Provided Chemicals: Difference between revisions
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* [https://caltech.box.com/s/ylg4dvopgwidydo8uompgxfnlkass45u Aluminum Etchant Type D] | * [https://caltech.box.com/s/ylg4dvopgwidydo8uompgxfnlkass45u Aluminum Etchant Type D] | ||
* [https://caltech.box.com/s/qi5n4uow7kq9aq04y1z3glb4jnzsjr89 Ammonium Hydroxide (NH<sub>4</sub>OH)] | * [https://caltech.box.com/s/qi5n4uow7kq9aq04y1z3glb4jnzsjr89 Ammonium Hydroxide (NH<sub>4</sub>OH)] | ||
* [https://caltech.box.com/s/lfhonv6ysdyalg1eyhekyd7nv6kk732r Anisole] | |||
* [https://caltech.box.com/s/nl94m116yhas3lb7mcigvlxlscyo9g9w AZ 3330-F Photoresist] | * [https://caltech.box.com/s/nl94m116yhas3lb7mcigvlxlscyo9g9w AZ 3330-F Photoresist] | ||
* [https://caltech.box.com/s/oet38b107t13e5eyua3p5u40imggnqqs AZ 400K Developer] | * [https://caltech.box.com/s/oet38b107t13e5eyua3p5u40imggnqqs AZ 400K Developer] | ||
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* [https://caltech.box.com/s/p0ipw68eugayo2skq1hqgnj7vdl8m46f Citric Acid] | * [https://caltech.box.com/s/p0ipw68eugayo2skq1hqgnj7vdl8m46f Citric Acid] | ||
* [https://caltech.box.com/s/s7sy48utmmndn20pxn4izq6e433hkcj8 Copper Etchant APS-100] | * [https://caltech.box.com/s/s7sy48utmmndn20pxn4izq6e433hkcj8 Copper Etchant APS-100] | ||
* [https://caltech.box.com/s/fip81rmqz0x1pw031zqg7blun11617mv Dichloromethane (Methylene Chlorine)] | * [https://caltech.box.com/s/fip81rmqz0x1pw031zqg7blun11617mv Dichloromethane (Methylene Chlorine)] | ||
* [https://caltech.box.com/s/0z0gpft6tm297fympdbwfbeopdddvi5u Gold Etchant TFA] | * [https://caltech.box.com/s/0z0gpft6tm297fympdbwfbeopdddvi5u Gold Etchant TFA] | ||
* [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | * [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | ||
* [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid] | * [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid] | ||
* [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Hydrofluoric Acid (Buffered | * [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Hydrofluoric Acid (Buffered HF Improved - BHF)] | ||
* [https://caltech.box.com/s/nnko75lma8nnimjmccnl0p2sa2bd9xbo Hydrofluoric Acid 49%] | * [https://caltech.box.com/s/nnko75lma8nnimjmccnl0p2sa2bd9xbo Hydrofluoric Acid 49%] | ||
* [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>] | * [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>] | ||
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* [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] | * [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] | ||
* [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | * [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | ||
* | * NanoStrip - no longer available see Pure Strip | ||
* [https://caltech.box.com/s/cmq0uvsm78jj0hxzp2q5bozdhrttz5sx PGMEA (Propylene glycol monomethyl ether acetate)] | * [https://caltech.box.com/s/cmq0uvsm78jj0hxzp2q5bozdhrttz5sx PGMEA (Propylene glycol monomethyl ether acetate)] | ||
* [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)] | * [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)] | ||
* [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] | * [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/9p3z7m738jmumkxxwojmuxorbioegsm6 Pure Strip (NanoStrip replacement)] | ||
* [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)] | * [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)] | ||
* [https://caltech.box.com/s/clxx77yqllfxz7us1tmih29v3vhiyvnl S1805 Photoresist] | * [https://caltech.box.com/s/clxx77yqllfxz7us1tmih29v3vhiyvnl S1805 Photoresist] | ||
Latest revision as of 18:40, 3 June 2024
Chemicals Provided by the KNI with typical SDS
- 495 PMMA Series Resists in Anisole
- 495 PMMA Series Resists in Chlorobenzene
- 950 PMMA Series Resists in Anisole
- 950 PMMA Series Resists in Chlorobenzene
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- Anisole
- AZ 3330-F Photoresist
- AZ 400K Developer
- AZ 5214-E Photoresist
- AZ 726 MIF Developer
- AZ 9245 Photoresist
- AZ 9260 Photoresist
- AZ NLOF 2020 Photoresist
- AZ NLOF 2035 Photoresist
- AZ NLOF 2070 Photoresist
- AZ P4620 Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Dichloromethane (Methylene Chlorine)
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid (Buffered HF Improved - BHF)
- Hydrofluoric Acid 49%
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol (Methyl alcohol)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- MF 319 Developer
- NanoStrip - no longer available see Pure Strip
- PGMEA (Propylene glycol monomethyl ether acetate)
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- Pure Strip (NanoStrip replacement)
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- S1805 Photoresist
- S1813 Photoresist
- S1818 Photoresist
- SU-8 Developer
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)