Difference between revisions of "Usage Rates"

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'''The rates below are valid beginning October 2018 and are subject to change.'''
'''Overview of KNI Lab User Fees''' <br>
''Note: Rates below are valid beginning October 1, 2021 and are subject to change''


NOTE:
* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof)
* Charges are incurred on a pay-as-you-go basis.
* Caltech/JPL/Academic or Government lab members are '''NOT''' charged any Lab fees during calendar months of non-use
* Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members are inclusive of FY19 Caltech F&A fees ("overhead"/IDC).
 
* Individual Tools listed below are charged by the hour or portion thereof.
== Caltech Academic Usage Rates ==
* Precious Metal Usage (e.g. Au, Pt, etc.) is billed by the gram or portion thereof. Market prices are passed on to users and do not include Caltech F&A fees.
Below is a table of hourly rates for the equipment in the KNI Laboratory. Caltech/JPL users receive a quarterly fee cap for use of the cleanroom equipment in the KNI Lab. '''*NOTE:The maximum direct lab costs for cleanroom equipment that an individual Caltech/JPL user will be charged, per billing quarter, is $6,500.'''
* Lab Members who use the '''TF-30 STEM only''' are exempt from the Monthly Base Fee.


== Equipment Rates ==
{| class="wikitable" style="width: 75%;"
{| class="wikitable" style="width: 75%;"
|-
|-
!scope="col" style="text-align:left; width: 31%"| Name
!scope="col" style="text-align:left; width: 50%"| Equipment Name
!scope="col" style="text-align:left; width: 18%"| Category
!scope="col" style="text-align:center; width: 35%"| Lab Area
!scope="col" style="text-align:center; width: 16%"| Caltech Rate
!scope="col" style="text-align:center; width: 15%" | Hourly Rate
!scope="col" style="text-align:center; width: 19%"| JPL/Non-Caltech Acad/Govt Rate
|-
!scope="col" style="text-align:center; width: 16%" | Corporate Rate**
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Cleanroom Hourly Rate  
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#ffe7d1;" | General KNI Cleanroom Use
|EquipmentName = [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+]]
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $28
|EquipmentCategory = Lithography
|-
|CaltechRate = 62.00
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA Orion UHV Chalcogenide Sputter System
|JPLNonCaltechAcadGovtRate = 101.99
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
|CorporateRate = 152.99
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
}}
|-
{{UsageRateTableItem|
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA Orion UHV Dielectric Sputter System
|EquipmentName = [[EBPG 5200: 100 kV Electron Beam Lithography | EBPG 5200]]
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
|EquipmentCategory = Lithography
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|CaltechRate = 62.00
|-
|JPLNonCaltechAcadGovtRate = 101.99
!scope="col" style="text-align:left; background-color:#ffd8b4;"| CHA MK40 E-Beam Evaporator
|CorporateRate = 152.99
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
}}
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
{{UsageRateTableItem|
|-
|EquipmentName = [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners]]
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Lesker Labline E-Beam Evaporator
|EquipmentCategory = Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
|CaltechRate = 36.00
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|JPLNonCaltechAcadGovtRate = 59.22
|-
|CorporateRate = 88.83
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Bruker Dimension ICON AFM
}}
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|EquipmentName = [[DWL-66: Direct-Write Laser System | Direct-Write Laser System (DWL-66)]]
|-
|EquipmentCategory = Lithography
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Nova 200 NanoLab Dualbeam FIB/SEM
|CaltechRate = 47.00
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
|JPLNonCaltechAcadGovtRate = 77.32
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|CorporateRate = 115.97
|-
}}
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Nova 600 Dualbeam Focused Ion Beam
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
|EquipmentName = [[Nanoscribe PPGT: Microscale 3D Printer | Nanoscribe (Microscale 3D Printer)]]
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|EquipmentCategory = Lithography
|-
|CaltechRate = 8.00
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Quanta ESEM /NPGS
|JPLNonCaltechAcadGovtRate = 13.16
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
|CorporateRate = 19.74
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
}}
|-
{{UsageRateTableItem|
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Sirion FESEM
|EquipmentName = [[CHA: Electron Beam Evaporator | Evaporator: Metals & Oxides (CHA)]]
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
|EquipmentCategory = Deposition
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|CaltechRate = 24.00
|-
|JPLNonCaltechAcadGovtRate = 39.48
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Tecnai TF-30 TEM, STEM, EDS & HAADF
|CorporateRate = 59.22
!scope="col" style="text-align:center; background-color:#fec38d;" | Microscopy *Not Capped*
}}
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $90
{{UsageRateTableItem|
|-
|EquipmentName = [[Labline: Electron Beam Evaporator | Evaporator: Al, Au, Pt & Ti (Labline)]]
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Zeiss Orion NanoFab
|EquipmentCategory = Deposition
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
|CaltechRate = 24.00
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $79
|JPLNonCaltechAcadGovtRate = 39.48
|-
|CorporateRate = 59.22
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford Dielectric System 100 ICP/RIE
}}
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|EquipmentName = [[ATC Orion 8: Chalcogenide Sputter System | Sputter: Chalcogenide Material]]
|-
|EquipmentCategory = Deposition
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford DRIE System 100 ICP/RIE
|CaltechRate = 70.00
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
|JPLNonCaltechAcadGovtRate = 115.15
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|CorporateRate = 172.73
|-
}}
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford FlexAl ALD System
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
|EquipmentName = [[ATC Orion 8: Dielectric Sputter System | Sputter: Dielectric Material]]
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|EquipmentCategory = Deposition
|-
|CaltechRate = 37.00
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford III-V System 100 ICP/RIE
|JPLNonCaltechAcadGovtRate = 60.87
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
|CorporateRate = 91.30
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
}}
|-
{{UsageRateTableItem|
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford PECVD System 100
|EquipmentName = [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD)]]
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
|EquipmentCategory = Deposition
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|CaltechRate = 67.00
|-
|JPLNonCaltechAcadGovtRate = 110.22
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Plasmatherm Reactive Ion Etch
|CorporateRate = 165.32
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
}}
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
{{UsageRateTableItem|
|-
|EquipmentName = [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | PECVD]]
!scope="col" style="text-align:left; background-color:#ffd8b4;"| XeF2 silicon etcher
|EquipmentCategory = Deposition
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
|CaltechRate = 67.00
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|JPLNonCaltechAcadGovtRate = 110.22
|-
|CorporateRate = 165.32
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Raith EBPG 5000+ Electron Beam Writer
}}
!scope="col" style="text-align:center; background-color:#fec38d;" | Electron Beam Lithography *Not Capped*
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $115
|EquipmentName = [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher (DRIE)]]
|-
|EquipmentCategory = Etching
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Raith EBPG 5200 Electron Beam Writer
|CaltechRate = 50.00
!scope="col" style="text-align:center; background-color:#fec38d;" | Electron Beam Lithography *Not Capped*
|JPLNonCaltechAcadGovtRate = 82.25
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $115
|CorporateRate = 123.38
|-
}}
!scope="col" style="text-align:left; background-color:#ffd8b4;"| GCA 6300 DSW Stepper
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
|EquipmentName = [[ICP-RIE: III-V, Metal & Silicon Etcher| III-V, Metal & Silicon Etcher]]
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|EquipmentCategory = Etching
|-
|CaltechRate = 50.00
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Heidelberg DWL-66
|JPLNonCaltechAcadGovtRate = 82.25
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
|CorporateRate = 123.38
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
}}
|-
{{UsageRateTableItem|
!scope="col" style="text-align:left; background-color:#ffd8b4;"| NILT CNI-PV 2.1 Nanoimprint
|EquipmentName = [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V & Organics Etcher]]
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
|EquipmentCategory = Etching
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|CaltechRate = 50.00
|-
|JPLNonCaltechAcadGovtRate = 82.25
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Nanoscribe Photonic Professional GT
|CorporateRate = 123.38
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
}}
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
{{UsageRateTableItem|
|-
|EquipmentName = [[ICP-RIE: Dielectric Etcher | Dielectric Etcher]]
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Suss Microtech MA6 Aligner
|EquipmentCategory = Etching
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
|CaltechRate = 50.00
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|JPLNonCaltechAcadGovtRate = 82.25
|-
|CorporateRate = 123.38
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Suss Microtech MA6/BA6 Aligner
}}
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|EquipmentName = [[XeF2 Etcher for Silicon | XeF<sub>2</sub> Etcher for Silicon]]
|-
|EquipmentCategory = Etching
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Dynatex GST-150 Scriber/Breaker
|CaltechRate = 50.00
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
|JPLNonCaltechAcadGovtRate = 82.25
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
|CorporateRate = 123.38
|-
}}
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Para Tech LabTop 3000 Parylene Coater
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
|EquipmentName = [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab He/Ne/Ga-FIB]]
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
|EquipmentCategory = Microscopy, Lithography
|-
|CaltechRate = 65.00
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Suss SB6L Wafer Bonder
|JPLNonCaltechAcadGovtRate = 106.93
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
|CorporateRate = 160.39
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
}}
|-
{{UsageRateTableItem|
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Tousimis Critical Point Dryer
|EquipmentName = [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | Nova 600 SEM/Ga-FIB]]
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
|EquipmentCategory = Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
|CaltechRate = 65.00
|-
|JPLNonCaltechAcadGovtRate = 106.93
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Tystar Tytan Dry Oxide + annealing
|CorporateRate = 160.39
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
}}
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
{{UsageRateTableItem|
|-
|EquipmentName = [[Nova 200 NanoLab: SEM, EDS & WDS | Nova 200 SEM/EDS/WDS]]
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Tystar Tytan Wet + Dry Oxide + annealing
|EquipmentCategory = Microscopy
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
|CaltechRate = 65.00
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
|JPLNonCaltechAcadGovtRate = 106.93
|-
|CorporateRate = 160.39
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Westbond 7476D Wire Bonder
}}
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
{{UsageRateTableItem|
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
|EquipmentName = [[Sirion: SEM & EDS | Sirion SEM/EDS]]
|-
|EquipmentCategory = Microscopy
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Woolam M-2000 Spectroscopic Ellipsometer
|CaltechRate = 39.00
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
|JPLNonCaltechAcadGovtRate = 64.16
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
|CorporateRate = 96.23
|-
}}
{{UsageRateTableItem|
|EquipmentName = [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta SEM/NPGS]]
|EquipmentCategory = Microscopy, Lithography
|CaltechRate = 39.00
|JPLNonCaltechAcadGovtRate = 64.16
|CorporateRate = 96.23
}}
{{UsageRateTableItem|
|EquipmentName = [[Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF | Tecnai TF-30 TEM/STEM]]
|EquipmentCategory = Microscopy
|CaltechRate = 97.00
|JPLNonCaltechAcadGovtRate = 159.57
|CorporateRate = 239.35
}}
{{UsageRateTableItem|
|EquipmentName = [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM)]]
|EquipmentCategory = Microscopy
|CaltechRate = 41.00
|JPLNonCaltechAcadGovtRate = 67.45
|CorporateRate = 101.17
}}
{{UsageRateTableItem|
|EquipmentName = [[Critical Point Dryer]]
|EquipmentCategory = Support Tools
|CaltechRate = 54.00
|JPLNonCaltechAcadGovtRate = 88.83
|CorporateRate = 133.25
}}
{{UsageRateTableItem|
|EquipmentName = [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces]]
|EquipmentCategory = Support Tools
|CaltechRate = 5.00
|JPLNonCaltechAcadGovtRate = 8.23
|CorporateRate = 12.34
}}
{{UsageRateTableItem|
|EquipmentName = Monthly Base Rate*
|EquipmentCategory = General Equipment*
|CaltechRate = 655.00*
|JPLNonCaltechAcadGovtRate = 1,077.48*
|CorporateRate = 1,616.21*
}}
|}
|}


==*Monthly Base Rate==
The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:


Chemical Wet Benches, Tecnai TF-20 TEM, GCA 6300 Wafer Stepper, Scriber-Breaker, Spectroscopic Ellipsometer, Carbon Evaporator, O<sub>2</sub>/Ar Plasma Cleaner, Parylene Coater, Wafer Bonder, Wire Bonder, Electrical Probe Station, Rapid Thermal Processor, Profilometer, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (e.g. gowning, chemicals, equipment reservation software, etc).
'''FEE CAP EXCEPTIONS'''
*EBPG 5000+ and 5200 systems are not included in the quarterly academic/government rate cap. Actual hours will be billed.
*TF-30 STEM in Keck Building: Lab members who '''only''' use the TF-30 are exempt from paying the General Cleanroom hourly rate. TF-30 use is not included in the quarterly academic/government rate cap. Actual hours will be billed.
*Precious Metal (gold and platinum) usage will be billed the market rate, per gram.
*Dedicated KNI Staff Labor/Support for Research is $100/hr.
 
'''OVERHEAD FEE/INDIRECT COST'''
*Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members will be subject to Caltech's F&A (indirect/"overhead") costs. The F&A rate for fiscal year 2022 is 68.4%


==**Corporate Memberships==
==Corporate Memberships==


For full information on the KNI's corporate membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.
For information on the KNI corporate lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

Revision as of 00:48, 2 October 2021

Overview of KNI Lab User Fees
Note: Rates below are valid beginning October 1, 2021 and are subject to change

  • Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof)
  • Caltech/JPL/Academic or Government lab members are NOT charged any Lab fees during calendar months of non-use

Caltech Academic Usage Rates

Below is a table of hourly rates for the equipment in the KNI Laboratory. Caltech/JPL users receive a quarterly fee cap for use of the cleanroom equipment in the KNI Lab. *NOTE:The maximum direct lab costs for cleanroom equipment that an individual Caltech/JPL user will be charged, per billing quarter, is $6,500.

Equipment Name Lab Area Hourly Rate
Cleanroom Hourly Rate General KNI Cleanroom Use $28
AJA Orion UHV Chalcogenide Sputter System Evaporation, Sputtering $62
AJA Orion UHV Dielectric Sputter System Evaporation, Sputtering $62
CHA MK40 E-Beam Evaporator Evaporation, Sputtering $62
Lesker Labline E-Beam Evaporator Evaporation, Sputtering $62
Bruker Dimension ICON AFM Microscopy $62
FEI Nova 200 NanoLab Dualbeam FIB/SEM Microscopy $62
FEI Nova 600 Dualbeam Focused Ion Beam Microscopy $62
FEI Quanta ESEM /NPGS Microscopy $62
FEI Sirion FESEM Microscopy $62
FEI Tecnai TF-30 TEM, STEM, EDS & HAADF Microscopy *Not Capped* $90
Zeiss Orion NanoFab Microscopy $79
Oxford Dielectric System 100 ICP/RIE Deposition, Etch $89
Oxford DRIE System 100 ICP/RIE Deposition, Etch $89
Oxford FlexAl ALD System Deposition, Etch $89
Oxford III-V System 100 ICP/RIE Deposition, Etch $89
Oxford PECVD System 100 Deposition, Etch $89
Plasmatherm Reactive Ion Etch Deposition, Etch $89
XeF2 silicon etcher Deposition, Etch $89
Raith EBPG 5000+ Electron Beam Writer Electron Beam Lithography *Not Capped* $115
Raith EBPG 5200 Electron Beam Writer Electron Beam Lithography *Not Capped* $115
GCA 6300 DSW Stepper Optical Lithography $62
Heidelberg DWL-66 Optical Lithography $62
NILT CNI-PV 2.1 Nanoimprint Optical Lithography $62
Nanoscribe Photonic Professional GT Optical Lithography $62
Suss Microtech MA6 Aligner Optical Lithography $62
Suss Microtech MA6/BA6 Aligner Optical Lithography $62
Dynatex GST-150 Scriber/Breaker Support & Misc Tools $44
Para Tech LabTop 3000 Parylene Coater Support & Misc Tools $44
Suss SB6L Wafer Bonder Support & Misc Tools $44
Tousimis Critical Point Dryer Support & Misc Tools $44
Tystar Tytan Dry Oxide + annealing Support & Misc Tools $44
Tystar Tytan Wet + Dry Oxide + annealing Support & Misc Tools $44
Westbond 7476D Wire Bonder Support & Misc Tools $44
Woolam M-2000 Spectroscopic Ellipsometer Support & Misc Tools $44


FEE CAP EXCEPTIONS

  • EBPG 5000+ and 5200 systems are not included in the quarterly academic/government rate cap. Actual hours will be billed.
  • TF-30 STEM in Keck Building: Lab members who only use the TF-30 are exempt from paying the General Cleanroom hourly rate. TF-30 use is not included in the quarterly academic/government rate cap. Actual hours will be billed.
  • Precious Metal (gold and platinum) usage will be billed the market rate, per gram.
  • Dedicated KNI Staff Labor/Support for Research is $100/hr.

OVERHEAD FEE/INDIRECT COST

  • Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members will be subject to Caltech's F&A (indirect/"overhead") costs. The F&A rate for fiscal year 2022 is 68.4%

Corporate Memberships

For information on the KNI corporate lab membership plan, please send an email to tkimoto@caltech.edu with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.