Difference between revisions of "Usage Rates"

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 2: Line 2:


NOTE:  
NOTE:  
* Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members are inclusive of FY19 Caltech F&A ("overhead") fees.  
* Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members are inclusive of FY19 Caltech F&A (i.e. "overhead") fees.  
* Individual Tools listed below are charged by the hour or portion thereof.
* Individual Tools listed below are charged by the hour or portion thereof.
* Precious Metal Usage (e.g. Au, Pt, etc.) is billed by the gram or portion thereof. The market prices are passed on to users and do not include Caltech overhead.
* Precious Metal Usage (e.g. Au, Pt, etc.) is billed by the gram or portion thereof. The market prices are passed on to users and do not include Caltech overhead.
Line 14: Line 14:
!scope="col" style="text-align:center; width: 19%"| JPL/Non-Caltech Acad/Govt Rate
!scope="col" style="text-align:center; width: 19%"| JPL/Non-Caltech Acad/Govt Rate
!scope="col" style="text-align:center; width: 16%" | Corporate Rate**
!scope="col" style="text-align:center; width: 16%" | Corporate Rate**
{{UsageRateTableItem|
|EquipmentName = EBPG 5000+
|EquipmentCategory = Lithography
|CaltechRate = 62.00
|JPLNonCaltechAcadGovtRate = 101.99
|CorporateRate = 152.99
}}
{{UsageRateTableItem|
|EquipmentName = EBPG 5200
|EquipmentCategory = Lithography
|CaltechRate = 62.00
|JPLNonCaltechAcadGovtRate = 101.99
|CorporateRate = 152.99
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Contact Mask Aligners
|EquipmentName = Contact Mask Aligners
Line 29: Line 43:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Electron Beam Pattern Generator (EBPG 5000+)
|EquipmentName = Nanoscribe 3D Printer
|EquipmentCategory = Lithography
|EquipmentCategory = Lithography
|CaltechRate = 62.00
|CaltechRate = 8.00
|JPLNonCaltechAcadGovtRate = 101.99
|JPLNonCaltechAcadGovtRate = 13.16
|CorporateRate = 152.99
|CorporateRate = 19.74
}}
{{UsageRateTableItem|
|EquipmentName = Evaporator: Metals & Oxides (CHA)
|EquipmentCategory = Deposition
|CaltechRate = 24.00
|JPLNonCaltechAcadGovtRate = 39.48
|CorporateRate = 59.22
}}
{{UsageRateTableItem|
|EquipmentName =  Evaporator: Al, Au, Pt & Ti (Labline)
|EquipmentCategory = Deposition
|CaltechRate = 24.00
|JPLNonCaltechAcadGovtRate = 39.48
|CorporateRate = 59.22
}}
{{UsageRateTableItem|
|EquipmentName = Sputter: Chalcogenide Material
|EquipmentCategory = Deposition
|CaltechRate = 70.00
|JPLNonCaltechAcadGovtRate = 115.15
|CorporateRate = 172.73
}}
{{UsageRateTableItem|
|EquipmentName = Sputter: Dielectric Material
|EquipmentCategory = Deposition
|CaltechRate = 37.00
|JPLNonCaltechAcadGovtRate = 60.87
|CorporateRate = 91.30
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Electron Beam Pattern Generator (EBPG 5200)
|EquipmentName = Atomic Layer Deposition
|EquipmentCategory = Lithography
|EquipmentCategory = Deposition
|CaltechRate = 62.00
|CaltechRate = 67.00
|JPLNonCaltechAcadGovtRate = 101.99
|JPLNonCaltechAcadGovtRate = 110.22
|CorporateRate = 152.99
|CorporateRate = 165.32
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Two-Photon Lithography ("Microscale 3D Printing")
|EquipmentName = PECVD
|EquipmentCategory = Lithography
|EquipmentCategory = Deposition
|CaltechRate = 8.00
|CaltechRate = 67.00
|JPLNonCaltechAcadGovtRate = 13.16
|JPLNonCaltechAcadGovtRate = 110.22
|CorporateRate = 19.74
|CorporateRate = 165.32
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Etcher: Dielectric Material ("380")
|EquipmentName = Silicon Etcher (DRIE)
|EquipmentCategory = Etching
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
Line 57: Line 99:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Etcher: III/V Material, Metal & Silicon
|EquipmentName = Silicon, III/V & Organics Etcher
|EquipmentCategory = Etching
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
Line 64: Line 106:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Etcher: Silicon (DRIE)
|EquipmentName = Dielectric Etcher
|EquipmentCategory = Etching
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
Line 71: Line 113:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Etcher: Silicon, III/V Material & Organics (RIE)
|EquipmentName = III/V, Metal & Silicon Etcher
|EquipmentCategory = Etching
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
Line 78: Line 120:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Etcher: XeF<sub>2</sub> for Silicon
|EquipmentName = XeF<sub>2</sub> Etcher for Silicon
|EquipmentCategory = Etching
|EquipmentCategory = Etching
|CaltechRate = 50.00
|CaltechRate = 50.00
Line 85: Line 127:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = Atomic Layer Deposition
|EquipmentName = ORION NanoFab He/Ne/Ga-FIB
|EquipmentCategory = Deposition
|CaltechRate = 67.00
|JPLNonCaltechAcadGovtRate = 110.22
|CorporateRate = 165.32
}}
{{UsageRateTableItem|
|EquipmentName =  E-beam Evaporator: Metals Al, Au, Pt & Ti (Lesker Labline)
|EquipmentCategory = Deposition
|CaltechRate = 24.00
|JPLNonCaltechAcadGovtRate = 39.48
|CorporateRate = 59.22
}}
{{UsageRateTableItem|
|EquipmentName = E-beam Evaporator: Metals & Oxides  (CHA)
|EquipmentCategory = Deposition
|CaltechRate = 24.00
|JPLNonCaltechAcadGovtRate = 39.48
|CorporateRate = 59.22
}}
{{UsageRateTableItem|
|EquipmentName = Plasma-Enhanced Chemical Vapor Deposition
|EquipmentCategory = Deposition
|CaltechRate = 67.00
|JPLNonCaltechAcadGovtRate = 110.22
|CorporateRate = 165.32
}}
{{UsageRateTableItem|
|EquipmentName = Sputter: Chalcogenide Material
|EquipmentCategory = Deposition
|CaltechRate = 70.00
|JPLNonCaltechAcadGovtRate = 115.15
|CorporateRate = 172.73
}}
{{UsageRateTableItem|
|EquipmentName = Sputter: Dielectric Material
|EquipmentCategory = Deposition
|CaltechRate = 37.00
|JPLNonCaltechAcadGovtRate = 60.87
|CorporateRate = 91.30
}}
{{UsageRateTableItem|
|EquipmentName = He/Ne/Ga-FIB (ORION)
|EquipmentCategory = Microscopy, Lithography
|EquipmentCategory = Microscopy, Lithography
|CaltechRate = 65.00
|CaltechRate = 65.00
Line 134: Line 134:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = SEM, Ga-FIB & Omniprobe (Nova 600)
|EquipmentName = Nova 600 SEM/Ga-FIB
|EquipmentCategory = Microscopy
|EquipmentCategory = Microscopy
|CaltechRate = 65.00
|CaltechRate = 65.00
Line 141: Line 141:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = SEM, EDS & WDS (Nova 200)
|EquipmentName = Nova 200 SEM/EDS/EDS
|EquipmentCategory = Microscopy
|EquipmentCategory = Microscopy
|CaltechRate = 65.00
|CaltechRate = 65.00
Line 148: Line 148:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = SEM & EDS (Sirion)
|EquipmentName = Sirion SEM/EDS
|EquipmentCategory = Microscopy
|EquipmentCategory = Microscopy
|CaltechRate = 39.00
|CaltechRate = 39.00
Line 155: Line 155:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = SEM & NPGS (Quanta)
|EquipmentName = Quanta SEM/NPGS
|EquipmentCategory = Microscopy, Lithography
|EquipmentCategory = Microscopy, Lithography
|CaltechRate = 39.00
|CaltechRate = 39.00
Line 162: Line 162:
}}
}}
{{UsageRateTableItem|
{{UsageRateTableItem|
|EquipmentName = TEM, STEM, EDS & HAADF (TF-30)
|EquipmentName = Tecnai TF-30 TEM/STEM
|EquipmentCategory = Microscopy
|EquipmentCategory = Microscopy
|CaltechRate = 97.00
|CaltechRate = 97.00
Line 201: Line 201:
The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:
The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:


Profilometers, Chemical Wet Benches, Dynatex GST-150 Scriber Breaker, J.A. Woolam Spectroscopic Ellipsometer M-2000, TF20 TEM, GCA 6300 Stepper, Rapid Thermal Processor, Paratech Parylene Coater, Suss SB6L Wafer Bonder, Westbond Wire Bonder, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (gowning, chemicals, equipment reservation software, etc.).
Profilometers, Chemical Wet Benches, GST-150 Scriber-Breaker, M-2000 Spectroscopic Ellipsometer, Tecnai TF-20 TEM, GCA 6300 Stepper, Rapid Thermal Processor, Parylene Coater, SB6L Wafer Bonder, Wire Bonder, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (e.g. gowning, chemicals, equipment reservation software, etc.).


==**Corporate Memberships==
==**Corporate Memberships==


For full information on the KNI's corporate membership plan, please send an email to tkimoto@caltech.edu with details regarding: the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.
For full information on the KNI's corporate membership plan, please send an email to tkimoto@caltech.edu with details regarding the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.

Revision as of 20:03, 7 May 2019

The rates below are valid beginning October 2018 and are subject to change.

NOTE:

  • Rates for JPL, Non-Caltech Academic, Government, and Corporate KNI lab members are inclusive of FY19 Caltech F&A (i.e. "overhead") fees.
  • Individual Tools listed below are charged by the hour or portion thereof.
  • Precious Metal Usage (e.g. Au, Pt, etc.) is billed by the gram or portion thereof. The market prices are passed on to users and do not include Caltech overhead.

Equipment Rates

Name Category Caltech Rate JPL/Non-Caltech Acad/Govt Rate Corporate Rate**
EBPG 5000+
Lithography
$62.00
$101.99
$152.99
EBPG 5200
Lithography
$62.00
$101.99
$152.99
Contact Mask Aligners
Lithography
$36.00
$59.22
$88.83
Direct-Write Laser System (DWL-66)
Lithography
$47.00
$77.32
$115.97
Nanoscribe 3D Printer
Lithography
$8.00
$13.16
$19.74
Evaporator: Metals & Oxides (CHA)
Deposition
$24.00
$39.48
$59.22
Evaporator: Al, Au, Pt & Ti (Labline)
Deposition
$24.00
$39.48
$59.22
Sputter: Chalcogenide Material
Deposition
$70.00
$115.15
$172.73
Sputter: Dielectric Material
Deposition
$37.00
$60.87
$91.30
Atomic Layer Deposition
Deposition
$67.00
$110.22
$165.32
PECVD
Deposition
$67.00
$110.22
$165.32
Silicon Etcher (DRIE)
Etching
$50.00
$82.25
$123.38
Silicon, III/V & Organics Etcher
Etching
$50.00
$82.25
$123.38
Dielectric Etcher
Etching
$50.00
$82.25
$123.38
III/V, Metal & Silicon Etcher
Etching
$50.00
$82.25
$123.38
XeF2 Etcher for Silicon
Etching
$50.00
$82.25
$123.38
ORION NanoFab He/Ne/Ga-FIB
Microscopy, Lithography
$65.00
$106.93
$160.39
Nova 600 SEM/Ga-FIB
Microscopy
$65.00
$106.93
$160.39
Nova 200 SEM/EDS/EDS
Microscopy
$65.00
$106.93
$160.39
Sirion SEM/EDS
Microscopy
$39.00
$64.16
$96.23
Quanta SEM/NPGS
Microscopy, Lithography
$39.00
$64.16
$96.23
Tecnai TF-30 TEM/STEM
Microscopy
$97.00
$159.57
$239.35
Atomic Force Microscope (AFM)
Microscopy
$41.00
$67.45
$101.17
Critical Point Dryer
Support Tools
$54.00
$88.83
$133.25
Tube Furnaces
Support Tools
$5.00
$8.23
$12.34
Monthly Base Rate*
General Equipment*
$655.00
$1,077.48
$1,616.21

*Monthly Base Rate

The Monthly Base Rate is a flat fee charged per user, per month. It includes the use of:

Profilometers, Chemical Wet Benches, GST-150 Scriber-Breaker, M-2000 Spectroscopic Ellipsometer, Tecnai TF-20 TEM, GCA 6300 Stepper, Rapid Thermal Processor, Parylene Coater, SB6L Wafer Bonder, Wire Bonder, additional optical microscopes, related metrology, miscellaneous support tools and general supplies (e.g. gowning, chemicals, equipment reservation software, etc.).

**Corporate Memberships

For full information on the KNI's corporate membership plan, please send an email to tkimoto@caltech.edu with details regarding the number of people looking to join as KNI lab members, equipment needs, anticipated start date, and information about the company. Startup companies may qualify for limited-term reduced rates.