Usage Rates: Difference between revisions

From the KNI Lab at Caltech
Jump to navigation Jump to search
No edit summary
Line 9: Line 9:
{| class="wikitable" style="width: 75%;"
{| class="wikitable" style="width: 75%;"
|-
|-
!scope="col" style="text-align:left; width: 34%"| Name
!scope="col" style="text-align:left; width: 30%"| Name
!scope="col" style="text-align:center; width: 22%"| Caltech Rate
!scope="col" style="text-align:center; width: 20%"| Category
!scope="col" style="text-align:center; width: 22%"| JPL/Non-Caltech Acad/Govt Rate
!scope="col" style="text-align:center; width: 15%"| Caltech Rate
!scope="col" style="text-align:center; width: 22%" | Corporate Rate**
!scope="col" style="text-align:center; width: 20%"| JPL/Non-Caltech Acad/Govt Rate
!scope="col" style="text-align:center; width: 15%" | Corporate Rate**
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = EBPG 5000+
|EquipmentName = Electron Beam Pattern Generators (100kV)
|EquipmentCategory = Lithography
|CaltechRate = 62.00
|CaltechRate = 62.00
|JPLNonCaltechAcadGovtRate = 101.99
|JPLNonCaltechAcadGovtRate = 101.99
|CorporateRate = 152.99
|CorporateRate = 152.99
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = EBPG 5200
|EquipmentName = Two-Photon Lithography ("Microscale 3D Printing")
|CaltechRate = 62.00
|EquipmentCategory = Lithography
|JPLNonCaltechAcadGovtRate = 101.99
|CaltechRate = 8.00
|CorporateRate = 152.99
|JPLNonCaltechAcadGovtRate = 13.16
|CorporateRate = 19.74
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = ORION NanoFab
|EquipmentName = Direct-Write Laser System (DWL-66)
|CaltechRate = 65.00
|EquipmentCategory = Lithography
|JPLNonCaltechAcadGovtRate = 106.93
|CaltechRate = 47.00
|CorporateRate = 160.39
|JPLNonCaltechAcadGovtRate = 77.32
|CorporateRate = 115.97
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Nova 200 Dual Beam
|EquipmentName = Contact Mask Aligners
|CaltechRate = 65.00
|EquipmentCategory = Lithography
|JPLNonCaltechAcadGovtRate = 106.93
|CaltechRate = 36.00
|CorporateRate = 160.39
|JPLNonCaltechAcadGovtRate = 59.22
|CorporateRate = 88.83
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Nova 600 Dual Beam
|EquipmentName = He/Ne/Ga-FIB w/ Multibeam Pattern Generator
|EquipmentCategory = Lithography/Microscopy
|CaltechRate = 65.00
|CaltechRate = 65.00
|JPLNonCaltechAcadGovtRate = 106.93
|JPLNonCaltechAcadGovtRate = 106.93
Line 44: Line 51:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Sirion FESEM
|EquipmentName = SEM Nanometer Pattern Generation System (Quanta)
|EquipmentCategory = Lithography/Microscopy
|CaltechRate = 39.00
|CaltechRate = 39.00
|JPLNonCaltechAcadGovtRate = 64.16
|JPLNonCaltechAcadGovtRate = 64.16
Line 50: Line 58:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Quanta ESEM
|EquipmentName = Etcher: III/V Material, Metal & Silicon
|CaltechRate = 39.00
|EquipmentCategory = Etching
|JPLNonCaltechAcadGovtRate = 64.16
|CaltechRate = 50.00
|CorporateRate = 96.23
|JPLNonCaltechAcadGovtRate = 82.25
|CorporateRate = 123.38
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = AFM
|EquipmentName = Etcher: Silicon (DRIE)
|CaltechRate = 41.00
|EquipmentCategory = Etching
|JPLNonCaltechAcadGovtRate = 67.45
|CaltechRate = 50.00
|CorporateRate = 101.17
|JPLNonCaltechAcadGovtRate = 82.25
|CorporateRate = 123.38
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = III-V/Metal Etcher
|EquipmentName = Etcher: Dielectric Material ("380")
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
|JPLNonCaltechAcadGovtRate = 82.25
|JPLNonCaltechAcadGovtRate = 82.25
Line 68: Line 79:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = DRIE Silicon Etcher
|EquipmentName = Etcher: Silicon, III/V Material & Organics (RIE)
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
|JPLNonCaltechAcadGovtRate = 82.25
|JPLNonCaltechAcadGovtRate = 82.25
Line 74: Line 86:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = "380" Dielectric Material Etcher  
|EquipmentName = XeF<sub>2</sub> Etcher
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
|JPLNonCaltechAcadGovtRate = 82.25
|JPLNonCaltechAcadGovtRate = 82.25
Line 80: Line 93:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = PECVD
|EquipmentName = Plasma-Enhanced Chemical Vapor Deposition
|EquipmentCategory = Deposition
|CaltechRate = 67.00
|CaltechRate = 67.00
|JPLNonCaltechAcadGovtRate = 110.22
|JPLNonCaltechAcadGovtRate = 110.22
Line 86: Line 100:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = ALD
|EquipmentName = Atomic Layer Deposition
|EquipmentCategory = Deposition
|CaltechRate = 67.00
|CaltechRate = 67.00
|JPLNonCaltechAcadGovtRate = 110.22
|JPLNonCaltechAcadGovtRate = 110.22
Line 92: Line 107:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Plasmatherm RIE
|EquipmentName = E-beam Evaporator: Metals and Oxides  (CHA)
|CaltechRate = 50.00
|EquipmentCategory = Deposition
|JPLNonCaltechAcadGovtRate = 82.25
|CorporateRate = 123.38
}}
{{UsageRateTableItem|
|EquipmentName = XeF<sub>2</sub> Etcher
|CaltechRate = 50.00
|JPLNonCaltechAcadGovtRate = 82.25
|CorporateRate = 123.38
}}
{{UsageRateTableItem|
|EquipmentName = CHA E-beam Evaporator
|CaltechRate = 24.00
|CaltechRate = 24.00
|JPLNonCaltechAcadGovtRate = 39.48
|JPLNonCaltechAcadGovtRate = 39.48
Line 110: Line 114:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Lesker Labline E-beam Evaporator
|EquipmentName = E-beam Evaporator: Metals Al, Au, Pt & Ti (Lesker Labline)
|EquipmentCategory = Deposition
|CaltechRate = 24.00
|CaltechRate = 24.00
|JPLNonCaltechAcadGovtRate = 39.48
|JPLNonCaltechAcadGovtRate = 39.48
Line 117: Line 122:
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Chalcogenide Sputter
|EquipmentName = Chalcogenide Sputter
|EquipmentCategory = Deposition
|CaltechRate = 70.00
|CaltechRate = 70.00
|JPLNonCaltechAcadGovtRate = 115.15
|JPLNonCaltechAcadGovtRate = 115.15
Line 123: Line 129:
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Dielectric Sputter
|EquipmentName = Dielectric Sputter
|EquipmentCategory = Deposition
|CaltechRate = 37.00
|CaltechRate = 37.00
|JPLNonCaltechAcadGovtRate = 60.87
|JPLNonCaltechAcadGovtRate = 60.87
Line 128: Line 135:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Nanoscribe PPGT
|EquipmentName = SEM, EDS & WDS (Nova 200)
|CaltechRate = 8.00
|EquipmentCategory = Microscopy
|JPLNonCaltechAcadGovtRate = 13.16
|CaltechRate = 65.00
|CorporateRate = 19.74
|JPLNonCaltechAcadGovtRate = 106.93
|CorporateRate = 160.39
}}
{{UsageRateTableItem|
|EquipmentName = SEM, Ga-FIB, GIS & Omniprobe (Nova 600)
|EquipmentCategory = Microscopy
|CaltechRate = 65.00
|JPLNonCaltechAcadGovtRate = 106.93
|CorporateRate = 160.39
}}
{{UsageRateTableItem|
|EquipmentName = SEM & EDS (Sirion)
|EquipmentCategory = Microscopy
|CaltechRate = 39.00
|JPLNonCaltechAcadGovtRate = 64.16
|CorporateRate = 96.23
}}
{{UsageRateTableItem|
|EquipmentName = Atomic Force Microscope
|EquipmentCategory = Microscopy
|CaltechRate = 41.00
|JPLNonCaltechAcadGovtRate = 67.45
|CorporateRate = 101.17
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Direct-Write Laser System DWL-66
|EquipmentName = TEM, STEM, EDS & HAADF: TF-30 (80-300 kV)
|CaltechRate = 47.00
|EquipmentCategory = Microscopy
|JPLNonCaltechAcadGovtRate = 77.32
|CaltechRate = 97.00
|CorporateRate = 115.97
|JPLNonCaltechAcadGovtRate = 159.57
|CorporateRate = 239.35
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Tousimis Critical Point Dryer
|EquipmentName = Critical Point Dryer
|EquipmentCategory = Support Tools
|CaltechRate = 54.00
|CaltechRate = 54.00
|JPLNonCaltechAcadGovtRate = 88.83
|JPLNonCaltechAcadGovtRate = 88.83
|CorporateRate = 133.25
|CorporateRate = 133.25
}}
{{UsageRateTableItem|
|EquipmentName = Suss Mask Aligners
|CaltechRate = 36.00
|JPLNonCaltechAcadGovtRate = 59.22
|CorporateRate = 88.83
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Tube Furnaces
|EquipmentName = Tube Furnaces
|EquipmentCategory = Support Tools
|CaltechRate = 5.00
|CaltechRate = 5.00
|JPLNonCaltechAcadGovtRate = 8.23
|JPLNonCaltechAcadGovtRate = 8.23
|CorporateRate = 12.34
|CorporateRate = 12.34
}}
{{UsageRateTableItem|
|EquipmentName = TF-30 UT TEM
|CaltechRate = 97.00
|JPLNonCaltechAcadGovtRate = 159.57
|CorporateRate = 239.35
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Monthly Base Rate*
|EquipmentName = Monthly Base Rate*
|EquipmentCategory = General Equipment*
|CaltechRate = 655.00
|CaltechRate = 655.00
|JPLNonCaltechAcadGovtRate = 1,077.48
|JPLNonCaltechAcadGovtRate = 1,077.48
Line 174: Line 195:
The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:
The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:


Profilometers, Chemical Wet Benches, Dynatex GST-150 Scriber Breaker, Tecnai TF20 TEM, GCA 6300 Stepper, Rapid Thermal Processor, Paratech Parylene Coater, Suss SB6L Wafer Bonder, Westbond Wire Bonder, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (gowning, chemicals, equipment reservation software, etc.).
Profilometers, Chemical Wet Benches, Dynatex GST-150 Scriber Breaker, J.A. Woolam Spectroscopic Ellipsometer M-2000, TF20 TEM, GCA 6300 Stepper, Rapid Thermal Processor, Paratech Parylene Coater, Suss SB6L Wafer Bonder, Westbond Wire Bonder, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (gowning, chemicals, equipment reservation software, etc.).


==**Corporate Memberships==
==**Corporate Memberships==


For full information on the KNI's corporate membership plan, please send an email to tkimoto@caltech.edu with details regarding: the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.
For full information on the KNI's corporate membership plan, please send an email to tkimoto@caltech.edu with details regarding: the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.

Revision as of 02:15, 30 April 2019

The rates below are valid beginning October 2018 and are subject to change.

NOTE:

  • Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members are inclusive of FY19 Caltech F&A ("overhead") fees.
  • Individual Tools listed below are charged by the hour or portion thereof.
  • Precious Metal Usage (e.g. gold, platinum) is billed by the gram or portion thereof. The market prices per gram are passed on to users and do not include Caltech overhead.

Equipment Rates

Name Category Caltech Rate JPL/Non-Caltech Acad/Govt Rate Corporate Rate**
Electron Beam Pattern Generators (100kV)
 Lithography
 $62.00
 $101.99
 $152.99
Two-Photon Lithography ("Microscale 3D Printing")
 Lithography
 $8.00
 $13.16
 $19.74
Direct-Write Laser System (DWL-66)
 Lithography
 $47.00
 $77.32
 $115.97
Contact Mask Aligners
 Lithography
 $36.00
 $59.22
 $88.83
He/Ne/Ga-FIB w/ Multibeam Pattern Generator
 Lithography/Microscopy
 $65.00
 $106.93
 $160.39
SEM Nanometer Pattern Generation System (Quanta)
 Lithography/Microscopy
 $39.00
 $64.16
 $96.23
Etcher: III/V Material, Metal & Silicon
 Etching
 $50.00
 $82.25
 $123.38
Etcher: Silicon (DRIE)
 Etching
 $50.00
 $82.25
 $123.38
Etcher: Dielectric Material ("380")
 Etching
 $50.00
 $82.25
 $123.38
Etcher: Silicon, III/V Material & Organics (RIE)
 Etching
 $50.00
 $82.25
 $123.38
XeF2 Etcher
 Etching
 $50.00
 $82.25
 $123.38
Plasma-Enhanced Chemical Vapor Deposition
 Deposition
 $67.00
 $110.22
 $165.32
Atomic Layer Deposition
 Deposition
 $67.00
 $110.22
 $165.32
E-beam Evaporator: Metals and Oxides (CHA)
 Deposition
 $24.00
 $39.48
 $59.22
E-beam Evaporator: Metals Al, Au, Pt & Ti (Lesker Labline)
 Deposition
 $24.00
 $39.48
 $59.22
Chalcogenide Sputter
 Deposition
 $70.00
 $115.15
 $172.73
Dielectric Sputter
 Deposition
 $37.00
 $60.87
 $91.30
SEM, EDS & WDS (Nova 200)
 Microscopy
 $65.00
 $106.93
 $160.39
SEM, Ga-FIB, GIS & Omniprobe (Nova 600)
 Microscopy
 $65.00
 $106.93
 $160.39
SEM & EDS (Sirion)
 Microscopy
 $39.00
 $64.16
 $96.23
Atomic Force Microscope
 Microscopy
 $41.00
 $67.45
 $101.17
TEM, STEM, EDS & HAADF: TF-30 (80-300 kV)
 Microscopy
 $97.00
 $159.57
 $239.35
Critical Point Dryer
 Support Tools
 $54.00
 $88.83
 $133.25
Tube Furnaces
 Support Tools
 $5.00
 $8.23
 $12.34
Monthly Base Rate*
 General Equipment*
 $655.00
 $1,077.48
 $1,616.21

*Monthly Base Rate

The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:

Profilometers, Chemical Wet Benches, Dynatex GST-150 Scriber Breaker, J.A. Woolam Spectroscopic Ellipsometer M-2000, TF20 TEM, GCA 6300 Stepper, Rapid Thermal Processor, Paratech Parylene Coater, Suss SB6L Wafer Bonder, Westbond Wire Bonder, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (gowning, chemicals, equipment reservation software, etc.).

**Corporate Memberships

For full information on the KNI's corporate membership plan, please send an email to tkimoto@caltech.edu with details regarding: the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.

Retrieved from "https://lab.kni.caltech.edu/index.php?title=Usage_Rates&oldid=971"