Usage Rates: Difference between revisions

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* Caltech/JPL/Academic or Government lab members are '''NOT''' charged any Lab fees during calendar months of non-use
* Caltech/JPL/Academic or Government lab members are '''NOT''' charged any Lab fees during calendar months of non-use


== Caltech Academic Usage Rates ==
== Caltech & JPL Usage Rates ==
Below is a table of hourly rates for the equipment in the KNI Laboratory. Caltech/JPL users receive a quarterly fee cap for use of the cleanroom equipment in the KNI Lab. '''*NOTE:The maximum direct lab costs for cleanroom equipment that an individual Caltech/JPL user will be charged, per billing quarter, is $6,500.'''
Below is a table of hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Discounted hourly rates are "unlocked" for hours that exceed the thresholds listed below. Tier C indicates the maxiumum number of hours a user will be charged in a given calendar month. Rates shown below do not include F&A/overhead. Overhead will be applied separately based on the PTA. Customers will be invoiced on a quarterly basis. Rates are valid beginning October 1, 2022 and are subject to change upon review at the end of FY23 Q2.
Rates below apply to internal Caltech or JPL users.


{| class="wikitable" style="width: 75%;"
{| class="wikitable" style="width: 75%;"
Line 14: Line 15:
!scope="col" style="text-align:center; width: 15%" | Hourly Rate
!scope="col" style="text-align:center; width: 15%" | Hourly Rate
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Cleanroom Hourly Rate
!scope="col" style="text-align:left; background-color:#ffd8b4;"| General Lab
!scope="col" style="text-align:center; background-color:#ffe7d1;" | General KNI Cleanroom Use
!scope="col" style="text-align:center; background-color:#ffe7d1;" | General KNI Lab Use*
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $28
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $37.50
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA Orion UHV Chalcogenide Sputter System
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Raith EBPG 5000+ Electron Beam Writer
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Electron Beam Lithography (EBL)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $120
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA Orion UHV Dielectric Sputter System
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Raith EBPG 5000+ Electron Beam Writer
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Electron Beam Lithography (EBL)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $120
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| CHA MK40 E-Beam Evaporator
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Lesker Labline E-Beam Evaporator
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Evaporation, Sputtering
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Bruker Dimension ICON AFM
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Nova 200 NanoLab Dualbeam FIB/SEM
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Nova 600 Dualbeam Focused Ion Beam
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Quanta ESEM /NPGS
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Sirion FESEM
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Tecnai TF-30 TEM, STEM, EDS & HAADF
!scope="col" style="text-align:center; background-color:#fec38d;" | Microscopy *Not Capped*
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $90
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Zeiss Orion NanoFab
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $79
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford Dielectric System 100 ICP/RIE
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford Dielectric System 100 ICP/RIE
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Etch, Reactive Ion (RIE)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $45
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford DRIE System 100 ICP/RIE
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford DRIE System 100 ICP/RIE
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Etch, Reactive Ion (RIE)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $45
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford FlexAl ALD System
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford III-V System 100 ICP/RIE
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford III-V System 100 ICP/RIE
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Etch, Reactive Ion (RIE)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $45
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford PECVD System 100
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Plasmatherm Reactive Ion Etch
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Plasmatherm Reactive Ion Etch
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Etch, Reactive Ion (RIE)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $45
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| XeF2 silicon etcher
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford FlexAl ALD/ALE System
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Etch
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Chemical Vapor
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $89
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $60
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Raith EBPG 5000+ Electron Beam Writer
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Oxford PECVD System 100
!scope="col" style="text-align:center; background-color:#fec38d;" | Electron Beam Lithography *Not Capped*
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Chemical Vapor
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $115
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $60
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Raith EBPG 5200 Electron Beam Writer
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA Chalcogenide Sputterer
!scope="col" style="text-align:center; background-color:#fec38d;" | Electron Beam Lithography *Not Capped*
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Physical
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $115
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $30
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| GCA 6300 DSW Stepper
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA Dielectric Sputterer
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Physical
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $30
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Heidelberg DWL-66
!scope="col" style="text-align:left; background-color:#ffd8b4;"| AJA E-beam Evaporator (estim. Dec arrival)
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Physical
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $30
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| NILT CNI-PV 2.1 Nanoimprint
!scope="col" style="text-align:left; background-color:#ffd8b4;"| CHA MK40 E-Beam Evaporator
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Physical
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $30
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Nanoscribe Photonic Professional GT
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Lesker Labline E-Beam Evaporator
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Deposition, Physical
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $30
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Suss Microtech MA6 Aligner
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Nova 600 Dualbeam Focused Ion Beam
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $70
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Suss Microtech MA6/BA6 Aligner
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Zeiss Orion NanoFab
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Optical Lithography
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $62
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $70
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Dynatex GST-150 Scriber/Breaker
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Nova 200 NanoLab Dualbeam FIB/SEM
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy, Scanning Electron (SEM)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $35
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Para Tech LabTop 3000 Parylene Coater
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Quanta ESEM /NPGS
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy, Scanning Electron (SEM)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $35
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Suss SB6L Wafer Bonder
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Sirion FESEM
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy, Scanning Electron (SEM)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $35
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Tousimis Critical Point Dryer
!scope="col" style="text-align:left; background-color:#ffd8b4;"| FEI Tecnai TF-30 TEM, STEM, EDS & HAADF
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Microscopy, Transmission Electron (TEM)
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $130
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Tystar Tytan Dry Oxide + annealing
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Nanoscribe Photonic Professional GT
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#ffe7d1;" | 2D/3D Print
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $15
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Tystar Tytan Wet + Dry Oxide + annealing
!scope="col" style="text-align:left; background-color:#ffd8b4;"| 3D Printer (TBA)
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#ffe7d1;" | 2D/3D Print
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $15
|}
 
'''General Lab Use includes the use of: Atomic Force Microscope (AFM), Critical Point Dryer, Laser Interference Lithography
System, Mask Aligners, Parylene Coater, Profilometer, Scriber/Breaker, Spectroscopic Ellipsometer, TEM prep area (in Keck), Tube Furnaces (Wet, Dry Oxide + Annealing), Wafer Bonder, Wafer Stepper, Wet Chemistry Room/general chemical supplies, Wire Bonder, and XeF2 Silicon Etcher, as well as other tools not listed in the Lab Areas above.'''
 
'''Miscellaneous Rates'''
*Precious Metal (gold and platinum) usage will be billed the market rate, per gram.
*Dedicated KNI Staff Labor/Support for Research is $100/hr.
 
'''MONTHLY TIERED RATES'''
{| class="wikitable" style="width: 90%;"
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Westbond 7476D Wire Bonder
!scope="col" style="text-align:left; width: 28%"| Lab Area
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; width: 12%"| Tier A
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; width: 12%" | Tier A Hourly Rate
!scope="col" style="text-align:center; width: 12%"| Tier B
!scope="col" style="text-align:center; width: 12%" | Tier B Hourly Rate
!scope="col" style="text-align:center; width: 12%"| Tier C
!scope="col" style="text-align:center; width: 12%" | Tier C Hourly Rate
|-
|-
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Woolam M-2000 Spectroscopic Ellipsometer
!scope="col" style="text-align:left; background-color:#ffd8b4;"| Electron Beam Lithography (EBL)
!scope="col" style="text-align:center; background-color:#ffe7d1;" | Support & Misc Tools
!scope="col" style="text-align:center; background-color:#FFFFFF;"| Up to 24 hours
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $44
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $120
!scope="col" style="text-align:center; background-color:#FFFFFF;"| 24-48 hours
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $60
!scope="col" style="text-align:center; background-color:#FFFFFF;"| Over 48 hours
!scope="col" style="text-align:center; background-color:#FFFFFF;"| $0
|-
|-
|}




'''FEE CAP EXCEPTIONS'''
*EBPG 5000+ and 5200 systems are not included in the quarterly academic/government rate cap. Actual hours will be billed.
*TF-30 STEM in Keck Building: Lab members who '''only''' use the TF-30 are exempt from paying the General Cleanroom hourly rate. TF-30 use is not included in the quarterly academic/government rate cap. Actual hours will be billed.
*Precious Metal (gold and platinum) usage will be billed the market rate, per gram.
*Dedicated KNI Staff Labor/Support for Research is $100/hr.


'''OVERHEAD FEE/INDIRECT COST'''  
'''OVERHEAD FEE/INDIRECT COST'''  
*Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members will be subject to Caltech's F&A (indirect/"overhead") costs. The F&A rate for fiscal year 2022 is 68.4%
*Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members will be subject to Caltech's F&A (indirect/"overhead") costs. The F&A rate for fiscal year 2023 is 70%


==Corporate Memberships==
==Corporate Memberships==


For information on the KNI corporate lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.
For information on the KNI corporate lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

Revision as of 23:24, 25 October 2022

Overview of KNI Lab User Fees
Note: Rates below are valid beginning October 1, 2021 and are subject to change

  • Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof)
  • Caltech/JPL/Academic or Government lab members are NOT charged any Lab fees during calendar months of non-use

Caltech & JPL Usage Rates

Below is a table of hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Discounted hourly rates are "unlocked" for hours that exceed the thresholds listed below. Tier C indicates the maxiumum number of hours a user will be charged in a given calendar month. Rates shown below do not include F&A/overhead. Overhead will be applied separately based on the PTA. Customers will be invoiced on a quarterly basis. Rates are valid beginning October 1, 2022 and are subject to change upon review at the end of FY23 Q2. Rates below apply to internal Caltech or JPL users.

Equipment Name Lab Area Hourly Rate
General Lab General KNI Lab Use* $37.50
Raith EBPG 5000+ Electron Beam Writer Electron Beam Lithography (EBL) $120
Raith EBPG 5000+ Electron Beam Writer Electron Beam Lithography (EBL) $120
Oxford Dielectric System 100 ICP/RIE Etch, Reactive Ion (RIE) $45
Oxford DRIE System 100 ICP/RIE Etch, Reactive Ion (RIE) $45
Oxford III-V System 100 ICP/RIE Etch, Reactive Ion (RIE) $45
Plasmatherm Reactive Ion Etch Etch, Reactive Ion (RIE) $45
Oxford FlexAl ALD/ALE System Deposition, Chemical Vapor $60
Oxford PECVD System 100 Deposition, Chemical Vapor $60
AJA Chalcogenide Sputterer Deposition, Physical $30
AJA Dielectric Sputterer Deposition, Physical $30
AJA E-beam Evaporator (estim. Dec arrival) Deposition, Physical $30
CHA MK40 E-Beam Evaporator Deposition, Physical $30
Lesker Labline E-Beam Evaporator Deposition, Physical $30
FEI Nova 600 Dualbeam Focused Ion Beam Microscopy, Focused Ion Beam (FIB) $70
Zeiss Orion NanoFab Microscopy, Focused Ion Beam (FIB) $70
FEI Nova 200 NanoLab Dualbeam FIB/SEM Microscopy, Scanning Electron (SEM) $35
FEI Quanta ESEM /NPGS Microscopy, Scanning Electron (SEM) $35
FEI Sirion FESEM Microscopy, Scanning Electron (SEM) $35
FEI Tecnai TF-30 TEM, STEM, EDS & HAADF Microscopy, Transmission Electron (TEM) $130
Nanoscribe Photonic Professional GT 2D/3D Print $15
3D Printer (TBA) 2D/3D Print $15

General Lab Use includes the use of: Atomic Force Microscope (AFM), Critical Point Dryer, Laser Interference Lithography System, Mask Aligners, Parylene Coater, Profilometer, Scriber/Breaker, Spectroscopic Ellipsometer, TEM prep area (in Keck), Tube Furnaces (Wet, Dry Oxide + Annealing), Wafer Bonder, Wafer Stepper, Wet Chemistry Room/general chemical supplies, Wire Bonder, and XeF2 Silicon Etcher, as well as other tools not listed in the Lab Areas above.

Miscellaneous Rates

  • Precious Metal (gold and platinum) usage will be billed the market rate, per gram.
  • Dedicated KNI Staff Labor/Support for Research is $100/hr.

MONTHLY TIERED RATES

OVERHEAD FEE/INDIRECT COST
  • Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members will be subject to Caltech's F&A (indirect/"overhead") costs. The F&A rate for fiscal year 2023 is 70%

Corporate Memberships

For information on the KNI corporate lab membership plan, please send an email to tkimoto@caltech.edu with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

Lab Area Tier A Tier A Hourly Rate Tier B Tier B Hourly Rate Tier C Tier C Hourly Rate
Electron Beam Lithography (EBL) Up to 24 hours $120 24-48 hours $60 Over 48 hours $0