Difference between revisions of "Wet Chemistry"

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==Facilities==
==Facilities==


'''Wet Benches inside the Wet Chemistry Room:'''
'''Wet Benches in the Wet Chemistry Room:'''


*ACID BENCH: Personal Protective Equipment required to be worn.
*ACID BENCH: Personal Protective Equipment required to be worn. OKAY TO STORE ACID GLOVES ON TOP
*BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn.
*BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn. OKAY TO STORE ACID GLOVES ON TOP
*ELECTROPLATING BENCH:  Personal Protective Equipment required to be worn.
*ELECTROPLATING BENCH:  Personal Protective Equipment required to be worn.
*HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn.
*HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn. OKAY TO STORE ACID GLOVES ON TOP
*KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
*KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
*SOLVENTS BENCH:  Double Nitrile Gloves and Safety Glasses required to be worn.
*SOLVENTS BENCH:  Double Nitrile Gloves and Safety Glasses required to be worn.
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'''------>  Note:  Personal Protective Equipment or "PPE" consists of:'''
'''------>  Note:  Personal Protective Equipment or "PPE" consists of:'''
*1)  Acid Resistant Apron (Green) - PUT ON FIRST, Remove Last
*1)  Acid Resistant Apron (Green) - PUT ON FIRST, Remove Last
*2)  Face Shield  - PUT ON SECOND, Remove Second
*2)  Face Shield  (WITH SAFETY GLASSES) - PUT ON SECOND, Remove Second
*3)  Trionic E-194 Tripoly Acid Resistant Gloves - PUT ON LAST, Remove First
*3)  Trionic E-194 Tripoly Acid Resistant Gloves - PUT ON LAST, Remove First
Write Name and Date on the cuff of both Trionic gloves when opening package.
Write NAME and DATE on both Trionic gloves when opening package.  Acid gloves typically last 2 weeks.  INSPECT BEFORE EACH USE.




'''Wet Benches inside the Optical Lithography Room:'''
'''Wet Bench in the Optical Lithography Room:'''
*DEVELOP BENCH: BASE/CAUSTIC processing only. Double Nitrile Gloves and Safety Glasses required to be worn.  Solvent Develop must be done on the SOLVENT BENCH in the Wet Chemistry Room.
*DEVELOP BENCH (base/caustic):  Double Nitrile Gloves and Safety Glasses required to be worn.   
'''Available Fume Hoods inside the Optical Lithography Room:'''
**Solvent Develop (SU8 developer) must be performed on the SOLVENT BENCH in the Wet Chemistry Room.
*SPINNER BENCH: Laurell 1 (SU8 only), Laurell 2 (Positive,nLOF SPR), and Headway Spinner (Large Substrates and special Coatings) Solvent Hood.
'''Fumed Hoods inside the Optical Lithography Room:'''
*HOT PLATE BENCH:  Torrey Pines Scientific hot plate(programable up to 350C), Two - Fairweather TPS88 hot plates(Non-Programable up to 150C) Solvent Hood.
*SPINNER BENCH (solvent hood): Laurell 1 (SU8 only), Laurell 2 (Positive,nLOF SPR), and Headway Spinner (Large Substrates and special Coatings)  
*HOT PLATE BENCH (solvent hood):  Torrey Pines Scientific hot plate(programable up to 350C), Two - Fairweather TPS88 hot plates(Non-Programable up to 150C) Solvent Hood.


'''Wet Benches located inside the E-beam Lithography Area:'''
'''Wet Bench in the E-beam Lithography Area:'''
*DEVELOP and SPINNER BENCH: SOLVENT processing only. Double Nitrile Gloves and Safety Glasses required to be worn.
*DEVELOP and SPINNER BENCH (solvent bench):  Double Nitrile Gloves and Safety Glasses required to be worn.
'''Hazardous Waste Handling:'''
'''Hazardous Waste Storage:'''
*AUTOMATIC BOTTLE WASHER:  Located inside the Wet Chemistry Room
*AUTOMATIC BOTTLE WASHER:  Located inside the Wet Chemistry Room
*SATELLITE ACCUMULATION AREA:  For storage of TAGGED FULL WASTE BOTTLES, the cart is located in the Oxford Chase next to the Water Chiller.  There is a bin on the floor next to the cart for storage of "DOUBLE BAGGED AND TAGGED" waste which can also be used for TAGGED ITEMS that do not fit inside the cart.
*SATELLITE ACCUMULATION AREA:  Located in the Oxford Chase next to the Water Chiller.   
**STORAGE CART for storage of TAGGED full waste bottles.
**STORAGE BIN (next to the cart) is for "DOUBLE BAGGED AND TAGGED" waste which can also be used for TAGGED containers that do not fit inside the cart.


== Chemistry Procedures and Safety ==
== Chemistry Procedures and Safety ==

Revision as of 17:58, 19 May 2022

Wet Chemistry
Wet-Chemistry Solvents-and-HF.jpg
Instrument Type Wet Chemistry
Techniques Wet Chemical Processing:
Acids, Bases, Solvents,
and Electroplating
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Reserve time on LabRunr
Request training by email
Sign up for Chemistry email list
Lab Location B211 Steele
Lab Phone 626-395-1538
Manufacturer NA
Model NA

Facilities

Wet Benches in the Wet Chemistry Room:

  • ACID BENCH: Personal Protective Equipment required to be worn. OKAY TO STORE ACID GLOVES ON TOP
  • BASE/CAUSTIC BENCH: Personal Protective Equipment required to be worn. OKAY TO STORE ACID GLOVES ON TOP
  • ELECTROPLATING BENCH: Personal Protective Equipment required to be worn.
  • HF ACID BENCH (Hydrofluoric Acid): Personal Protective Equipment required to be worn. OKAY TO STORE ACID GLOVES ON TOP
  • KOH BENCH (Potassium Hydroxide): Personal Protective Equipment required to be worn.
  • SOLVENTS BENCH: Double Nitrile Gloves and Safety Glasses required to be worn.

------> Note: Personal Protective Equipment or "PPE" consists of:

  • 1) Acid Resistant Apron (Green) - PUT ON FIRST, Remove Last
  • 2) Face Shield (WITH SAFETY GLASSES) - PUT ON SECOND, Remove Second
  • 3) Trionic E-194 Tripoly Acid Resistant Gloves - PUT ON LAST, Remove First

Write NAME and DATE on both Trionic gloves when opening package. Acid gloves typically last 2 weeks. INSPECT BEFORE EACH USE.


Wet Bench in the Optical Lithography Room:

  • DEVELOP BENCH (base/caustic): Double Nitrile Gloves and Safety Glasses required to be worn.
    • Solvent Develop (SU8 developer) must be performed on the SOLVENT BENCH in the Wet Chemistry Room.

Fumed Hoods inside the Optical Lithography Room:

  • SPINNER BENCH (solvent hood): Laurell 1 (SU8 only), Laurell 2 (Positive,nLOF SPR), and Headway Spinner (Large Substrates and special Coatings)
  • HOT PLATE BENCH (solvent hood): Torrey Pines Scientific hot plate(programable up to 350C), Two - Fairweather TPS88 hot plates(Non-Programable up to 150C) Solvent Hood.

Wet Bench in the E-beam Lithography Area:

  • DEVELOP and SPINNER BENCH (solvent bench): Double Nitrile Gloves and Safety Glasses required to be worn.

Hazardous Waste Storage:

  • AUTOMATIC BOTTLE WASHER: Located inside the Wet Chemistry Room
  • SATELLITE ACCUMULATION AREA: Located in the Oxford Chase next to the Water Chiller.
    • STORAGE CART for storage of TAGGED full waste bottles.
    • STORAGE BIN (next to the cart) is for "DOUBLE BAGGED AND TAGGED" waste which can also be used for TAGGED containers that do not fit inside the cart.

Chemistry Procedures and Safety

Chemical Safety Data Sheet Lists

Requesting New Chemicals

NEVER bring in any chemicals into the KNI Lab before receiving an approval through email that your chemical has been allowed to be used inside the lab.

  • Always thoroughly review the SAFETY DATA SHEET of the new chemical being requested BEFORE submitting a request.
  • Submit the request through email to the KNI Lab Safety Officer - Bert Mendoza
  • Email should include:
    • (1) SAFETY DATA SHEET (attached) from manufacture.
    • (2) PROCESS DESCRIPTION - a detailed description of the process and how the chemical will be used.
    • (3) AMOUNT OR QUANTITY of chemical to be brought into the KNI Lab.
  • The KNI Lab provides many chemicals for processing. If the requested chemical will improve your process and can be valuable to other members, include the reasons in the request. Staff may decide it would be beneficial to provide the new chemical for all members and add it to the Chemicals Provided by the KNI with typical SDS list.
  • If the chemical is unique to your process, you will be required to supply the chemical and the chemical will be added to the Approved Chemicals with typical SDS list.