Difference between revisions of "Equipment List"

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(Created page with "This page will contain a list of all equipment located in the lab.")
 
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This page will contain a list of all equipment located in the lab.
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=Lithography=
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===== Electron Beam Lithography =====
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* Raith EBPG 5000+ (100 kV)
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* Raith EBPG 5200 (100 kV)
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* Quanta 200F SEM with NPGS (1-30 kV)
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===== Ion Beam Lithography =====
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* Zeiss ORION NanoFab (5-40 kV He & Ne, 1-30 kV Ga)
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===== Photolithography =====
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* Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
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* i-Line Wafer Stepper: GCA model 6300
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* Direct-Write Laser System: Heidelberg Instruments DWL-66
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* Two-Photon Lithography (3D printing): Nanoscribe Photonic Professional GT
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= Deposition Equipment =
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===== Evaporation =====
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* Kurt J Lesker Labline (Al, Au, Pt, Ti)
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* CHA Industries Mark 40 (Metals & Oxides)
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* Leica EM ACE600 Carbon Evaporator
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===== Sputtering =====
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* Dielectric Sputterer: AJA International ATC Orion 8
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* Chalcogenide Sputterer: AJA International ATC Orion 5
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===== Plasma- & Thermal-Enhanced Deposition =====
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* Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
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* Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100 PECVD
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* Tube Furnaces: Tystar Tytan (Wet & Dry Oxidation and Annealing)

Revision as of 21:48, 25 March 2019

Lithography

Electron Beam Lithography
  • Raith EBPG 5000+ (100 kV)
  • Raith EBPG 5200 (100 kV)
  • Quanta 200F SEM with NPGS (1-30 kV)
Ion Beam Lithography
  • Zeiss ORION NanoFab (5-40 kV He & Ne, 1-30 kV Ga)
Photolithography
  • Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
  • i-Line Wafer Stepper: GCA model 6300
  • Direct-Write Laser System: Heidelberg Instruments DWL-66
  • Two-Photon Lithography (3D printing): Nanoscribe Photonic Professional GT

Deposition Equipment

Evaporation
  • Kurt J Lesker Labline (Al, Au, Pt, Ti)
  • CHA Industries Mark 40 (Metals & Oxides)
  • Leica EM ACE600 Carbon Evaporator
Sputtering
  • Dielectric Sputterer: AJA International ATC Orion 8
  • Chalcogenide Sputterer: AJA International ATC Orion 5
Plasma- & Thermal-Enhanced Deposition
  • Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
  • Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100 PECVD
  • Tube Furnaces: Tystar Tytan (Wet & Dry Oxidation and Annealing)