Rapid Thermal Processor: Difference between revisions
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== Resources == | == Resources == | ||
===== SOPs ===== | ===== SOPs ===== | ||
*[https://caltech.app.box.com/file/1270820147602 Solaris | *[https://caltech.app.box.com/file/1270820147602 Solaris 150–Rapid Thermal Processor -Short SOP] | ||
* | *[https://caltech.app.box.com/file/1270821163104 Solaris 150–Rapid Thermal Processor -Long SOP] | ||
===== Manuals ===== | ===== Manuals ===== | ||
Revision as of 20:15, 3 August 2023
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Description
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
Applications
- Temperature range from room temperature to 1200 degrees C.
- Processing gasses available:
- Nitrogen
- Argon
- Forming Gas (5% H2 in N2)
Resources
SOPs
Manuals
- Solaris 150 [1]