Difference between revisions of "DWL-66: Direct-Write Laser System"

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|StaffPhone = 626-395-4075
|StaffPhone = 626-395-4075
|Manufacturer = Heidelberg Instruments
|Manufacturer = Heidelberg Instruments
|Techniques = Direct patterning,<br>Pattern alignment,</br>Wafer and mask patterning
|Model = DWL-66
|Techniques = Direct Patterning,<br>Pattern Alignment,</br>Wafer and Mask Patterning
|EmailList = kni-dwl66
|EmailList = kni-dwl66
|EmailListName =  DWL66
|EmailListName =  DWL66
}}
}}
== Description ==
== Description ==
The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.
The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi (dots per inch) is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.
===== Type1 Applications =====
===== Applications =====
* Direct writing
* Direct Writing
* Grayscale writing
* Grayscale Writing


== Resources ==
== Resources ==

Revision as of 19:42, 27 May 2019

DWL-66 Direct-Write Laser System
Heidelberg-DWL-66.jpg
Instrument Type Lithography
Techniques Direct Patterning,
Pattern Alignment,
Wafer and Mask Patterning
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Reserve time on LabRunr
Request training by email
Sign up for DWL66 email list
Lab Location B217 Steele
Lab Phone 626-395-1536
Manufacturer Heidelberg Instruments
Model DWL-66

Description

The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi (dots per inch) is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.

Applications
  • Direct Writing
  • Grayscale Writing

Resources

SOPs
Manufacturer Manuals

Specifications

  • Exposure: 442 nm wavelength HeCd laser