Wet Chemistry Resources: Difference between revisions
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*'''Acetone, Methanol, IPA''' | *'''Acetone, Methanol, IPA''' | ||
*'''Acetone, Methanol, IPA, DI Water''' | *'''Acetone, Methanol, IPA, DI Water''' | ||
*'''Remover PG (60°C), IPA''' | *'''Remover PG (60°C), IPA''' -Caution, low flashpoint, do not leave unattended | ||
**Nano Remover PG Spec Sheet | **Nano Remover PG Spec Sheet | ||
**[https://static1.squarespace.com/static/57b26cc76b8f5b7524bf9ed2/t/57f9725d725e25a7b5dd12fe/1475965533625/Remover-PG-Process.pdf Columbia University Remover PG Process] | **[https://static1.squarespace.com/static/57b26cc76b8f5b7524bf9ed2/t/57f9725d725e25a7b5dd12fe/1475965533625/Remover-PG-Process.pdf Columbia University Remover PG Process] | ||
Revision as of 04:43, 2 November 2019
Sample Cleaning Resources
Solvent Cleans
- Acetone, IPA -Acetone serves as a solvent for organics, IPA cleans remaining residues due to acetone's high evaporation rate
- Acetone, Methanol -Similar to above except Methanol is more toxic, and a polar molecule versus IPA which is non-polar
- Acetone, Methanol, IPA
- Acetone, Methanol, IPA, DI Water
- Remover PG (60°C), IPA -Caution, low flashpoint, do not leave unattended
- Nano Remover PG Spec Sheet
- Columbia University Remover PG Process
- Dichloromethane, IPA -Caution, high evaporation rate may leave residue and beakers quickly condense water/ice
- Nanostrip (60°C) -Rinse with DI
Etching Cleans
RCA-1
Recipe steps or links
https://en.wikipedia.org/wiki/RCA_clean
Piranha Etch
HF Dip
Plasma Cleans
Wet Etching Resources
Research Papers and Books
External Laboratories
also find alternative:
Commercial Materials
KNI Wet Etch Recipes Table
Table of Wet Etch recipes from KNI Papers
And general table from you, not from papers, maybe from recipes?
| Material | Etchant | Rate (nm/min) | Anisotropy | Selective to | Selectivity | Origin and Notes |
|---|---|---|---|---|---|---|
| KNI CHA Al | Al Etch Type D | ~1000 | Highly | Al | High | Matches Transene's expected rate |
| KNI PECVD SiO2 | HF | ~1000 | Highly | SiO2 | High | measured 10/19 |
| KNI PECVD SiN3 | Ex | ~1000 | Highly | SiN3 | High | measured 10/19 |
| KNI PECVD a-Si | KOH | ~1000 | Highly | Si | High | Link to KNI member's research paper |
Other Procedures
Liftoff
Electroplating
Safety Resources
Do we have materials to link to?
https://cleanroom.byu.edu/acid_safety