Provided Chemicals: Difference between revisions
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* [https://caltech.box.com/s/p0ipw68eugayo2skq1hqgnj7vdl8m46f Citric Acid] | * [https://caltech.box.com/s/p0ipw68eugayo2skq1hqgnj7vdl8m46f Citric Acid] | ||
* [https://caltech.box.com/s/s7sy48utmmndn20pxn4izq6e433hkcj8 Copper Etchant APS-100] | * [https://caltech.box.com/s/s7sy48utmmndn20pxn4izq6e433hkcj8 Copper Etchant APS-100] | ||
* [https://caltech.box.com/s/fip81rmqz0x1pw031zqg7blun11617mv Dichloromethane (Methylene Chlorine)] | |||
* [https://caltech.box.com/s/0z0gpft6tm297fympdbwfbeopdddvi5u Gold Etchant TFA] | * [https://caltech.box.com/s/0z0gpft6tm297fympdbwfbeopdddvi5u Gold Etchant TFA] | ||
* [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | * [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | ||
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* [https://caltech.box.com/s/mk4rilpjcbd5ryjb1tw764eau62mjq7f Methanol (Methyl alcohol)] | * [https://caltech.box.com/s/mk4rilpjcbd5ryjb1tw764eau62mjq7f Methanol (Methyl alcohol)] | ||
* [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] | * [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] | ||
* [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | * [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | ||
* [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nano-strip and Nanostrip 2x] | * [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nano-strip and Nanostrip 2x] | ||
Revision as of 22:49, 21 July 2022
Chemicals Provided by the KNI with typical SDS
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- AZ 400K Photoresist Developer
- AZ 726 MIF Developer
- AZ 4620
- AZ 5214-E Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Dichloromethane (Methylene Chlorine)
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid Improved (BHF)
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol (Methyl alcohol)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- MF 319 Developer
- Nano-strip and Nanostrip 2x
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- PGMEA
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- S1813 Photoresist
- SU-8 Developer (Micro-Chem)
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)