Difference between revisions of "Wet Chemistry Resources"

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 78: Line 78:
| KNI PECVD SiN3|| Ex || ~1000 || Highly || SiN3 || High || measured 10/19
| KNI PECVD SiN3|| Ex || ~1000 || Highly || SiN3 || High || measured 10/19
|-
|-
| KNI PECVD a-Si|| KOH || ~1000 || Highly || Si || High || measured 10/19
| KNI PECVD a-Si|| KOH || ~1000 || Highly || Si || High || Link to KNI member's research paper
|}
|}



Revision as of 09:55, 31 October 2019

Template:NOINDEX

cleaning procedures links, breakout

Sample Cleaning Resources

https://cleanroom.byu.edu/clean

Solvent Cleans

  • Acetone, IPA
    • Solvent for organics, IPA cleans remaining residues due to acetone's high evaporation rate
  • Acetone, Methanol
    • Similar to above except Methanol is more toxic, and a polar chemical versus IPA which is non-polar
  • Acetone, Methanol, IPA
  • Acetone, Methanol, IPA, DI Water
  • Remover PG (50°C), IPA
  • Dichloromethane, IPA
    • Caution, high evaporation rate may leave residue and beakers get quickly condense water/ice
  • Nanostrip?

Etching Cleans

RCA-1

Recipe steps or links

Piranha Etch

HF Dip

Plasma Cleans

Wet Etching Resources

find etch list book and other links

Research Papers and Books

External Laboratories

also find alternative:

Commercial Materials


KNI Wet Etch Recipes Table

Table of Wet Etch recipes from KNI Papers

And general table from you, not from papers, maybe from recipes?

Material Etchant Rate (nm/min) Anisotropy Selective to Selectivity Origin and Notes
KNI CHA Al Al Etch Type D ~1000 Highly Al High Transene
KNI PECVD SiO2 HF ~1000 Highly SiO2 High measured 10/19
KNI PECVD SiN3 Ex ~1000 Highly SiN3 High measured 10/19
KNI PECVD a-Si KOH ~1000 Highly Si High Link to KNI member's research paper

Other Procedures

Liftoff

Electroplating

Safety Resources

Do we have materials to link to?

https://cleanroom.byu.edu/acid_safety

https://cleanroom.byu.edu/HF_safety

https://cleanroom.byu.edu/solvent_safety