprobe, Immersion Lens Imaging, GIS, Cross-sectioning, TEM Lamella Sample Prep Staff Manager Matthew S. Hunt, PhD Staff Email matthew.hunt@caltech.edu Staff Phone 626-395-5994 Reserve time on LabRunr Request training by email Sign up for SEM-FIB email list Lab Location B233B Steele Lab Phone 626-395-1534 Manufacturer FEI (now Thermo Fisher) Model {{{Model}}}

Description

The Nova 600 is a "dual beam" system that combines a scanning electron microscope (SEM) with a gallium focused ion beam (Ga-FIB). It can be used to capture high quality images (with sub-10 nm resolution) and perform site-specific etching and material deposition (with sub-50 nm resolution). It is also equipped with an Omniprobe lift-out system for TEM lamella sample preparation. See a full list of training and educational resources for this instrument below.

SEM Applications

• Ultra-High-Resolution Imaging (Immersion Mode)
• High-Resolution Imaging (Field-Free Mode)
• Secondary Electron (SE) & Backscattered Electron (BSE) Imaging
• Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
• Platinum deposition via Gas Injection System (GIS)

Ga-FIB Applications

• Directly etch patterns into material
• Cutting & Imaging Cross-Sections
• TEM Lamella Sample Preparation using an Omniprobe for Liftout
• Platinum & SiO_x deposition via GIS
• Enhanced etch with XeF₂ via GIS
• Automated patterning with RunScript program & AutoScript language

Resources

SOPs & Troubleshooting

• SEM SOPs (Short Version | Long Version)
• Ga-FIB SOPs (Short Version | Long Version)
• TEM Lamella Sample Preparation SOPs (Short Version | Long Version)
• Cutting & Imaging Cross-Sections SOP
• Troubleshooting Guide

Video Tutorials

• Getting Started | Basic SEM Alignment
• Astigmatism Correction (Details | On Right-Angle Features | Stigmator Alignment)
• Eucentric Height: What it means, When to use it & How to get there
• TEM Lamella Sample Prep (Playlist)
• Cutting & Imaging Cross-sections (Playlist)
• Milling Non-Conductive Samples using Charge Compensation
• Perfecting Ga-FIB Alignments
• Adjusting TLD Voltage to Capture SE vs. BSE Signal

Graphical Handouts

• SEM Concepts
• Ga-FIB Concepts
• SEM & Ga-FIB Alignments
• Guide to Optimizing SEM Imaging

Presentations

• Scanning Electron Microscopy: Principles, Techniques & Applications
• Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications

Manufacturer Manuals

• Nova NanoLab Operation Manual
• Gas Injection Systems – Deposition of Platinum (Technical Note)
• Gas Injection Systems – Deposition of SiOx (Technical Note)
• Gas Injection Systems – Etching with IEE aka XeF2 Etch (Technical Note)
• Gas Injection Systems – Beam Chemistries Presentation
• Scripting – AutoScript Language Manual (year 2000 Technical Note: most complete)
• Scripting – AutoScript Language Manual (year 2005 Technical Note: less complete, still useful)
• Scripting – RunScript Manual

Simulation Software

• CASINO Electron Beam Simulation Software – simulate e-beam/specimen interactions
• The Stopping & Range of Ions in Matter (SRIM) – simulate i-beam/specimen interactions

Order Your Own Stubs

• Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some old stubs at each SEM, yet you should buy your own so that you can keep them clean and available to you. There are many stub geometries and configurations, some of which will be right for you to purchase and keep with your other cleanroom items.
  • Buy stubs with copper clips (recommended for most devices, esp with non-conductive substrates);
  • Buy stubs without copper clips (ok for devices with conductive substrates)

Specifications

Manufacturer Specifications

• Nova 600 NanoLab Data Sheet (not all parameters apply to our instrument, see below for details specific to the KNI's Nova 600)

Scanning Electron Microscope (SEM) Specifications

• 0.5 to 30.0 kV
• Apertures: 10 mm, 15 mm, 20 mmm, 30 mm
• etc.

Gallium Focused Ion Beam (Ga-FIB) Specifications

• 5.0 to 30.0 kV
• 10 pA - 20 nA
• etc.