Rapid Thermal Processor: Difference between revisions
Jump to navigation
Jump to search
No edit summary Tag: Manual revert |
|||
| Line 18: | Line 18: | ||
}} | }} | ||
== Description == | == Description == | ||
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The Solaris 150 is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying. | |||
===== Applications ===== | ===== Applications ===== | ||
* | *Temperature range from room temperature to 1200 degrees C. | ||
* Processing gasses available: | |||
**Argon | |||
**Nitrogen | |||
**Forming Gas | |||
== Resources == | == Resources == | ||
Revision as of 21:06, 29 June 2023
|
Description
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The Solaris 150 is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
Applications
- Temperature range from room temperature to 1200 degrees C.
- Processing gasses available:
- Argon
- Nitrogen
- Forming Gas
Resources
SOPs