Nathan S. Lee: Difference between revisions
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|StaffName = Nathan S. Lee | |StaffName = Nathan S. Lee | ||
|StaffPhoto = Nathan-S-Lee.jpg | |StaffPhoto = Nathan-S-Lee.jpg | ||
|JobTitle = | |JobTitle = Laboratory Infrastructure Manager | ||
|AreasResponsibility = | |AreasResponsibility = General Infrastructure,<br>Safety | ||
|CaltechID = nathslee | |CaltechID = nathslee | ||
|Phone = 626-395- | |Phone = 626-395-4075 (office) | ||
|OfficeLocation = | |OfficeLocation = 124 Steele | ||
}} | }} | ||
== About == | == About == | ||
===== Role in the KNI ===== | ===== Role in the KNI ===== | ||
Nathan Lee is the Laboratory Infrastructure Manager for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He oversees the daily operation of general infrastructure, operations, and safety measures within the KNI and manages onboarding of new and current members | |||
After working in the semiconductor equipment industry as a hardware and process engineer for 15 years, Nathan joined Caltech in January of 2016 as a plasma process engineer for the KNI. He went on to serve as a process engineer at Applied Materials for two years before returning to Southern California and rejoining Caltech. He brings a breadth of experience in plasma process development, hardware optimization, and laboratory management to the KNI. | |||
===== Education ===== | ===== Education ===== | ||
Nathan received his B.S. in Structural Engineering from the University of California, San Diego. | |||
== List of Managed Instruments == | == List of Managed Instruments == | ||
===== Etching ===== | <!--===== Etching ===== | ||
* [[ | * [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]] | ||
* [[ | * [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]] | ||
* [[ | * [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]] | ||
* [[ | * [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]] | ||
===== Deposition ===== | ===== Deposition ===== | ||
* [[ | * [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]] | ||
* [[ | * [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]] | ||
===== Support Tools ===== | ===== Support Tools ===== | ||
* [[ | * [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]] | ||
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Latest revision as of 20:33, 12 August 2024
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About
Role in the KNI
Nathan Lee is the Laboratory Infrastructure Manager for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He oversees the daily operation of general infrastructure, operations, and safety measures within the KNI and manages onboarding of new and current members After working in the semiconductor equipment industry as a hardware and process engineer for 15 years, Nathan joined Caltech in January of 2016 as a plasma process engineer for the KNI. He went on to serve as a process engineer at Applied Materials for two years before returning to Southern California and rejoining Caltech. He brings a breadth of experience in plasma process development, hardware optimization, and laboratory management to the KNI.
Education
Nathan received his B.S. in Structural Engineering from the University of California, San Diego.