Full Service Rates: Difference between revisions
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'''''Note:''' The prices shown here include Caltech's indirect cost rate.'' | '''''Note:''' The prices shown here include Caltech's indirect cost rate.'' | ||
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Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work. | Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work. | ||
Revision as of 22:30, 21 April 2026
The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. KNI offers no guarantees for the end product.
Note: Internal customers (Caltech/JPL) interested in full-service work: review the details here.
Why KNI?
- Full process flows: resist coating through etch/deposition to final device, under one roof
- Experienced staff: fill-time expert engineers managing tools daily
- Caltech ecosystem: proximity to world-class research in photonics, quantum, and materials
- IP-secure: NDA option to protect ownership and inventorship rights
Application Areas
- Quantum devices — superconducting qubits, ion trap electrodes, single-photon sources
- Photonic integrated circuits — waveguides, grating couplers, ring resonators, metasurfaces
- AR/VR optics — diffractive waveguide masters, surface-relief gratings, metalenses
- RF & III-V devices — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
- Sensors & MEMS — IR detectors, nanoelectromechanical systems, biomedical devices
- Mask fabrication — photomask writing for optical lithography step-and-repeat
Cost
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
| Resource | Hourly Rate (excluding admin fee) |
| Technical Staff Effort | $ 200.00 |
| EBPG 5000+ or 5200 | $ 442.00 |
| Nova 600 FIB | $ 255.00 |
| III-V Cobra ALE Etcher | $ 204.00 |
| PlasmaPro PECVD (oxide, nitride) | $ 204.00 |
| FlexAL II ALD/ALE | $ 170.00 |
| Legacy PlasmaLab PECVD (silicon) | $ 136.00 |
| Legacy Oxford Etchers (DRIE, III-V, Dielectric) | $ 136.00 |
| Nanoscribe PPGT (2D/3D print) | $ 17.00 |
| Administrative Fee (per transaction) | $ 340.00 |
Note: The prices shown here include Caltech's indirect cost rate.
To Get Started
Send an email with your project description and timeline needs to kni@caltech.edu. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.