Provided Chemicals: Difference between revisions
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| Line 9: | Line 9: | ||
* AZ 4620 | * AZ 4620 | ||
* [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist] | * [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist] | ||
* [https://caltech.box.com/s/nbbptm14e4ejc5kc9bjm8x0aa074pnla CD 26 Developer] | * [https://caltech.box.com/s/nbbptm14e4ejc5kc9bjm8x0aa074pnla CD 26 Developer] | ||
* [https://caltech.box.com/s/ejr2qph7nits1eaelm1f21s1oowrou0d Chromium Etchant CR-7S] | * [https://caltech.box.com/s/ejr2qph7nits1eaelm1f21s1oowrou0d Chromium Etchant CR-7S] | ||
| Line 17: | Line 16: | ||
* [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | * [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | ||
* [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid] | * [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid] | ||
* [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Hydrofluoric Acid Improved (BHF) | * [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Hydrofluoric Acid Improved (BHF)] | ||
* [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>] | * [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>] | ||
* [https://caltech.box.com/s/7c02l4sctvfx0wplr4k6429yi0j8ew5q Isopropyl Alcohol (IPA)] | * [https://caltech.box.com/s/7c02l4sctvfx0wplr4k6429yi0j8ew5q Isopropyl Alcohol (IPA)] | ||
Revision as of 21:53, 21 July 2022
Chemicals Provided by the KNI with typical SDS
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- AZ 400K Photoresist Developer
- AZ 726 MIF Developer
- AZ 4620
- AZ 5214-E Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid Improved (BHF)
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- Methylene Chlorine (Dichloromethane)
- MF 319 Developer
- Nano-strip and Nanostrip 2x
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- PGMEA
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- S1813 Photoresist
- SU-8 Developer (Micro-Chem)
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)