Difference between revisions of "Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe"

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 61: Line 61:
===== Manufacturer Manuals =====
===== Manufacturer Manuals =====
* [https://caltech.box.com/s/og4309108q4k2jwhkaxqtpiujg2al5iu Nova NanoLab Operation Manual]
* [https://caltech.box.com/s/og4309108q4k2jwhkaxqtpiujg2al5iu Nova NanoLab Operation Manual]
* [https://caltech.box.com/s/36j0n01ig7f757kvkiebvqjqj0el2yvp EDAX Genesis EDS & WDS Operation Manual]
* [https://caltech.box.com/s/j0t3w6i53jhfjcva8i4qvlatdh7t1tzw Gas Injection Systems – Deposition of Platinum (Technical Note)]
* [https://caltech.box.com/s/j0t3w6i53jhfjcva8i4qvlatdh7t1tzw Gas Injection Systems – Deposition of Platinum (Technical Note)]
* [https://caltech.box.com/s/sm7q7teh5fo5hg3e6flkjbcbycmarrm3 Gas Injection Systems – Deposition of SiOx (Technical Note)]
* [https://caltech.box.com/s/sm7q7teh5fo5hg3e6flkjbcbycmarrm3 Gas Injection Systems – Deposition of SiOx (Technical Note)]
Line 68: Line 69:
* [https://caltech.box.com/s/n0abqy5z1e9a8hbyf38qybxu86sqz3vb Scripting – AutoScript Language Manual (year 2005 Technical Note: less complete, still useful)]
* [https://caltech.box.com/s/n0abqy5z1e9a8hbyf38qybxu86sqz3vb Scripting – AutoScript Language Manual (year 2005 Technical Note: less complete, still useful)]
* [https://caltech.box.com/s/tlqgvtkkiahi261megm087i61gqlfzrc Scripting – RunScript Manual]
* [https://caltech.box.com/s/tlqgvtkkiahi261megm087i61gqlfzrc Scripting – RunScript Manual]
===== Simulation Software =====
===== Simulation Software =====
* [http://www.gel.usherbrooke.ca/casino/What.html CASINO Electron Beam Simulation Software – simulate e-beam/specimen interactions]
* [http://www.gel.usherbrooke.ca/casino/What.html CASINO Electron Beam Simulation Software – simulate e-beam/specimen interactions]

Revision as of 23:36, 5 May 2019

Nova 600 NanoLab
KNI-Si-and-Pt-Pillar.jpg
Instrument Type Microscopy
Techniques SEM, Ga-FIB, Omniprobe,
Immersion Lens Imaging,
GIS, Cross-sectioning,
TEM Lamella Sample Prep
Staff Manager Matthew S. Hunt, PhD
Staff Email matthew.hunt@caltech.edu
Staff Phone 626-395-5994
Reserve time on LabRunr
Request training by email
Sign up for SEM-FIB email list
Lab Location B233B Steele
Lab Phone 626-395-1534
Manufacturer FEI (now Thermo Fisher)
Model {{{Model}}}
Nova-NanoLab-600.jpg

Description

The Nova 600 is a "dual beam" system that combines a field emission gun (FEG) scanning electron microscope (SEM) with a gallium focused ion beam (Ga-FIB). It can be used to capture high quality images (with sub-10 nm resolution) and perform site-specific etching and material deposition (with sub-50 nm resolution). It is also equipped with an Omniprobe nanomanipulator, which can be used to lift out lamella samples prepared for use in a transmission electron microscope (TEM). See a full list of training and educational resources for this instrument below.

SEM Applications
  • Ultra-High-Resolution Imaging (Immersion Mode aka UHR Mode)
  • High-Resolution Imaging (Field-Free Mode aka Normal Mode)
  • Secondary Electron (SE) imaging with an Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
  • Backscattered Electron (BSE) imaging with a TLD
  • Platinum deposition via Gas Injection System (GIS)
  • Automated imaging with RunScript program & AutoScript language
Ga-FIB Applications
  • Directly etch patterns into material
  • Cutting & Imaging Cross-Sections
  • TEM Lamella Sample Preparation using an Omniprobe for Liftout
  • Platinum & SiOx deposition via GIS
  • Enhanced etch with XeF2 via GIS
  • Automated patterning with RunScript program & AutoScript language

Resources

SOPs & Troubleshooting
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals
Simulation Software
Order Your Own Stubs

Specifications

Manufacturer Specifications
SEM Specifications
  • Minimum Feature Size Resolved in Immersion Mode: ~5 nm
  • Voltage Range: 0.2 to 30.0 kV
  • Current Range: ~10 pA to 20 nA
  • Apertures: 10 μm, 15 μm, 20 μm, 30 μm
  • Eucentric Height: ~5.15 mm working distance (WD)
  • Stage Range: +/- 80 mm X & Y travel, 12 mm Z travel, -12 to 58° tilt, 360° rotation
  • ETD Grid Bias Range: -150 to 300 V
  • TLD Bias Range: -100 to 150 V
  • Ultimate Vacuum: 5e-7 mbar
Ga-FIB Specifications
  • Minumum Probe Size Achieved: ~7 nm
  • Minimum Feature Size Etched: ~25 nm
  • Minimum Feature Size Resolved by Imaging: ~10 nm
  • Voltage Range: 5 to 30 kV
  • Current Range: 1 pA to 20 nA
  • Eucentric Height: ~5.15 mm working distance (WD)
  • Stage Tilt to be perpendicular to Ga-FIB: 52°
  • ETD Grid Bias Range: -150 to 300 V
  • TLD Bias Range: -100 to 150 V