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| |EmailListName = Chemistry | | |EmailListName = Chemistry |
| }} | | }} |
| == Facilities and Chemicals ==
| | |
| ===== Available Benches ===== | | ===== Available Bench Facilities: ===== |
| * Acids | | * Acids |
| * Hydrofluoric Acid (HF) | | * Hydrofluoric Acid (HF) |
| Line 24: |
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| * Solvents | | * Solvents |
| * Electroplating | | * Electroplating |
| ===== Chemicals Provided by the KNI with typical SDS=====
| |
| * [https://caltech.box.com/s/e9aenw9ddp2mubkvqkxqd3mtfohp7xz1 Acetic Acid Glacial]
| |
| * [https://caltech.box.com/s/3zz1ugq1qgtwmc29o54313sy8u7an9hd Acetone]
| |
| * [https://caltech.box.com/s/a8n0s5au2cucnsfqlwh2wctml3imigwb Aluminum Etchant Type A]
| |
| * Aluminum Etchant D
| |
| * [https://caltech.box.com/s/qi5n4uow7kq9aq04y1z3glb4jnzsjr89 Ammonium Hydroxide (NH<sub>4</sub>OH)]
| |
| * Au Etchant
| |
| * [https://caltech.box.com/s/oet38b107t13e5eyua3p5u40imggnqqs AZ 400K Photoresist Developer]
| |
| * [https://caltech.box.com/s/xsouakt5afpirwsj2t2otve9bqo6nkzx AZ 726 MIF Developer]
| |
| * AZ 4620
| |
| * [https://caltech.box.com/s/lsa4wk6vktuuh4itqzv9r3k0yql38dwi AZ 5214-E Photoresist]
| |
| * [https://caltech.box.com/s/fl0p67vj2gtucz6896taed5wu9thdoeo Buffered HF Improved]
| |
| * [https://caltech.box.com/s/nbbptm14e4ejc5kc9bjm8x0aa074pnla CD 26 Developer]
| |
| * [https://caltech.box.com/s/ejr2qph7nits1eaelm1f21s1oowrou0d Chromium Etchant CR-7S]
| |
| * Citric Acid
| |
| * Copper Etchant
| |
| * [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)]
| |
| * [https://caltech.box.com/s/m1icrzidd6tw2ql7zke5p9v3mq2fx0br Hydrochloric Acid]
| |
| * Hydrofluoric Acid (HF)
| |
| * [https://caltech.box.com/s/jg1y0btpel4fpylh7vonld9gykvp6plg Hydrogen Peroxide, 30% H<sub>2</sub>O<sub>2</sub>]
| |
| * [https://caltech.box.com/s/7c02l4sctvfx0wplr4k6429yi0j8ew5q Isopropyl Alcohol (IPA)]
| |
| * [https://caltech.box.com/s/mk4rilpjcbd5ryjb1tw764eau62mjq7f Methanol]
| |
| * [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)]
| |
| * [https://caltech.box.com/s/fip81rmqz0x1pw031zqg7blun11617mv Methylene Chlorine (Dichloromethane)]
| |
| * [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer]
| |
| * [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nano-strip and Nanostrip 2x]
| |
| * [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)]
| |
| * PGMEA
| |
| * [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)]
| |
| * [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide]
| |
| * [https://caltech.box.com/s/avqs14mt28i1epom0n6w37p55rjqvkbe SU-8 Developer] (Micro-Chem)
| |
| * [https://caltech.box.com/s/89j0lgduzv1hqnewgfr5rrkigxcpw5b3 Sulfuric Acid (H<sub>2</sub>SO<sub>4</sub>)]
| |
| * [https://caltech.box.com/s/9ht2pznbmygzrau5bgp4yuom65h3wk4u Titanium Etchant TFT]
| |
| * [https://caltech.box.com/s/976lv8b4ka4oupr7nkfb8g1pill79usn Tetramethylammonium Hydroxide 25% (TMAH)]
| |
|
| |
|
| ===== Approved Chemicals ===== | | ===== Chemical Processes Resources ===== |
| * [[Safety Data Sheets (SDS)#Liquids | See List]] | | |
| | * [[Wet Chemistry Resources | Wet Chemistry Resources Page]] - Contains recipes and procedures |
| | |
| | ===== Chemical Safety Resources ===== |
|
| |
|
| == Resources ==
| |
| ===== Wet Chemistry Resources =====
| |
| * [[Wet Chemistry Resources | Wet Chemistry Resources Page]]
| |
| ===== Safety Data Sheets (SDS) =====
| |
| * [https://www.chemicalsafety.com/sds-search Search for Safety Data Sheets (SDS)] | | * [https://www.chemicalsafety.com/sds-search Search for Safety Data Sheets (SDS)] |
| | |
| | * [[Lab_Rules_&_Safety | Lab Rules & Safety]] - KNI cleanroom safety guide |
| | |
| | ===== Chemicals Provided by the KNI with typical SDS:===== |
| | |
| | * [[Provided_Chemicals | See List]] |
| | |
| | ===== Approved Chemicals: ===== |
| | |
| | * [[Safety Data Sheets (SDS)#Liquids | See List]] |
