Safety Data Sheets (SDS)

Find the Safety Data Sheet (SDS) for any approved material in the KNI Lab below (you can also browse the KNI's SDS Box Directory).

• Requesting New Chemicals

Gases

• 1,1,1,2-Tetraflouroethane (Matheson Tri-Gas)
• Air Compressed (Air Liquide)
• Argon, compressed (Matheson Tri-Gas)
• Boron Trichloride (Matheson Tri-Gas)
• Carbon Dioxide, Gas (Matheson Tri-Gas)
• Chlorine (Matheson Tri-Gas)
• Ethylene (Matheson Tri-Gas)
• Flourine in Krypton, Xenon, Argon, Nelium, Neon and/or Nitrogen (Spectra Gases)
• Fluoroform (Matheson Tri-Gas)
• Halocarbon 14 (Matheson Tri-Gas)
• Helium (Matheson Tri-Gas)
• Hydrogen (Matheson Tri-Gas)
• Hydrogen Bromide (Matheson Tri-Gas)
• Hydrogen Bromide 33% in AceticAcid (Science Lab)
• Methane / Argon Mixture (Matheson Tri-Gas)
• Methane, Compressed Gas (Matheson Tri-Gas)
• Nitrogen Triflouride (Matheson Tri-Gas)
• Nitrogen, Compressed Gas (Matheson Tri-Gas)
• Nitrogen, Cryogenic Liquid (Matheson Tri-Gas)
• Nitrous Oxide (Matheson Tri-Gas)
• Octoflourocyclobutane (Matheson Tri-Gas)
• Oxygen in Nitrogen (Linde Gas North America)
• Oxygen, Compressed Gas (Matheson Tri-Gas)
• Silane (Matheson Tri-Gas)
• Silane 5% Argon Balance (Matheson Tri-Gas)]
• Silane 5% Helium Balance (Matheson Tri-Gas)
• Silane 5% Nitrogen Balance (Matheson Tri-Gas)
• Silicon Tetrachloride (Matheson Tri-Gas)
• Sulfur Hexafluoride (Matheson Tri-Gas)
• Tetrafluoromethane (Matheson Tri-Gas)
• Tetrafluoromethane (Specialty Gases of America)
• Trifluoromethane (Matheson Tri-Gas)

Liquids

• 1,2 - Dichlorobenzene (Aldrich Chemical Co. )
• 1,2 - Dichlorobenzene (Alfa Aesar, A Johnson Matthey Co.)
• 1,1,2 Trichloroethane (Sigma-Aldrich, Inc.)
• 2-Propanol (Alfa Aesar, A Johnson Matthey Co.)
• 2401 Developer (Rohm & Haas Electonic materials LLC)
• 4-Methyl-2-Pentanone, Omnisolve (EMD Chemicals)
• 495 PMMA Series Resist in Anisole (Micro-Chem)
• 495 PMMA Series Resist in Chlorobenezene (Micro-Chem)
• 5-Ethylidene-2-Norborne (Sigma-Aldrich)
• 500F Spin-on Glass (Filmtronics)
• 950 PMMA Series Resist in Anisole (Micro-Chem)
• 950 PMMA Series Resist in Chlorobenezene (Micro-Chem)
• Accuglass T-11 (Honeywell Electronic Materials)
• Acetic Acid Glacial (J.T. Baker)
• Acetone (Honeywell, Burdick & Jackson)
• Acetone (Mallinckrodt Baker)
• Acetone, HPLC (EMD Chemicals)
• Adhesion Promoter AP3000 (Dow Chemicals)
• AF Amorphous Flouropolymer Solutions (DuPont)
• Aluminum Etchant Type A (Transene Company Inc.)
• Ammonium Hydroxide, 25% NH₃ (Alfa Aesar, A Johnson Matthey Co.)
• Ammonium Hydroxide water solution (Fisher Scientific)
• Ammonium Persulfate (Sigma-Aldrich)
• Amyl Acetate (Mallinckrodt Baker)
• Anisole (Alfa Aesar, A Johnson Matthey Co.)
• AQM SiOx 1-10% in MIBK (Applied Quantum Materials Inc.)
• aquaSAVE-53za (Mitsubishi Rayon Co.,LTD)
• AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials)
• AZ 400K Developer (AZ Electronic Materials)
• AZ 726 MIF Developer (AZ Electronic Materials)
• AZ 5214-E Photoresist (AZ Electronic Materials)
• AZ 9260 Photoresist (520CPS) (EMD Performance Materials Corp)
• AZ NLOF 2020 Photoresist (AZ Electronic Materials)
• AZ P4330-RS Photoresist (AZ Electronic Materials)
• AZ P4620 Photoresist (AZ Electronic Materials)
• AZ P4903 Photoresist (Clariant Corporation)
• B-1200 Spin on Glass / BCB (Desert Silicon, L.L.C. )
• Bromine (Science Lab)
• Bromine Water (Fisher Scientific)
• Buffered HF Improved (Transene Company Inc.)
• Buffer HF, Siloxide Etchant (Transene Company Inc.)
• Buffered Oxide Etch (Mallinckrodt Baker)
• Buffered Oxide Etchant 6:1 (KMG Electronic Chemicals)
• CA-40 (Cyantek Corp)
• CC-300.40S developer (Cyantek Corp)
• Chlorobenzene (Alfa Aesar, A Johnson Matthey Co.)
• Chloroform (Mallinckrodt Baker)
• Chloroform, Omnisolve (EMD Chemicals)
• Chlorotrimethylsilane (Alfa Aesar, A Johnson Matthey Co.)
• Chromium Etchant (Sigma-Aldrich)
• Chromium Etchant CR-7S (Cyantek Corp)
• Citric Acid 1.0 Molar Solution (Aqua Solutions Inc.)
• Citric Acid 20% W/V (Fisher Scientific)
• Citric Acid Monohydrate (Fisher Scientific)
• Copper Etchant APS-100 (Transene Company Inc.)
• Copper Etchant CE-100, CE-200 (Transene Company Inc.)
• Cyclopentanone (Alfa Aesar, A Johnson Matthey Co.)
• Cylclotene 4022-35 (Dow Chemicals)
• Cylclotene 4024-40 (Dow Chemicals)
• Cytop CTL - 809 (Asahi Glass Co., LTD)
• Developer DS2100 (Dow Chemicals)
• Developer for Photoresist ma-D 525 (Micro Resist Technology)
• Dichloromethane (Alfa Aesar, A Johnson Matthey Co.)
• Dichloromethane, Omnisolv (EMD Chemicals)
• Dicyclopentadiene (Sigma-Aldrich)
• Di(trimethylolpropane) tetraacrylate (Sigma-Aldrich)
• Dow Corning High Vacuum Grease (Dow Chemicals)
• EBR PG-Positive Radiation Resist Edge Bead Remover (Micro-Chem)
• Elevate Gold 7990 Make Up (Technic, Inc.)
• Elevate Gold 7990 RTU (Technic, Inc.)
• Ethyl Acetate (Honeywell, Burdick & Jackson)
• Gelest OE 42 (Gelest, Inc)
• Gelest OE 43 (Gelest, Inc)
• GOLD (1) Trisodium Disulphite (Kojima Chemicals Co., LTD)
• Hexamethyldisilizane (Alfa Aesar, A Johnson Matthey Co.)
• Hexamethyldisilizane (Mallinckrodt Baker)
• Hydrobromic Acid 44-50% in Water (Fisher Scientific)
• Hydrochloric Acid (Columbus Chemical Industries, Inc)
• Hydrogen Bromide, 33% Solution in Acetic Acid (Science Lab)
• Hydrogen Peroxide, 30% (Fisher Scientific)
• Hydrogen Peroxide, 30% (Seastar Chemcals)
• Hysol 1C Varian Epoxy Adhesive (Fisher Scientific)
• Ink-N AQ (Henkel Corporation)
• Iodine (Science Lab)
• Isobutyl Alcohol (Mallinckrodt Baker)
• Isopropyl Alcohol (90%-100%) (Mallinckrodt Baker)
• JM 60000 Make Up (Technic, Inc)
• JM 6000 Secondary (Technic, Inc.)
• L 4798 / pH=4,01 (Si Analytics)
• L 4798 / pH=6,87 (Si Analytics)
• L 4798 / pH=9,18 (Si Analytics)
• Liquid Detergent (Labconco)
• Liquid Citric Acid, 50% (HydroChem Industrial Services)
• LOR A Series Resist (Micro-Chem)
• LOR B Series Resist (Micro-Chem)
• ma-D 525 Developer (MicroResist Technology GmbH)
• ma-N 2400 Negative Tone Photoresist (MicroResist Technology GmbH)
• MCC Primer 80/20 (Micro-Chem)
• Megaposit 26A Developer (Rohm & Haas Electonic materials LLC)
• Megaposit SPR 220 (0.7-7.0) Photo Resist (Shipley Company)
• Megaposit SPR 220-3.0 Positive Photoresist (Rohm & Haas Electonic materials LLC)
• Megaposit SPR 220-7.0 Positive Photoresist (Rohm & Haas Electonic materials LLC)
• Megaposit SPR 955CM-0.9 Positive Photoresist (Rohm and Haas Electronic Materials)
• Methanol (Honeywell)
• Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone) (Mallinckrodt Baker)
• Methylene Chlorine (Dichloromethane) (Burdick & Jackson Inc)
• Microposit 319 Developer (Rohm & Haas Electonic materials LLC)
• Microposit 322 Developer (Rohm & Haas Electonic materials LLC)
• Microposit CD 26 Developer (Rohm & Haas Electonic materials LLC)
• Microposit S1813 Photoresist (Shipley Company)
• Microposit S1818 Photoresist (Rohm & Haas Electronic materials LLC)
• MMA (8.5) MAA Copolymer Series Resist (Micro-Chem)
• N-Methylpyrrolidone (Honeywell, Burdick & Jackson)
• Nano-strip (Cyantek Corp)
• Nano-strip (KMG Electronic Chemicals)
• Negative Resist NR9-1000PY (Futurrex, Inc)
• Negative Resist NR9-3000PY (Futurrex, Inc)
• Negative Resist NR71-1000P (Futurrex, Inc)
• Negative resist NR71-3000P (Futurrex, Inc)
• Neutralizing Acid Rinse (Labconco)
• Nickel Etch TFB (Transene Company Inc.)
• Nitric Acid (Columbus Chemical)
• Nitrogen, Cryogenic Liquid (Matheson Tri-Gas)
• OmniCoat-Organic Polymer Solution (Micro-Chem)
• Overcoat-G IPA-DAA (Cambrios Technologies)
• Overcoat-P PGME TH (Cambrios Technologies)
• Pentaerythritol Tetraacrylate (Sigma-Aldrich)
• Pentaerythritol tetrakis(3-mercaptopropionate (Sigma-Aldrich)
• Phosphoric Acid (Columbus Chemical Industries, Inc)
• Phosphoric Acid (Sigma-Aldrich)
• PI-2562, Polyimide Coating (HD MicroSystems)
• PI-2611, Polyimide Precursor Coatings, Polyamic Acid (HD MicroSystems)
• PMGI SF Series Resists (MicroChem)
• Poly(ethylene glycol) Diacrylate (Sigma-Aldrich)
• Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (Sigma-Aldrich)
• Poly-L-lysine solution P8920 (Sigma-Aldrich)

• Potassium Hydroxide 20% (EMD Chemicals)
• Potassium Hydroxide (Fisher Scientific)
• Primary Stripper A (Dow Chemical)
• ProTEK B1-25 (Brewer Science)
• ProTEK B3 Primer (Brewer Science)
• ProTEK B3-25 (Brewer Science)
• ProTEK Primer (Brewer Science)
• ProTEK PSB Primer (Brewer Science)
• ProTEK PSB-23 (Brewer Science)
• ProTEK Remover 100 (Brewer Science)
• PRX-127 Plasma Etch Polymer Remover (Rohm & Haas Electronic materials LLC)
• Remover PG, Photoresist Remover (Micro-Chem)
• Resist Developer RD6 (Futurrex, Inc)
• Resist Remover RR5 (Futurrex, Inc)
• Resist Remover RR41 (Futurrex, Inc)
• Rinse T1100 (Dow Chemicals)
• Silicone Potting Compound (GE Silicones)
• Silquest A-174 (Momentive Performance Materials)
• Silquest A-174NT Silane (Momentive Performance Materials)
• SIPR-7126M-20 (Shin-Etsu Chemical Co., Ltd.)
• Sodium hydroxide solution (2 mol/l) (Millipore)
• SU-8 2000 Series Resists (MicroChem)
• SU-8 Developer (Micro-Chem)
• SU-8 Series Resists (MicroChem)
• Sulfuric Acid (Seastar Chemcals)
• SurPass 3000 (DisChem Inc)
• SurPass 4000 (DisChem Inc)
• Sylgard 184 Silcone Elastomer Curing Agent (Dow Corning)
• Sylgard 184 Silcone Elastomer kit - Base (Dow Corning)
• Sylgard 527 A Silicone Dielectric Gel (Dow Corning)
• Sylgard 527 B Silicone Dielectric Gel (Dow Corning)
• Solder NF Acid (70%) (Technic, Inc.)
• Solder NF TIN Concentrate (300/G/L) (Technic, Inc.)
• Telfon (Dupont Fluoroproducts)
• tert-Butyl Methyl Ether (Sigma-Aldrich)
• Thermalbond 4951 A (Aavid Thermalloy, LLC)
• Thermalbond 4951 B (Aavid Thermalloy, LLC)
• Titanium Etchant TFT (Transene Company Inc.)
• Titanium Etchant TFTN (Transene Company Inc.)
• TMAH 25% - Tetramethylammonium Hydroxide (Moses Lake Industries, Inc.)
• TMCS-trimethylsilyl Chloride (Pierce Biotechnology)
• Toluene (BDH)
• Toluene (Sigma-Aldrich)
• Trichloroethylene (Fisher Scientific)
• Triethylchlorosilane (Alfa Aesar, A Johnson Matthey Co.)
• Triton X-100 (Science Lab)
• WiDE -15B (Brewer Scientific)
• WPR-1103K (JSR Micro Inc)
• XA-1 (Kanto Chemical Co., Inc)
• XA-2 (Kanto Chemical Co., Inc)
• Xp MicroSpray Positive Photoresist Spray (Micro Chem)
• XP MicroSpray SU-8 Photoresist Spray (Micro Chem)
• XR-1541-002 E-Beam Resist in MIBK Silicone Resin Solution (Dow Corning)
• XR-1541-006 E-Beam Resist in MIBK Silicone Resin Solution (Dow Corning)
• Xylene, for Histology and Cytology (EMD Chemicals)
• ZED-N50 (Zeon Chemicals)
• ZEP 520A (Zeon Chemicals)
• ZEP520A-7, ZEP520A (Nippon Zeon)

Solids

• 1,2-Di(4-pyridyl)ethylene (Sigma-Akdrich)
• 2-Benzyl-2-(dimethylamino)-4′-morpholinobutyrophenone (Sigma-Aldrich)
• Anode TIN Pure (Technic, Inc.)
• Alconox (Alconox)
• Aluminum Oxide, Powder and Pieces (Kurt J Lesker)
• Ammonium Biflouride Solution (J.T. Baker)
• Ammonium Persulfate, 98% (Acros Organics NV)
• Ammonium Persulfate, molecular biology grade (Research Organics)
• AQM SIOX, Silicone E-beam photoresist (Applied Quantum Materials Inc.)
• AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials)
• Chloramine-T-trihydrate (Alfa Aesar, A Johnson Matthey Co.)
• Chromium Metal Pieces (Ted Pella, Inc.)
• Citric Acid monohydrate (Fisher)
• Dehydrated Victawet (SPI Supplies)
• Detergent powder-LabSolutions (Labconco Corp)
• Ferric Chloride, Hexahydrate GR (EMD Chemicals)
• FLUORESCEIN-Uranine powder 40% (AquaPhoenix,Inc.)
• Fomblin UT -18 Grease (Solvay Solexis, Inc.)
• Gallium 69 (FEI / Michigan Metals & Manufacturing, Inc)
• Gallium Metal (Arris International Corporation)
• HLD1 (Nonlinear Materials)
• HLD2 (Nonlinear Materials)
• KYNAR 740-PLT PVDF (Westlake Plastics Company)
• Mercury (II) Chloride (Sigma-Aldrich)
• Polystyrene (Sigma-Aldrich)
• Polystyrene Latex Sphere (Ted Pella, Inc.)
• Potassium Iodide (Science Lab)
• RHODAMINE-6G (Fisher Scientific)
• Silicic Acid (Alfa Aesar, A Johnson Matthey Co.)
• Silicon Powder and Pieces (Kurt J Lesker)
• Sodium hypophosphite monohydrate (Sigma-Aldrich Inc.)
• Sodium sulfide nonahydrate (Sigma-Aldrich Inc.)
• Sodium Tetraborate, anhydrous (Alfa Aesar, A Johnson Matthey Co.)
• Sulfur Pieces (Alfa Aesar, A Johnson Matthey Co.)
• Xenon Difluoride (Pelchem Co., The Chemical Division of NECSA)
• Yittrium Silicate Garnet, Yttrium Oxyorthosilicate Monocrystal (Scientific Materials Corp.)