Difference between revisions of "Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe"

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* [http://www.srim.org/ The Stopping & Range of Ions in Matter (SRIM) – simulate i-beam/specimen interactions]
* [http://www.srim.org/ The Stopping & Range of Ions in Matter (SRIM) – simulate i-beam/specimen interactions]
===== Order Your Own Stubs =====
===== Order Your Own Stubs =====
* [https://www.tedpella.com/SEM_html/SEMclip.htm.aspx Buy stubs (with copper clips, recommended) from Ted Pella]
* Mounting stubs are considered a consumable item in the KNI. You should buy your own so that you can keep them clean and available to you. There are many stub geometries and configurations, some of which will be right for you to purchase and keep with your other cleanroom items:
* [https://www.tedpella.com/sem_html/SEMpinmount.htm Buy stubs (without copper clips) from Ted Pella]
* [https://www.tedpella.com/SEM_html/SEMclip.htm.aspx Buy stubs (with copper clips, recommended)];
* [https://www.tedpella.com/sem_html/SEMpinmount.htm Buy stubs (without copper clips, OK for conductive specimens)]

= Specifications =
= Specifications =

Revision as of 21:38, 24 April 2019

Nova 600 NanoLab
Instrument Type Microscopy
Techniques SEM, Ga-FIB, Omniprobe,
Immersion Lens Imaging,
GIS, Cross-sectioning,
TEM Lamella Sample Prep
Staff Manager Matthew S. Hunt, PhD
Staff Email matthew.hunt@caltech.edu
Staff Phone 626-395-5994
Reserve time on LabRunr
Request training by email
Sign up for SEM-FIB email list
Lab Location B233B Steele
Lab Phone 626-395-1534
Manufacturer FEI (now Thermo Fisher)
Model {{{Model}}}


The Nova 600 is a "dual beam" system that combines a scanning electron microscope (SEM) with a gallium focused ion beam (Ga-FIB). It can be used to capture high quality images (with sub-10 nm resolution) and perform site-specific etching and material deposition (with sub-50 nm resolution). It is also equipped with an Omniprobe lift-out system for TEM lamella sample preparation. See a full list of training and educational resources for this instrument below.

SEM Applications
  • Ultra-High-Resolution Imaging (Immersion Mode)
  • High-Resolution Imaging (Field-Free Mode)
  • Secondary Electron (SE) & Backscattered Electron (BSE) Imaging
  • Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
  • Platinum deposition via Gas Injection System (GIS)
Ga-FIB Applications
  • Directly etch patterns into material
  • Cutting & Imaging Cross-Sections
  • TEM Lamella Sample Preparation using an Omniprobe for Liftout
  • Platinum & SiOx deposition via GIS
  • Enhanced etch with XeF2 via GIS
  • Automated patterning with RunScript program & AutoScript language


SOPs & Troubleshooting
Video Tutorials
Graphical Handouts
Manufacturer Manuals
Simulation Software
Order Your Own Stubs


Manufacturer Specifications
Scanning Electron Microscope (SEM) Specifications
  • 0.5 to 30.0 kV
  • Apertures: 10 mm, 15 mm, 20 mmm, 30 mm
  • etc.
Gallium Focused Ion Beam (Ga-FIB) Specifications
  • 5.0 to 30.0 kV
  • 10 pA - 20 nA
  • etc.