Difference between revisions of "Process Recipe Library"
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* [https://caltech.box.com/s/lstv8e5zy94fnt3o0y7urfw41mpesd38 Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns] | * [https://caltech.box.com/s/lstv8e5zy94fnt3o0y7urfw41mpesd38 Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns] | ||
**[https://caltech.box.com/s/59upcnvhlqulnazm51b0dihd942xebn3 All Resources for SAED Evaluation, including DPs captured of standard samples] | **[https://caltech.box.com/s/59upcnvhlqulnazm51b0dihd942xebn3 All Resources for SAED Evaluation, including DPs captured of standard samples] | ||
===== Thermal Processing ===== | |||
* [https://caltech.box.com/s/nqiiqwlhip4dcult2mtuvvdlxw0gv086 Wet Oxidation at 1000C on Tystar Tube Furnaces] | |||
== Multi-Technique Fabrication Processes == | == Multi-Technique Fabrication Processes == | ||
* [https://caltech.box.com/s/ohm3fp2h3203yxi6j8peo8bf4v1mz0yt Si-W notched nanopillar fabrication] | * [https://caltech.box.com/s/ohm3fp2h3203yxi6j8peo8bf4v1mz0yt Si-W notched nanopillar fabrication] |
Revision as of 19:46, 11 March 2020
You can browse the available recipes below, by lab area. You can also browse directly within the KNI's Box directory. Note that the vast majority of recipes are being made publicly available; only a select few are password-protected for members of the Caltech community:
- All Content (requires login with a caltech.edu email address)
- Publicly available content (no login required)
Lithography Process Recipes
Electron Beam Lithography
- KNI Introduction to BEAMER
- How to Spin Photoresist onto Wafers and Pieces (Video)
- ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
- HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
- Performing Aligned EBL Patterning Steps with NPGS on an SEM | Alignment Template Files
- Bi-Layer PMMA Resist Spinning Recipe
Helium Ion Beam Lithography
Neon Ion Beam Lithography
Optical Lithography
- AZ5214 Photoresist spinning procedure
- AZ9260 Photoresist spinning procedure
- AZ nLof 2000 Photoresist Recipe
- S1813 Photoresist spinning procedure
Deposition Process Recipes
Sputtering
- SnO2 sputtering recipe
- NbOx sputtering recipe
- TiO2 sputtering recipe
- AlN sputtering recipe
- Al2O3 sputtering recipe
- Guide to maintaining a plasma using gradual pressure changes
Chemical Vapor Deposition (CVD)
Etching Process Recipes
Dry Etching
- Aluminum Etch via Chlorine/Methane/Hydrogen
- Comparison of etch rates using different sample-fixing oils
- In-situ (dielectric sputter) RF plasma etch of thermal SiO2
- Comparison of Pseudo-Bosch ICP-RIE Etch of SiO2-SiNx
Wet Etching
Microscopy Process Recipes
Focused Ion Beam (FIB) Systems
- Cutting & Imaging Cross-sections with SEM/Ga-FIB
- Preparing TEM Lamella Samples with SEM/Ga-FIB
- Helium Ion Beam Lithography (HIBL) – Parameter Guide
- Ne-FIB Hard Mask Lithography on ALD Films – Parameter Guide
- Helium Ion Beam Imaging with the Electron Flood Gun – Parameter Guide
- Source Rebuild Guide for ORION NanoFab He- & Ne-FIB
Scanning Electron Microscopes (SEMs)
- Environmental SEM (ESEM) Imaging Guide (for biological and highly non-conductive specimens)
- Performing Aligned EBL Patterning Steps with NPGS on an SEM | Alignment Template Files
Transmission Electron Microscopes (TEMs)
- STEM mode EDS on TF-20 TEM (emphasis on high-resolution 2D mapping)
- Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns