View source for Quanta 200F: SEM, ESEM, Lithography & Probe Station

{{InstrumentInfoboxOneImage|
|InstrumentName = Quanta 200F
|HeaderColor = #F5A81C
|ImageOne = Quanta-200F-SEM.jpg
|ImageTwo = Quanta-200F-SEM.jpg
|InstrumentType = [[Equipment_List#Microscopy|Microscopy]], [[Equipment_List#Lithography|Lithography]]
|RoomLocation = B233 Steele
|LabPhone = 626-395-5429
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = FEI (now Thermo Fisher)
|Model = Quanta 200F
|Techniques = SEM, ESEM,<br>E-beam Lithography,<br>Electrical 4-Point Probe Station,<br>Hot Stage, Cold Stage
|RequestTraining = alireza@caltech.edu
|EmailList = kni-sem-fib
|EmailListName = SEM-FIB
}}
== Description ==
The Quanta 200F is a field emission gun (FEG) scanning electron microscope (SEM) that can also be operated in environmental (ESEM) mode, where a higher chamber pressure (0.1 to 27 mbar) allows for the imaging of e.g. biological samples without lysing cells. While the Quanta does not have an immersion lens for ultra-high-resolution imaging, as all other KNI SEMs do, this actually allows the Quanta's non-immersion objective lens to be optimally placed for "field-free imaging," making it the KNI's highest resolution SEM when operating outside of Immersion Mode. The Quanta is also equipped with an e-beam lithography system, a four-point electrical probing station, and a Hot/Cold Stage attachment. Its small chamber allows for fast pump and vent times, which makes this SEM very useful for quick inspection. See a full list of training and educational resources for the Quanta below.
===== SEM Applications =====
* High-Resolution Imaging (Field-Free Mode aka Normal Mode)
* Secondary Electron (SE) imaging with an Everhart-Thornley Detector (ETD)
* Backscattered Electron (BSE) imaging with a solid-state Backscattered Electron Detector (BSED)
* ESEM Mode for imaging biological samples using Large Field Detector (LFD) & Gaseous Secondary Electron Detector (GSED)
* ESEM Mode for imaging highly non-conductive samples using LFD & GSED (the water vapor environment wicks away charge from sample); 500 &mu;m clip-on aperture (to the bottom of the SEM column) is available for use in ESEM Mode to improve resolution
===== Other Applications =====
* E-beam lithography with the Nanometer Pattern Generating System (NPGS) software
* Hot & Cold Stage for observing a sample from -185 to 240 &deg;C
* Four-Point Electrical Probe Station for ''in situ'' electrical measurements

== Resources ==

===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/mpsxkxmf5y8wjw9daijwbudeoqkkeudu KNI Microscopy Policies]
* SEM SOPs ([https://caltech.box.com/s/1yqfsg1cl6x9w9414bsqiqxcp4cl2bub Short Version] | [https://caltech.box.com/s/qwjhdb252dq8lk5ap5up829pvd3g1fvo Long Version])
* E-beam Lithography SOPs ([https://caltech.box.com/s/n5ft2s02i92698vy3m1w6tp60s2o407s Short Version] | [https://caltech.box.com/s/pt78znsx8dj01t7fuwdknzq0uzvy3ueg Long Version])
* [https://caltech.box.com/s/vg9rpa4ac9e1eki79hfecccpohl3qp6u Performing Aligned Patterning Steps with NPGS] | [https://caltech.box.com/s/tl4bliegxptu5tfmzu0p7vs1hcnxtyj8 Alignment Template Files]
* [https://caltech.box.com/s/e5cdnag69i2w9nm1d0p07fyun4k15b5c Environmental SEM (ESEM) Imaging Guide]
* [https://caltech.box.com/s/xa6da8tjz4u5yksi9ozhvg1l1f6v357a Review Paper on secondary electron contrast in low-vacuum and ESEM of dielectrics]
* [https://caltech.box.com/s/n91a9brnyg5ntg48ztkzn95knl63i9ed Troubleshooting Guide]

===== Video Tutorials =====
* [https://youtu.be/UfF_ljwvepQ Getting Started] | [https://youtu.be/luC-5TgNPsQ Basic SEM Alignment]
* Astigmatism Correction ([https://youtu.be/YeukVt1Fyi0 Details] | [https://youtu.be/WFfOi-rwlbA On Right-Angle Features] | [https://youtu.be/1syySgnTEqU Stigmator Alignment])
* [https://youtu.be/4V-bE6uqHY4 Eucentric Height: What it means, When to use it & How to get there]
===== Graphical Handouts =====
* [https://caltech.box.com/s/pxl99bbc1jm1tbjshfaotm91xm0mqs1i SEM Concepts]
* [https://caltech.box.com/s/k2iy75hxiwkehv0ogqelz2sux9e1cs5k SEM Alignments]
* [https://caltech.box.com/s/ijd8gprg9gcavb6of5uegu7osinzsdet Guide to Optimizing SEM Imaging]
===== Presentations =====
* SEM Essentials: Capabilities and Limitations of Scanning Electron Microscopy; and SEM Setup, Parameters and Theory for Successful Operations and Measurements
**[https://caltech.box.com/s/eg20eqw7si5ka0bms251qurfwhys0hta Download .pptx Slides]
* Scanning Electron Microscopy: Principles, Techniques & Applications (includes slides on ESEM, Lithography, Probe Station, Hot & Cold Stage)
** [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Pptx Slides] | [https://youtu.be/Zh21tp3aPEw YouTube Lecture]

===== Manufacturer Manuals =====
* [https://caltech.box.com/s/urxbsk9wrruxcnj345c3rjb37dc48k64 Quanta 200F SEM Operation Manual]
* [https://caltech.box.com/s/ijtjy0dzm7kwiidm0v87jlw8t9azi0xr Mailbox Prober Operation Manual]
* [https://caltech.box.com/s/07oq9u320tfds4iktjzlr62n8l1rh95r Gatan C1002 Cold Stage Users Manual]

===== Simulation Software =====
* [http://www.gel.usherbrooke.ca/casino/What.html CASINO Electron Beam Simulation Software] – simulate e-beam/specimen interactions
===== Calibrate Measurements with NIST Standard =====
* The KNI has a NIST-traceable standard against which SEM measurements can be compared. See Slides 54-55 of the [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f SEM Presentation] for details. Ask staff for help finding and using the standard in the lab.
===== Sample Preparation =====
* Use the [[Carbon Evaporator]] to make non-conductive samples conductive by applying 2-10 nm of evaporated carbon.
* Use the [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner |
O<sub>2</sub>/Ar Plasma Cleaner]] to remove hydrocarbons from the sample surface to avoid creating dark contamination spots on your features while imaging them.
===== Order Your Own Stubs =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some old stubs at each SEM, yet you should buy your own so that you can keep them clean and available to you. There are many stub geometries and configurations, some of which will be right for you to purchase and keep with your other cleanroom items.
** [https://www.tedpella.com/SEM_html/SEMclip.htm.aspx Buy stubs with copper clips] (recommended for most devices, especially those with non-conductive substrates) 
** [https://www.tedpella.com/sem_html/SEMpinmount.htm Buy stubs without copper clips] (OK for devices with conductive substrates)
===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

== Specifications ==
===== SEM & ESEM Specifications =====
* Minimum Feature Size Resolved in SEM Mode: ~15 nm
* Voltage Range: 0.2 to 30.0 kV
* Current Range: "Spot Size" 1 to 7 (approximately 30 pA to 20 nA), with increments of 0.1
* Apertures: 30 &mu;m, 40 &mu;m, 50 &mu;m, 100 &mu;m
* Eucentric Height: 10 mm working distance (WD)
* Stage Range: ±25 mm X & Y travel, 50 mm Z travel, -150 to 70&deg; tilt, 360&deg; rotation
* ETD Grid Bias Range: -150 to 300 V
* Ultimate Vacuum: 3e-7 mbar
* ESEM Mode Pressure Range: 0.1 to 27.0 mbar (water vapor is used as chamber gas)
* Minimum Feature Size Resolved in ESEM Mode: ~10 nm

===== Lithography with NPGS Specifications =====
* Minimum Feature Produced: ~17 nm diameter dots & ~20 nm wide lines (via liftoff of 10 nm Ti on Si)
* Shapes Available: Polygons (area dose), Single Pass Lines (line dose) & Dot Arrays (point dose) of any arbitrary shape
* Writing Speed: 5 MHz
* Digital-to-Analog Converter (DAC): 16-bit
* Keithley 487 Picoammeter / Voltage Source is available for measuring beam current
===== Probe Station Specifications =====
* Probe Station Manufacturer: Kammrath & Weiss
* Parameter Analyzer: HP4145B Available [https://caltech.box.com/s/xumvbal8rmyggb3h87hk0g5s8b957hqg (Manual)], or bring your own
* Keithley 487 Picoammeter / Voltage Source is available as a function generator
* Probe station connectors rated up to 42 V, measure up to mA of current
===== Hot & Cold Stage Specifications =====
* Temperature Range: -185 to 240&deg; C
* Stage is cooled by air that is itself cooled by flowing it through a liquid nitrogen heat exchanger
* Stage is heated by a resistive heating element
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== Related Instrumentation in the KNI ==
===== Scanning Electron Microscopes (SEMs) =====
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe]]
* [[Nova 200 NanoLab: SEM & EDS | Nova 200 NanoLab: SEM & EDS]]
* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM, ESEM, Lithography & Probe Station]]

===== Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | EBPG 5200: Electron Beam Pattern Generator (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: Electron Beam Pattern Generator (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM, ESEM, Lithography & Probe Station]]
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium, Neon & Gallium FIB]]
===== Focused Ion Beam (FIB) Systems =====
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe]]
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium, Neon & Gallium FIB]]
===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]
===== Transmission Electron Microscope =====
* [[Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF | Tecnai TF-30: TEM, STEM, EDS & HAADF (50-300 kV)]]

===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Dimension Icon: Atomic Force Microscope (AFM)]]
* [[Dektak 3ST: Profilometer | Dektak 3ST: Profilometer]]