Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD: Revision history

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22 January 2026

  • curprev 22:2022:20, 22 January 2026‎ Tkimoto talk contribs‎ 5,180 bytes +5,180‎ Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = PECVD |HeaderColor = #F2682A |ImageOne = PECVD_Oxford-System-100.jpg |ImageTwo = |InstrumentType = Deposition |RoomLocation = B235 Steele |LabPhone = 626-395-1532 |PrimaryStaff = Kelly McKenzie |StaffEmail = kmmckenz@caltech.edu |StaffPhone = 626-395-5732 |Manufacturer = Oxford Instruments |Model = PlasmaPro System 100 |Techniques = Amorphous Silicon Deposition,<br>Silicon Dioxide Depositio..."
Retrieved from "https://lab.kni.caltech.edu/Oxide/Nitride_Deposition:_Oxford_Instruments_PlasmaPro_System_100_PECVD"