Difference between revisions of "Critical Point Dryer"

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 19: Line 19:
For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing these from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.  
For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing these from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.  
===== Applications =====
===== Applications =====
* Application1
* Prepare biological specimens for e.g. microscopy
* Application2
* Protect 3D-printed structures from surface tension damage in post-lithography processing
* Application3


== Resources ==
== Resources ==
===== SOPs & Troubleshooting =====
===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/BROKEN SOP]
* [https://caltech.box.com/s/b709i11f9cupsjyjl3nhhykvyqyuvlcz General SOP & Troubleshooting]
* [https://caltech.box.com/s/BROKEN Troubleshooting Guide]
===== Manufacturer Manual =====
===== Manufacturer Manual =====
* [https://caltech.box.com/s/BROKEN Manual ]
* [https://caltech.box.com/s/hkk7dboewyp9dr32i7f0fww6yaspcd3h Manual]


== Specifications ==
== Specifications ==
===== Manufacturer Specifications =====
===== Manufacturer Specifications =====
* [https://caltech.box.com/s/BROKEN Manufacturer Data Sheet]
* [https://caltech.box.com/s/hkk7dboewyp9dr32i7f0fww6yaspcd3h See Manual]
===== Notable Specifications =====
===== Notable Specifications =====
* Voltage Range: 0.5 to 30.0 kV
* Accommodated Sizes: Pieces & wafers up to 6"
* Aperture Sizes: 10 mm, 15 mm, 20 mmm, 30 mm
* etc.

Revision as of 21:25, 22 May 2019

Critical Point Dryer
Diamond-Lattice Eleftheria-Roumeli.jpg
Instrument Type Substrate Processing
Techniques Critical Point Drying
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Reserve time on LabRunr
Request training by email
Sign up for CPD email list
Lab Location B211 Steele
Lab Phone 626-395-1538
Manufacturer Tousimis
Model 915B
TA-915B-Critical-Point-Dryer.jpg

Description

For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing these from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.

Applications
  • Prepare biological specimens for e.g. microscopy
  • Protect 3D-printed structures from surface tension damage in post-lithography processing

Resources

SOPs & Troubleshooting
Manufacturer Manual

Specifications

Manufacturer Specifications
Notable Specifications
  • Accommodated Sizes: Pieces & wafers up to 6"