Equipment List

Lithography

Electron Beam Lithography

• Electron Beam Pattern Generator: Raith EBPG 5200 (100 keV)
• Electron Beam Pattern Generator: Raith EBPG 5000+ (100 keV)
• Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 keV)
• Nanometer Pattern Generation System: Thermo Fisher Tecnai TF-20 S/TEM with NPGS (80-200 keV)

Ion Beam Lithography

• He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 keV He & Ne, 1-30 keV Ga)

Optical Lithography

• Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
• i-Line Wafer Stepper: GCA model 6300
• Direct-Write Laser System: Heidelberg Instruments DWL-66
• Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT

Deposition

Evaporation

• Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline
• Metals & Oxides: CHA Industries Mark 40
• Carbon: Leica EM ACE600 Carbon Evaporator

Sputtering

• Dielectric Sputterer: AJA International ATC Orion 8
• Chalcogenide Sputterer: AJA International ATC Orion 5

Chemical Vapor Deposition (CVD)

• Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
• Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100

Dielectric Packaging / Moisture Barrier

• Parylene Coater: Para Tech LabTop 3000

Etching

Dry Etching

• Silicon Etcher: Oxford Instruments DRIE System 100 Cryo ICP–RIE
• Silicon, III/V Material & Metal Etcher: Oxford Instruments DRIE System 100 ICP–RIE
• Dielectric Material Etcher: Oxford Instruments Dielectric System 100, 380 V source, ICP–RIE
• Silicon, III/V Material & Organics Etcher: Plasmatherm RIE
• Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE
• XeF2 Silicon Etcher

Wet Etching

• Available Wet Chemistry Techniques

Microscopy

Focused Ion Beam (FIB) Systems

• He/Ne/Ga-FIB: Zeiss ORION NanoFab
• SEM/Ga-FIB/Omniprobe: Thermo Fisher Nova NanoLab 600

Scanning Electron Microscopes (SEMs)

• SEM/EDS/WDS: Thermo Fisher Nova NanoLab 200
• SEM/EDS: Thermo Fisher Sirion
• SEM/ESEM: Thermo Fisher Quanta 200F
• SEM/Ga-FIB/Omniprobe: Thermo Fisher Nova NanoLab 600

Transmission Electron Microscopes (TEMs)

• TEM/STEM/EDS/EELS/EFTEM/NPGS: Thermo Fisher Tecnai TF-20 (80-300 kV)
• TEM/STEM/EDS/HAADF: Thermo Fisher Tecnai TF-30 (80-200 kV)

Scanning Probe Microscopes

• Atomic Force Microscope (AFM): Bruker Dimension ICON
• Profilometer: Veeco Dektak 3ST

Optical Microscopes

• Fluorescence Microscope: Olympus IX81
• Light Microscope: Olympus BX51M with Filmetrics model F40

Support Tools

Metrology

• Spectroscopic Ellipsometry: Woolam M-2000
• Thin Film Measurement: Filmetrics model F40
• Profilometer: Veeco Dektak 3ST

Thermal Processing

• Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)
• Rapid Thermal Processing: Modular Process Technology RTP-600S
• Rapid Thermal Annealer: Jipelec Jetfirst 150

Substrate Processing

• Scriber-Breaker: Dynatex GST-150
• Wafer Bonder: Suss Microtech model SB6L
• Critical Point Dryer: Tousimis Automegasamdri 915B

Device Processing

• Wedge-Wedge Wire Bonder: Westbond model 7476D-79
• Electrical Probing Station: Cascade Microtech M150