Provided Chemicals: Difference between revisions
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* [https://caltech.box.com/s/oet38b107t13e5eyua3p5u40imggnqqs AZ 400K Developer] | * [https://caltech.box.com/s/oet38b107t13e5eyua3p5u40imggnqqs AZ 400K Developer] | ||
* [https://caltech.box.com/s/xsouakt5afpirwsj2t2otve9bqo6nkzx AZ 726 MIF Developer] | * [https://caltech.box.com/s/xsouakt5afpirwsj2t2otve9bqo6nkzx AZ 726 MIF Developer] | ||
* [https://caltech.box.com/s/oet38b107t13e5eyua3p5u40imggnqqs AZ 400K Developer] | |||
* [https://caltech.box.com/s/nl94m116yhas3lb7mcigvlxlscyo9g9w AZ 3330-F Photoresist] | |||
* AZ 4620 | * AZ 4620 | ||
* [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist] | * [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist] | ||
Revision as of 19:11, 25 July 2022
Chemicals Provided by the KNI with typical SDS
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- AZ 400K Developer
- AZ 726 MIF Developer
- AZ 400K Developer
- AZ 3330-F Photoresist
- AZ 4620
- AZ 5214-E Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Dichloromethane (Methylene Chlorine)
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid Improved (BHF)
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol (Methyl alcohol)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- MF 319 Developer
- Nano-strip and Nanostrip 2x
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- PGMEA (Propylene glycol monomethyl ether acetate)
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- S1813 Photoresist
- SU-8 Developer
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)