Provided Chemicals: Difference between revisions
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* [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | * [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | ||
* [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid] | * [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid] | ||
* [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Hydrofluoric Acid Improved | * [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Hydrofluoric Acid (Buffered Hudrofluoric Improved - BHF)] | ||
* [https://caltech.box.com/s/nnko75lma8nnimjmccnl0p2sa2bd9xbo Hydrofluoric Acid 49%] | |||
* [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>] | * [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>] | ||
* [https://caltech.box.com/s/7c02l4sctvfx0wplr4k6429yi0j8ew5q Isopropyl Alcohol (IPA)] | * [https://caltech.box.com/s/7c02l4sctvfx0wplr4k6429yi0j8ew5q Isopropyl Alcohol (IPA)] | ||
Revision as of 17:16, 26 January 2024
Chemicals Provided by the KNI with typical SDS
- 495 PMMA Series Resists in Anisole
- 495 PMMA Series Resists in Chlorobenzene
- 950 PMMA Series Resists in Anisole
- 950 PMMA Series Resists in Chlorobenzene
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- AZ 3330-F Photoresist
- AZ 400K Developer
- AZ 5214-E Photoresist
- AZ 726 MIF Developer
- AZ 9245 Photoresist
- AZ 9260 Photoresist
- AZ NLOF 2020 Photoresist
- AZ NLOF 2035 Photoresist
- AZ NLOF 2070 Photoresist
- AZ P4620 Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Crystal Bond 555
- Dichloromethane (Methylene Chlorine)
- EpoThin-2-Hardener
- EpoThin-2-Resin
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid (Buffered Hudrofluoric Improved - BHF)
- Hydrofluoric Acid 49%
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol (Methyl alcohol)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- MF 319 Developer
- Nanostrip
- PGMEA (Propylene glycol monomethyl ether acetate)
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- Release Agent
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- S1805 Photoresist
- S1813 Photoresist
- S1818 Photoresist
- SU-8 Developer
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)