Rapid Thermal Processor: Difference between revisions

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 28: Line 28:
== Resources ==
== Resources ==
===== SOPs =====
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]
* SOP coming soon.
<br>
<br>
<br>
<br>

Revision as of 21:07, 29 June 2023

Solaris Rapid Thermal Processor
RTP.jpeg
Instrument Type Metrology
Techniques Rapid Thermal Processing
Staff Manager Alireza Ghaffari
Staff Email alireza@caltech.edu
Staff Phone 626-395-3984
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B235 Steele
Lab Phone 626-395-1539
Manufacturer Surface science integration
Model Solaris 150

Description

The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The Solaris 150 is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

Applications
  • Temperature range from room temperature to 1200 degrees C.
  • Processing gasses available:
    • Argon
    • Nitrogen
    • Forming Gas

Resources

SOPs
  • SOP coming soon.




Retrieved from "https://lab.kni.caltech.edu/index.php?title=Rapid_Thermal_Processor&oldid=3258"