Safety Data Sheets (SDS): Difference between revisions
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* [https://caltech.box.com/s/8vhfkx9fpxb50nh0czayacgimjznziaa 1,1,2 Trichloroethane] (Sigma-Aldrich, Inc.) | * [https://caltech.box.com/s/8vhfkx9fpxb50nh0czayacgimjznziaa 1,1,2 Trichloroethane] (Sigma-Aldrich, Inc.) | ||
* [https://caltech.box.com/s/9dhon8rvth8yfbfkaaruwcecjs1ah3tl 2-Propanol] (Alfa Aesar, A Johnson Matthey Co.) | * [https://caltech.box.com/s/9dhon8rvth8yfbfkaaruwcecjs1ah3tl 2-Propanol] (Alfa Aesar, A Johnson Matthey Co.) | ||
* [https://caltech.box.com/s/syilujde6ajch0jeieqmcwrb47yw8l2v 26A Developer] (Rohm & Haas Electonic materials LLC) | |||
* [https://caltech.box.com/s/mjx2rtfulbsx7tuwpba3mtdebbslxuj4 2401 Developer] (Rohm & Haas Electonic materials LLC) | * [https://caltech.box.com/s/mjx2rtfulbsx7tuwpba3mtdebbslxuj4 2401 Developer] (Rohm & Haas Electonic materials LLC) | ||
* [https://caltech.box.com/s/h6tjat5rr74fruq6oxwfmpftc77tk56s 4-Methyl-2-Pentanone, Omnisolve] (EMD Chemicals) | * [https://caltech.box.com/s/h6tjat5rr74fruq6oxwfmpftc77tk56s 4-Methyl-2-Pentanone, Omnisolve] (EMD Chemicals) | ||
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* [https://caltech.box.com/s/ywpkhtdmrhcc0lslp3xm6knlncs1ugvg ma-N 2400 Negative Tone Photoresist] (MicroResist Technology GmbH) | * [https://caltech.box.com/s/ywpkhtdmrhcc0lslp3xm6knlncs1ugvg ma-N 2400 Negative Tone Photoresist] (MicroResist Technology GmbH) | ||
* [https://caltech.box.com/s/2drpzcvvv9i9mh8on2xkiw92bpocs69a MCC Primer 80/20] (Micro-Chem) | * [https://caltech.box.com/s/2drpzcvvv9i9mh8on2xkiw92bpocs69a MCC Primer 80/20] (Micro-Chem) | ||
* [https://caltech.box.com/s/mk4rilpjcbd5ryjb1tw764eau62mjq7f Methanol] (Honeywell) | * [https://caltech.box.com/s/mk4rilpjcbd5ryjb1tw764eau62mjq7f Methanol] (Honeywell) | ||
* [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] (Mallinckrodt Baker) | * [https://caltech.box.com/s/tf1ty82wcbf68l7gekqsna3ajuiljhkw Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)] (Mallinckrodt Baker) | ||
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* [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nano-strip] (Cyantek Corp) | * [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nano-strip] (Cyantek Corp) | ||
* [https://caltech.box.com/s/7kregn5wj0i2hsibgghqg0ijgfo4obf7 Nano-strip] (KMG Electronic Chemicals) | * [https://caltech.box.com/s/7kregn5wj0i2hsibgghqg0ijgfo4obf7 Nano-strip] (KMG Electronic Chemicals) | ||
* [https://caltech.box.com/s/7kregn5wj0i2hsibgghqg0ijgfo4obf7 | * [https://caltech.box.com/s/7kregn5wj0i2hsibgghqg0ijgfo4obf7 NR9-1000PY Neg Resist] (Futurrex, Inc) | ||
* [https://caltech.box.com/s/zbx18j7p3l5cax605ezbgc2keybsmu7v | * [https://caltech.box.com/s/zbx18j7p3l5cax605ezbgc2keybsmu7v NR9-3000PY Neg Resist] (Futurrex, Inc) | ||
* [https://caltech.box.com/s/xwccvm0tvzpp2wctg4ttv8x0x4jn63zy | * [https://caltech.box.com/s/xwccvm0tvzpp2wctg4ttv8x0x4jn63zy NR71-1000P Neg Resist] (Futurrex, Inc) | ||
* [https://caltech.box.com/s/oh9t0b1zdqi8cf6nv3a3aod8venkke44 | * [https://caltech.box.com/s/oh9t0b1zdqi8cf6nv3a3aod8venkke44 NR71-3000P Neg Resist] (Futurrex, Inc) | ||
* [https://caltech.box.com/s/2gswdxzgm6oer0w9wau6d2zm90j2j4gd Neutralizing Acid Rinse] (Labconco) | * [https://caltech.box.com/s/2gswdxzgm6oer0w9wau6d2zm90j2j4gd Neutralizing Acid Rinse] (Labconco) | ||
* [https://caltech.box.com/s/ulyqkf8zud87ec674ucchyagvb017iqc Nickel Etch TFB] (Transene Company Inc.) | * [https://caltech.box.com/s/ulyqkf8zud87ec674ucchyagvb017iqc Nickel Etch TFB] (Transene Company Inc.) | ||
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* [https://caltech.box.com/s/0h80255g6ca35oyul05jlsbf4d6czqcf Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate)] (Sigma-Aldrich) | * [https://caltech.box.com/s/0h80255g6ca35oyul05jlsbf4d6czqcf Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate)] (Sigma-Aldrich) | ||
* [https://caltech.box.com/s/z2qm5j4kowmox852a2fptl1uiqy3p4bd Poly-L-lysine solution P8920] (Sigma-Aldrich) | * [https://caltech.box.com/s/z2qm5j4kowmox852a2fptl1uiqy3p4bd Poly-L-lysine solution P8920] (Sigma-Aldrich) | ||
* [https://caltech.box.com/s/6whtxfp49qgp8xfhjg45888o0huixrid Potassium Hydroxide 20%] (EMD Chemicals) | * [https://caltech.box.com/s/6whtxfp49qgp8xfhjg45888o0huixrid Potassium Hydroxide 20%] (EMD Chemicals) | ||
* [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] (Fisher Scientific) | * [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] (Fisher Scientific) | ||
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* [https://caltech.box.com/s/u0jvkotdqy35j7bvb4xdun04ri20qhai ProTEK Remover 100] (Brewer Science) | * [https://caltech.box.com/s/u0jvkotdqy35j7bvb4xdun04ri20qhai ProTEK Remover 100] (Brewer Science) | ||
* [https://caltech.box.com/s/lhyfvbtcqgqxnhtxuvqoo13lf6sz0s4s PRS-3000] (Advantor Performance Materials, Inc.) | * [https://caltech.box.com/s/lhyfvbtcqgqxnhtxuvqoo13lf6sz0s4s PRS-3000] (Advantor Performance Materials, Inc.) | ||
* [https://caltech.box.com/s/vyysksctvl3ewv2vzm1s8kmz3l65p507 PRX-127 Plasma Etch Polymer Remover] (Rohm & Haas Electronic | * [https://caltech.box.com/s/vyysksctvl3ewv2vzm1s8kmz3l65p507 PRX-127 Plasma Etch Polymer Remover] (Rohm & Haas Electronic Materials) | ||
* [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover] (Micro-Chem) | * [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover] (Micro-Chem) | ||
* [https://caltech.box.com/s/9c49zyuflewcyb2hfbg45xi3utoghevl Resist Developer RD6] (Futurrex, Inc) | * [https://caltech.box.com/s/9c49zyuflewcyb2hfbg45xi3utoghevl Resist Developer RD6] (Futurrex, Inc) | ||
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* [https://caltech.box.com/s/nexs03418hwl9f60c5z8m6auxvjoqgzq SIPR-7126M-20] (Shin-Etsu Chemical Co., Ltd.) | * [https://caltech.box.com/s/nexs03418hwl9f60c5z8m6auxvjoqgzq SIPR-7126M-20] (Shin-Etsu Chemical Co., Ltd.) | ||
* [https://caltech.box.com/s/y7vwye1wn8yjfrjpk7ul7n1bd169gyrk Sodium hydroxide solution (2 mol/l)] (Millipore) | * [https://caltech.box.com/s/y7vwye1wn8yjfrjpk7ul7n1bd169gyrk Sodium hydroxide solution (2 mol/l)] (Millipore) | ||
* [https://caltech.box.com/s/upecsp7vnvszw973b251zpkft4uaece9 SPR 220 (0.7-7.0)] Photo Resist (Shipley Company) | |||
* [https://caltech.box.com/s/smujtrnz07ivsos4j57jxa4u1fx4rv2y SPR 220-3.0 Positive Photoresist] (Rohm & Haas Electonic materials LLC) | |||
* [https://caltech.box.com/s/lnt0eq7vb43b39peo1uttiw7q4es9foe SPR 220-7.0 Positive Photoresist] (Rohm & Haas Electonic materials LLC) | |||
* [https://caltech.box.com/s/osvhjx5f8w28tga14gnzdpq46tllb0a9 SPR 955CM-0.9 Positive Photoresist] (Rohm and Haas Electronic Materials) | |||
* [https://caltech.box.com/s/lfit7bvctucux6ys18di9z44gi4tbbfv SU-8 2000 Series Resists] (MicroChem) | * [https://caltech.box.com/s/lfit7bvctucux6ys18di9z44gi4tbbfv SU-8 2000 Series Resists] (MicroChem) | ||
* [https://caltech.box.com/s/avqs14mt28i1epom0n6w37p55rjqvkbe SU-8 Developer] (Micro-Chem) | * [https://caltech.box.com/s/avqs14mt28i1epom0n6w37p55rjqvkbe SU-8 Developer] (Micro-Chem) | ||
Revision as of 00:24, 13 May 2022
Find the Safety Data Sheet (SDS) for any approved material in the KNI Lab below (you can also browse the KNI's SDS Box Directory).
Gases
- 1,1,1,2-Tetraflouroethane (Matheson Tri-Gas)
- Air Compressed (Air Liquide)
- Argon, compressed (Matheson Tri-Gas)
- Boron Trichloride (Matheson Tri-Gas)
- Carbon Dioxide, Gas (Matheson Tri-Gas)
- Chlorine (Matheson Tri-Gas)
- Ethylene (Matheson Tri-Gas)
- Flourine in Krypton, Xenon, Argon, Nelium, Neon and/or Nitrogen (Spectra Gases)
- Fluoroform (Matheson Tri-Gas)
- Halocarbon 14 (Matheson Tri-Gas)
- Helium (Matheson Tri-Gas)
- Hydrogen (Matheson Tri-Gas)
- Hydrogen Bromide (Matheson Tri-Gas)
- Hydrogen Bromide 33% in AceticAcid (Science Lab)
- Methane / Argon Mixture (Matheson Tri-Gas)
- Methane, Compressed Gas (Matheson Tri-Gas)
- Nitrogen Triflouride (Matheson Tri-Gas)
- Nitrogen, Compressed Gas (Matheson Tri-Gas)
- Nitrogen, Cryogenic Liquid (Matheson Tri-Gas)
- Nitrous Oxide (Matheson Tri-Gas)
- Octoflourocyclobutane (Matheson Tri-Gas)
- Oxygen in Nitrogen (Linde Gas North America)
- Oxygen, Compressed Gas (Matheson Tri-Gas)
- Silane (Matheson Tri-Gas)
- Silane 5% Argon Balance (Matheson Tri-Gas)]
- Silane 5% Helium Balance (Matheson Tri-Gas)
- Silane 5% Nitrogen Balance (Matheson Tri-Gas)
- Silicon Tetrachloride (Matheson Tri-Gas)
- Sulfur Hexafluoride (Matheson Tri-Gas)
- Tetrafluoromethane (Matheson Tri-Gas)
- Tetrafluoromethane (Specialty Gases of America)
- Trifluoromethane (Matheson Tri-Gas)
Liquids
- 1,2 - Dichlorobenzene (Aldrich Chemical Co. )
- 1,2 - Dichlorobenzene (Alfa Aesar, A Johnson Matthey Co.)
- 1,1,2 Trichloroethane (Sigma-Aldrich, Inc.)
- 2-Propanol (Alfa Aesar, A Johnson Matthey Co.)
- 26A Developer (Rohm & Haas Electonic materials LLC)
- 2401 Developer (Rohm & Haas Electonic materials LLC)
- 4-Methyl-2-Pentanone, Omnisolve (EMD Chemicals)
- 495 PMMA Series Resist in Anisole (Micro-Chem)
- 495 PMMA Series Resist in Chlorobenezene (Micro-Chem)
- 5-Ethylidene-2-Norborne (Sigma-Aldrich)
- 500F Spin-on Glass (Filmtronics)
- 950 PMMA Series Resist in Anisole (Micro-Chem)
- 950 PMMA Series Resist in Chlorobenezene (Micro-Chem)
- Accuglass T-11 (Honeywell Electronic Materials)
- Acetic Acid Glacial (J.T. Baker)
- Acetone (Honeywell, Burdick & Jackson)
- Acetone (Mallinckrodt Baker)
- Acetone, HPLC (EMD Chemicals)
- Adhesion Promoter AP3000 (Dow Chemicals)
- AF Amorphous Flouropolymer Solutions (DuPont)
- Aluminum Etchant Type A (Transene Company Inc.)
- Aluminum Etchant Type D (Transene Company Inc.)
- Ammonium Hydroxide, 25% NH3 (Alfa Aesar, A Johnson Matthey Co.)
- Ammonium Hydroxide water solution (Fisher Scientific)
- Ammonium Persulfate (Sigma-Aldrich)
- Amyl Acetate (Mallinckrodt Baker)
- Anisole (Alfa Aesar, A Johnson Matthey Co.)
- AQM SiOx 1-10% in MIBK (Applied Quantum Materials Inc.)
- aquaSAVE-53za (Mitsubishi Rayon Co.,LTD)
- AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials)
- AZ 400K Developer (AZ Electronic Materials)
- AZ 5214-E Photoresist (AZ Electronic Materials)
- AZ 726 MIF Developer (AZ Electronic Materials)
- AZ 917 MIF Developer (EDM Performance Materials Corp)
- AZ 9260 Photoresist (520CPS) (EMD Performance Materials Corp)
- AZ BARLI-II Coating 90 (EMD Performance Materials Corp)
- AZ NLOF 2020 Photoresist (AZ Electronic Materials)
- AZ P4330-RS Photoresist (AZ Electronic Materials)
- AZ P4620 Photoresist (AZ Electronic Materials)
- AZ P4903 Photoresist (Clariant Corporation)
- B-1200 Spin on Glass / BCB (Desert Silicon, L.L.C. )
- BenzoCycloButene 98% (Sigma-Aldrich)
- Bromine (Science Lab)
- Bromine Water (Fisher Scientific)
- Buffered HF Improved (Transene Company Inc.)
- Buffer HF, Siloxide Etchant (Transene Company Inc.)
- Buffered Oxide Etch (Mallinckrodt Baker)
- Buffered Oxide Etchant 6:1 (KMG Electronic Chemicals)
- CA-40 (Cyantek Corp)
- CC-300.40S developer (Cyantek Corp)
- Chlorobenzene (Alfa Aesar, A Johnson Matthey Co.)
- Chloroform (Mallinckrodt Baker)
- Chloroform, Omnisolve (EMD Chemicals)
- Chlorotrimethylsilane (Alfa Aesar, A Johnson Matthey Co.)
- Chromium Etchant (Sigma-Aldrich)
- Chromium Etchant CR-7S (Cyantek Corp)
- Citric Acid 1.0 Molar Solution (Aqua Solutions Inc.)
- Citric Acid 20% W/V (Fisher Scientific)
- Citric Acid Monohydrate (Fisher Scientific)
- Copper Etchant APS-100 (Transene Company Inc.)
- Copper Etchant CE-100, CE-200 (Transene Company Inc.)
- Cyclopentanone (Alfa Aesar, A Johnson Matthey Co.)
- Cylclotene 4022-35 (Dow Chemicals)
- Cylclotene 4024-40 (Dow Chemicals)
- Cytop CTL - 809 (Asahi Glass Co., LTD)
- Developer DS2100 (Dow Chemicals)
- Developer for Photoresist ma-D 525 (Micro Resist Technology)
- Dichloromethane (Alfa Aesar, A Johnson Matthey Co.)
- Dichloromethane, Omnisolv (EMD Chemicals)
- Dicyclopentadiene (Sigma-Aldrich)
- Diethyl Ether (Sciencelab.com Inc.)
- Di(trimethylolpropane) tetraacrylate (Sigma-Aldrich)
- Dow Corning High Vacuum Grease (Dow Chemicals)
- EBR PG-Positive Radiation Resist Edge Bead Remover (Micro-Chem)
- Elevate Gold 7990 Conductivity Solution (Technic, Inc.)
- Elevate Gold 7990 Make Up (Technic, Inc.)
- Elevate Gold 7990 RTU (Technic, Inc.)
- Ethyl Acetate (Honeywell, Burdick & Jackson)
- Gelest OE 42 (Gelest, Inc)
- Gelest OE 43 (Gelest, Inc)
- GOLD (1) Trisodium Disulphite (Kojima Chemicals Co., LTD)
- Hexamethyldisilizane (Alfa Aesar, A Johnson Matthey Co.)
- Hexamethyldisilizane (Mallinckrodt Baker)
- Hydrobromic Acid 44-50% in Water (Fisher Scientific)
- Hydrochloric Acid (Columbus Chemical Industries, Inc)
- Hydrogen Bromide, 33% Solution in Acetic Acid (Science Lab)
- Hydrogen Peroxide, 30% (Fisher Scientific)
- Hydrogen Peroxide, 30% (Seastar Chemcals)
- Hysol 1C Varian Epoxy Adhesive (Fisher Scientific)
- Immersion Gold CF Part A GHS (Transene Company, Inc)
- Immersion Gold CF Part B GHS (Transene Company, Inc)
- Ink-N AQ (Henkel Corporation)
- Iodine (Science Lab)
- Iodine 0.1N (BDH VWR Analytical)
- Isobutyl Alcohol (Mallinckrodt Baker)
- Isopropyl Alcohol (90%-100%) (Mallinckrodt Baker)
- JM 60000 Make Up (Technic, Inc)
- JM 6000 Secondary (Technic, Inc.)
- L 4798 / pH=4,01 (Si Analytics)
- L 4798 / pH=6,87 (Si Analytics)
- L 4798 / pH=9,18 (Si Analytics)
- Liquid Detergent (Labconco)
- Liquid Citric Acid, 50% (HydroChem Industrial Services)
- LOR A Series Resist (Micro-Chem)
- LOR B Series Resist (Micro-Chem)
- ma-D 525 Developer (MicroResist Technology GmbH)
- ma-N 2400 Negative Tone Photoresist (MicroResist Technology GmbH)
- MCC Primer 80/20 (Micro-Chem)
- Methanol (Honeywell)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone) (Mallinckrodt Baker)
- Methylene Chlorine (Dichloromethane) (Burdick & Jackson Inc)
- Microposit 319 Developer (Rohm & Haas Electonic materials LLC)
- Microposit 322 Developer (Rohm & Haas Electonic materials LLC)
- Microposit CD 26 Developer (Rohm & Haas Electonic materials LLC)
- Microposit S1813 Photoresist (Shipley Company)
- Microposit S1818 Photoresist (Rohm & Haas Electronic materials LLC)
- MMA (8.5) MAA Copolymer Series Resist (Micro-Chem)
- MONOETHANOLAMINE (Dow Chemical Company)
- N-Methylpyrrolidone (Honeywell, Burdick & Jackson)
- Nano-strip (Cyantek Corp)
- Nano-strip (KMG Electronic Chemicals)
- NR9-1000PY Neg Resist (Futurrex, Inc)
- NR9-3000PY Neg Resist (Futurrex, Inc)
- NR71-1000P Neg Resist (Futurrex, Inc)
- NR71-3000P Neg Resist (Futurrex, Inc)
- Neutralizing Acid Rinse (Labconco)
- Nickel Etch TFB (Transene Company Inc.)
- Nitric Acid (Columbus Chemical)
- Nitrogen, Cryogenic Liquid (Matheson Tri-Gas)
- OmniCoat-Organic Polymer Solution (Micro-Chem)
- Overcoat-G IPA-DAA (Cambrios Technologies)
- Overcoat-P PGME TH (Cambrios Technologies)
- Pentaerythritol Tetraacrylate (Sigma-Aldrich)
- Pentaerythritol tetrakis(3-mercaptopropionate (Sigma-Aldrich)
- Phosphoric Acid (Columbus Chemical Industries, Inc)
- Phosphoric Acid (Sigma-Aldrich)
- PI-2562, Polyimide Coating (HD MicroSystems)
- PI-2611, Polyimide Precursor Coatings, Polyamic Acid (HD MicroSystems)
- PMGI SF Series Resists (MicroChem)
- Poly(ethylene glycol) Diacrylate (Sigma-Aldrich)
- Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (Sigma-Aldrich)
- Poly-L-lysine solution P8920 (Sigma-Aldrich)
- Potassium Hydroxide 20% (EMD Chemicals)
- Potassium Hydroxide (Fisher Scientific)
- Primary Stripper A (Dow Chemical)
- ProTEK B1-25 (Brewer Science)
- ProTEK B3 Primer (Brewer Science)
- ProTEK B3-25 (Brewer Science)
- ProTEK Primer (Brewer Science)
- ProTEK PSB Primer (Brewer Science)
- ProTEK PSB-23 (Brewer Science)
- ProTEK Remover 100 (Brewer Science)
- PRS-3000 (Advantor Performance Materials, Inc.)
- PRX-127 Plasma Etch Polymer Remover (Rohm & Haas Electronic Materials)
- Remover PG, Photoresist Remover (Micro-Chem)
- Resist Developer RD6 (Futurrex, Inc)
- Resist Remover RR5 (Futurrex, Inc)
- Resist Remover RR41 (Futurrex, Inc)
- Rinse T1100 (Dow Chemicals)
- Silicone Potting Compound (GE Silicones)
- Silquest A-174 (Momentive Performance Materials)
- Silquest A-174NT Silane (Momentive Performance Materials)
- SIPR-7126M-20 (Shin-Etsu Chemical Co., Ltd.)
- Sodium hydroxide solution (2 mol/l) (Millipore)
- SPR 220 (0.7-7.0) Photo Resist (Shipley Company)
- SPR 220-3.0 Positive Photoresist (Rohm & Haas Electonic materials LLC)
- SPR 220-7.0 Positive Photoresist (Rohm & Haas Electonic materials LLC)
- SPR 955CM-0.9 Positive Photoresist (Rohm and Haas Electronic Materials)
- SU-8 2000 Series Resists (MicroChem)
- SU-8 Developer (Micro-Chem)
- SU-8 Series Resists (MicroChem)
- SURFACEstrip 419 (Dow Chemical Company)
- Sulfuric Acid (Seastar Chemcals)
- SurPass 3000 (DisChem Inc)
- SurPass 4000 (DisChem Inc)
- Sylgard 184 Silcone Elastomer Curing Agent (Dow Corning)
- Sylgard 184 Silcone Elastomer kit - Base (Dow Corning)
- Sylgard 527 A Silicone Dielectric Gel (Dow Corning)
- Sylgard 527 B Silicone Dielectric Gel (Dow Corning)
- Solder NF Acid (70%) (Technic, Inc.)
- Solder NF TIN Concentrate (300/G/L) (Technic, Inc.)
- TECHNISTRIP_NF52-05 (Technic Inc.)
- Telfon (Dupont Fluoroproducts)
- tert-Butyl Methyl Ether (Sigma-Aldrich)
- Thermalbond 4951 A (Aavid Thermalloy, LLC)
- Thermalbond 4951 B (Aavid Thermalloy, LLC)
- Titanium Etchant TFT (Transene Company Inc.)
- Titanium Etchant TFTN (Transene Company Inc.)
- TMAH 25% - Tetramethylammonium Hydroxide (Moses Lake Industries, Inc.)
- TMCS-trimethylsilyl Chloride (Pierce Biotechnology)
- Toluene (BDH)
- Toluene (Sigma-Aldrich)
- Trichloroethylene (Fisher Scientific)
- Triethylchlorosilane (Alfa Aesar, A Johnson Matthey Co.)
- Triton X-100 (Science Lab)
- WiDE -15B (Brewer Scientific)
- WPR-1103K (JSR Micro Inc)
- XA-1 (Kanto Chemical Co., Inc)
- XA-2 (Kanto Chemical Co., Inc)
- Xp MicroSpray Positive Photoresist Spray (Micro Chem)
- XP MicroSpray SU-8 Photoresist Spray (Micro Chem)
- XR-1541-002 E-Beam Resist in MIBK Silicone Resin Solution (Dow Corning)
- XR-1541-006 E-Beam Resist in MIBK Silicone Resin Solution (Dow Corning)
- Xylene, for Histology and Cytology (EMD Chemicals)
- ZED-N50 (Zeon Chemicals)
- ZEP 520A (Zeon Chemicals)
- ZEP520A-7, ZEP520A (Nippon Zeon)
Solids
- 1,2-Di(4-pyridyl)ethylene (Sigma-Akdrich)
- 2-Benzyl-2-(dimethylamino)-4′-morpholinobutyrophenone (Sigma-Aldrich)
- Anode TIN Pure (Technic, Inc.)
- Alconox (Alconox)
- Aluminum Oxide, Powder and Pieces (Kurt J Lesker)
- Ammonium Biflouride Solution (J.T. Baker)
- Ammonium Persulfate (Sigma-Aldrich)
- Ammonium Persulfate, 98% (Acros Organics NV)
- Ammonium Persulfate, molecular biology grade (Research Organics)
- Anthracene (Sciencelab.com Inc.)
- AQM SIOX, Silicone E-beam photoresist (Applied Quantum Materials Inc.)
- AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials)
- Chloramine-T-trihydrate (Alfa Aesar, A Johnson Matthey Co.)
- Chromium Metal Pieces (Ted Pella, Inc.)
- Citric Acid monohydrate (Fisher)
- Dehydrated Victawet (SPI Supplies)
- Detergent powder-LabSolutions (Labconco Corp)
- Ferric Chloride, Hexahydrate GR (EMD Chemicals)
- FLUORESCEIN-Uranine powder 40% (AquaPhoenix,Inc.)
- Fomblin UT -18 Grease (Solvay Solexis, Inc.)
- Gallium 69 (FEI / Michigan Metals & Manufacturing, Inc)
- Gallium Metal (Arris International Corporation)
- HLD1 (Nonlinear Materials)
- HLD2 (Nonlinear Materials)
- KYNAR 740-PLT PVDF (Westlake Plastics Company)
- Mercury (II) Chloride (Sigma-Aldrich)
- Platinum precursor (Sigma-Aldrich)
- Polystyrene (Sigma-Aldrich)
- Polystyrene Latex Sphere (Ted Pella, Inc.)
- Potassium Iodide (Science Lab)
- RHODAMINE-6G (Fisher Scientific)
- Silicic Acid (Alfa Aesar, A Johnson Matthey Co.)
- Silicon Powder and Pieces (Kurt J Lesker)
- Sodium hypophosphite monohydrate (Sigma-Aldrich Inc.)
- Sodium sulfide nonahydrate (Sigma-Aldrich Inc.)
- Sodium Tetraborate, anhydrous (Alfa Aesar, A Johnson Matthey Co.)
- Sulfur Pieces (Alfa Aesar, A Johnson Matthey Co.)
- Xenon Difluoride (Pelchem Co., The Chemical Division of NECSA)
- Yittrium Silicate Garnet, Yttrium Oxyorthosilicate Monocrystal (Scientific Materials Corp.)