Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner

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Tergeo Plus Plasma Cleaner
[[image:|320x373px|center|]]
Instrument Type Etching, Microscopy
Techniques Plasma Cleaning,
Direct Mode (ICP),
Remote Mode (CCP)
Staff Manager Matthew S. Hunt, PhD
Staff Email matthew.hunt@caltech.edu
Staff Phone 626-395-5994
Reserve time on LabRunr
Request training by email
Sign up for SEM-FIB email list
Lab Location B203 Steele
Lab Phone 626-395-1542
Manufacturer PIE Scientific
Model {{{Model}}}

Description

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Type1 Applications
  • Application1
  • Application2
  • Application3
Type2 Applications
  • Application1
  • Application2
  • Application3

Resources

SOPs & Troubleshooting
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals

Specifications

Manufacturer Specifications
Mode 1 Specifications
  • Voltage Range: 0.5 to 30.0 kV
  • Aperture Sizes: 10 mm, 15 mm, 20 mmm, 30 mm
  • etc.
Mode 2 Specifications
  • Voltage Range: 5.0 to 30.0 kV
  • Current Range: 10 pA - 20 nA
  • etc.