Critical Point Dryer

Critical Point Dryer Instrument Type Support Tools, Substrate Processing Techniques Critical Point Drying Staff Manager Bert Mendoza Staff Email bertm@caltech.edu Staff Phone 626-395-4075 Reserve time on FBS Request training via FBS User Dashboard Lab Location B211 Steele Lab Phone 626-395-1538 Manufacturer Tousimis Model 915B

Description

For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing them from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.

Applications

• Prepare biological specimens for e.g. microscopy
• Protect 3D-printed structures from surface tension damage in post-lithography processing

Resources

SOPs & Troubleshooting

• Tousimis 915B - SOP & Troubleshooting

Manufacturer Manual

• Tousimis Automegasamdri 915B Manual

Manufacturer Website

• Tousimis.com - Main page.
• Tousimis.com - Tousimis page for general sample holders.
• Tousimis can also fabricate special holders upon request.

• Tousimis.com - Tousimis page for wafer and chip holders.

Specifications

Manufacturer Specifications

• Tousimis Automegasamdri 915B Manual

Notable Specifications

• Accommodated Sizes: Pieces & wafers up to 6"