Difference between revisions of "Equipment List"

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(Created page with "This page will contain a list of all equipment located in the lab.")
 
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This page will contain a list of all equipment located in the lab.
=Lithography=
===== Electron Beam Lithography =====
* Raith EBPG 5000+ (100 kV)
* Raith EBPG 5200 (100 kV)
* Quanta 200F SEM with NPGS (1-30 kV)
 
===== Ion Beam Lithography =====
* Zeiss ORION NanoFab (5-40 kV He & Ne, 1-30 kV Ga)
 
===== Photolithography =====
* Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
* i-Line Wafer Stepper: GCA model 6300
* Direct-Write Laser System: Heidelberg Instruments DWL-66
* Two-Photon Lithography (3D printing): Nanoscribe Photonic Professional GT
 
= Deposition Equipment =
===== Evaporation =====
* Kurt J Lesker Labline (Al, Au, Pt, Ti)
* CHA Industries Mark 40 (Metals & Oxides)
* Leica EM ACE600 Carbon Evaporator
 
===== Sputtering =====
* Dielectric Sputterer: AJA International ATC Orion 8
* Chalcogenide Sputterer: AJA International ATC Orion 5
 
===== Plasma- & Thermal-Enhanced Deposition =====
* Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
* Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100 PECVD
* Tube Furnaces: Tystar Tytan (Wet & Dry Oxidation and Annealing)

Revision as of 21:48, 25 March 2019

Lithography

Electron Beam Lithography
  • Raith EBPG 5000+ (100 kV)
  • Raith EBPG 5200 (100 kV)
  • Quanta 200F SEM with NPGS (1-30 kV)
Ion Beam Lithography
  • Zeiss ORION NanoFab (5-40 kV He & Ne, 1-30 kV Ga)
Photolithography
  • Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
  • i-Line Wafer Stepper: GCA model 6300
  • Direct-Write Laser System: Heidelberg Instruments DWL-66
  • Two-Photon Lithography (3D printing): Nanoscribe Photonic Professional GT

Deposition Equipment

Evaporation
  • Kurt J Lesker Labline (Al, Au, Pt, Ti)
  • CHA Industries Mark 40 (Metals & Oxides)
  • Leica EM ACE600 Carbon Evaporator
Sputtering
  • Dielectric Sputterer: AJA International ATC Orion 8
  • Chalcogenide Sputterer: AJA International ATC Orion 5
Plasma- & Thermal-Enhanced Deposition
  • Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
  • Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100 PECVD
  • Tube Furnaces: Tystar Tytan (Wet & Dry Oxidation and Annealing)