Difference between revisions of "Matthew S. Hunt, PhD"

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== About ==
== About ==
===== Role in the KNI =====
===== Role in the KNI =====
Matthew Hunt is the Assistant Director of Staff Research and Lead Microscopist for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He directs research projects that are carried out by KNI technical staff, in collaboration with Caltech & non-Caltech PIs and student researchers, with the purpose of creating new nanofabrication techniques using the KNI's leading edge instrumentation. He also manages the KNI's suite of microscopy equipment transmission electron microscopes, scanning electron microscopes, focused ion beam systems, an atomic force microscope, and related sample preparation equipment.
Matthew Hunt is the Assistant Director of Staff Research and Lead Microscopist for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He directs research projects that are carried out by KNI technical staff, in collaboration with Caltech & non-Caltech PIs and student researchers, with the purpose of creating new nanofabrication techniques using the KNI's leading edge instrumentation. He leads the scientific side of the [https://kni.caltech.edu/surf-the-wave KNI SURF-the-WAVE Fellowships Program], which offers summer fellowships to non-Caltech undergraduate researchers, and also leads the [https://kni.caltech.edu/programs/resident-experts Lab Resident Expert Program], which provides top lab users an opportunity to give back to the lab in the form of process recipe development and new ideas for general lab improvement. Matt also manages – and teaches users how to operate – the KNI's suite of microscopy equipment: transmission electron microscopes, scanning electron microscopes, focused ion beam systems, an atomic force microscope, and related sample preparation equipment.


Matt joined the KNI in 2014 after completing his PhD related to the high temperature oxidation of turbine engine materials, through which he developed expertise in a number of electron, ion and x-ray microscopy techniques. His research interests lie in the development of new lithography and microscopy techniques that utilize various beam species (e.g. helium ions, neon ions, gallium ions, electrons) and the application thereof to the kinds of novel materials and devices that are important to users of the KNI.
Matt joined the KNI in 2014 after completing his PhD related to the high temperature oxidation of turbine engine materials, through which he developed expertise in a number of electron, ion and x-ray microscopy techniques. His research interests lie in the development of new lithography and microscopy techniques that utilize various beam species (e.g. helium ions, neon ions, gallium ions, electrons) and the application thereof to the kinds of novel materials and devices that are important to users of the KNI.
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== Lecture Materials ==
== Lecture Materials ==
[[Image:SEM-FEG Ga-FIB-LMIS and He,Ne-FIB-GFIS Sources.png|thumb|top|upright=1.25|A slide from the microscopy presentations showing schematics of the three emission sources – a field emission gun (FEG) for an SEM, a liquid metal ion source (LMIS) for a Ga-FIB, and a gas field ion source (GFIS) for a He/Ne-FIB]]
[[Image:SEM-FEG Ga-FIB-LMIS and He,Ne-FIB-GFIS Sources.png|thumb|top|upright=1.25|A slide from the microscopy presentations showing schematics of three emission sources – a field emission gun (FEG) for an SEM, a liquid metal ion source (LMIS) for a Ga-FIB, and a gas field ion source (GFIS) for a He- & Ne-FIB]]
===== Microscopy Presentations =====
===== Microscopy Presentations =====
* [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Scanning Electron Microscopy: Principles, Techniques & Applications]
* [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Scanning Electron Microscopy: Principles, Techniques & Applications] | [https://youtu.be/Zh21tp3aPEw YouTube Lecture]
* [https://caltech.box.com/s/f4k8jan85n5lf6f2tutjx4rkfzjq7y68 Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications]
* [https://caltech.box.com/s/f4k8jan85n5lf6f2tutjx4rkfzjq7y68 Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications] | [https://youtu.be/3eSzisbNcGo YouTube Lecture]
* [https://caltech.box.com/s/ibe1nt5rd1u2kmvnfbjs2dj9lg28mch7 Helium & Neon Focused Ion Beam Microscopy: Principles, Techniques & Applications]
* [https://caltech.box.com/s/ibe1nt5rd1u2kmvnfbjs2dj9lg28mch7 Helium & Neon Focused Ion Beam Microscopy: Principles, Techniques & Applications] | [https://youtu.be/JXS3K8G2CVY YouTube Lecture]
 
===== Video Demonstrations =====
===== Video Demonstrations =====
* SEM & Ga-FIB Alignments ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOmXs6r-6kayl6ncR4lKPJAr Playlist])
* SEM & Ga-FIB Alignments ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOmXs6r-6kayl6ncR4lKPJAr Playlist])
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* Helium & Neon Ion Microscopy Alignments & Techniques ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOl80BSOR7I6yVP5fzzX0lws Playlist])
* Helium & Neon Ion Microscopy Alignments & Techniques ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOl80BSOR7I6yVP5fzzX0lws Playlist])
* Preparing a gas field ion source (GFIS) trimer for He- & Ne-FIB ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOlOckuecIhAau_2LAqU0FzL Playlist])
* Preparing a gas field ion source (GFIS) trimer for He- & Ne-FIB ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOlOckuecIhAau_2LAqU0FzL Playlist])
* Introduction to AFM ([https://www.youtube.com/playlist?list=PL7Lb5X_YIzOkKijCVBCfpfpR8Jyw02q17 Playlist])


== Selected Publications ==
== Selected Publications ==
[[Image:Use-of-Supramolecular-Assemblies-as-Lithographic-Resists Fig3d-f.png|thumb|upright=1.25|Figure 3e-f from "Use of Supramolecular Assemblies as Lithographic Resists," depicting (d) lines of resist written with 30 keV electrons on silicon, followed by (e) 210 second ICP-RIE etch and (f) removal of the remaining resist to leaving 36:1 aspect ratio silicon fins. https://doi.org/10.1002/anie.201700224]]
===== Articles =====
[[Image:Plasma-Etched-Pattern-Transfer-of-Sub-10-nm-Structures Fig 4a-c.jpg|thumb|upright=1.25|Figure 4a-c from "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," depicting 5.4 nm wide lines of resist, spaced 17 nm apart, written with 35 keV helium ions on silicon, shown before etch in (a) plan view and (b) tilted view, then (c) after etch in titled view. All images were captured using 30 keV helium ion microscopy. As of publication in 2019, these represent the smallest features ever reactive-ion-etched into silicon, setting a new record for one of the world’s foremost nanofabrication benchmarks. https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911]]
* Scott M. Lewis, '''Matthew S. Hunt''', Guy A. DeRose, Hayden R. Alty, Jarvis Li, Alex Wertheim, Lucia De Rose, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, and Richard E. P. Winpenny, "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," ''ACS Nano Letters'' 2019, available online: https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911.
* Scott M. Lewis, '''Matthew S. Hunt''', Guy A. DeRose, Hayden R. Alty, Jarvis Li, Alex Wertheim, Lucia De Rose, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, and Richard E. P. Winpenny, "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," ''ACS Nano Letters'' 2019, available online: https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911.
* Scott M. Lewis, Guy A. DeRose, '''Matthew S. Hunt''', Hayden Alty, Alex Werthiem, Jarvis Li, Trevor Fowler, Axel Scherer, Stepen G. Yeates, Richard E. P. Winpenny ''et al'', "Design and Implementation of the Next Generation Electron Beam Resists for the Production of EUVL Photomasks," ''Photomask Technology 2018'', p 24. https://doi.org/10.1117/12.2501808.
* Scott M. Lewis, Guy A. DeRose, '''Matthew S. Hunt''', Hayden Alty, Alex Wertheim, Jarvis Li, Trevor Fowler, Axel Scherer, Stepen G. Yeates, Richard E. P. Winpenny ''et al'', "Design and Implementation of the Next Generation Electron Beam Resists for the Production of EUVL Photomasks," ''Photomask Technology'' 2018, p 24. https://doi.org/10.1117/12.2501808.
* Scott M. Lewis, Antonio Fernandez, Guy A. DeRose, '''Matthew S. Hunt''', Axel Scherer, Stephen G. Yeates, Richard E. P. Winpenny ''et al'', "Use of Supramolecular Assemblies as Lithographic Resists," ''Angew. Chem. Int. Ed.'' 2017, 56 (24), 6749–6752. https://doi.org/10.1002/anie.201700224.
* Scott M. Lewis, Antonio Fernandez, Guy A. DeRose, '''Matthew S. Hunt''', Axel Scherer, Stephen G. Yeates, Richard E. P. Winpenny ''et al'', "Use of Supramolecular Assemblies as Lithographic Resists," ''Angew. Chem. Int. Ed.'' 2017, 56 (24), 6749–6752. https://doi.org/10.1002/anie.201700224.
* '''Matthew (Sullivan) Hunt''', Daniel R. Mumm, "Transient stage oxidation of MCrAlY bond coat alloys in high temperature, high water vapor content environments," ''Surface and Coatings Technology'' 2014, Vol 258, 963-972. https://doi.org/10.1016/j.surfcoat.2014.07.048
* '''Matthew (Sullivan) Hunt''', Daniel R. Mumm, "Transient stage oxidation of MCrAlY bond coat alloys in high temperature, high water vapor content environments," ''Surface and Coatings Technology'' 2014, Vol 258, 963-972. https://doi.org/10.1016/j.surfcoat.2014.07.048
* '''Matthew (Sullivan) Hunt''', Daniel R. Mumm, "Vapor-Phase-Mediated Phenomena Associated with High Temperature, High Water Content Oxidation of MCrAlX Bond Coats," ''Oxidation of Metals'' 2014, Vol 82. 1. https://doi.org/10.1007/s11085-014-9473-8
* '''Matthew (Sullivan) Hunt''', Daniel R. Mumm, "Vapor-Phase-Mediated Phenomena Associated with High Temperature, High Water Content Oxidation of MCrAlX Bond Coats," ''Oxidation of Metals'' 2014, Vol 82. 1. https://doi.org/10.1007/s11085-014-9473-8
===== Conference Presentations =====
* [https://caltech.box.com/s/162octh05yaf9zkr4rmuf9wnimb6nk7x "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography,"]  '''Matthew S. Hunt''', Guy A. DeRose, Hayden R. Alty, Alex Wertheim, Nathan S. Lee, Stephen G. Yeates, Richard E. P. Winpenny, Axel Scherer, and Scott M. Lewis. Presented at the EIPBN Conference in Minneapolis, MN on July 31, 2019.
* [https://caltech.box.com/s/4oedg1bzg8i4wt1fh34r5tkzska0a26u "Helium and Neon Focused Ion Beam Hard Mask Lithography on Atomic Layer Deposition Films,"]  '''Matthew S. Hunt''', Joshua Yang, Steven Wood, Nathan S. Lee, and Oskar J. Painter. Presented at the AVS Conference in Long Beach, CA on October 25, 2018.


== List of Managed Instruments ==
== List of Managed Instruments ==
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== Personal ==
== Personal ==
Note that Matt changed his name from Matthew Hunt Sullivan to Matthew Sullivan Hunt in 2015 after getting married (and while working at Caltech).
Note that Matt changed his name from Matthew Hunt Sullivan to Matthew Sullivan Hunt in 2016 after getting married (and while working at Caltech).

Latest revision as of 21:41, 6 July 2022

Matthew S. Hunt, PhD
Matthew-S-Hunt.jpg
Title Assistant Director of
Staff Research
& Lead Microscopist
Responsibilities Microscopy, Lithography,
Staff Research Projects
Email matthew.hunt@caltech.edu
Phone 626-395-5994 (office)
203-470-0861 (cell)
Office 303 Steele

About

Role in the KNI

Matthew Hunt is the Assistant Director of Staff Research and Lead Microscopist for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He directs research projects that are carried out by KNI technical staff, in collaboration with Caltech & non-Caltech PIs and student researchers, with the purpose of creating new nanofabrication techniques using the KNI's leading edge instrumentation. He leads the scientific side of the KNI SURF-the-WAVE Fellowships Program, which offers summer fellowships to non-Caltech undergraduate researchers, and also leads the Lab Resident Expert Program, which provides top lab users an opportunity to give back to the lab in the form of process recipe development and new ideas for general lab improvement. Matt also manages – and teaches users how to operate – the KNI's suite of microscopy equipment: transmission electron microscopes, scanning electron microscopes, focused ion beam systems, an atomic force microscope, and related sample preparation equipment.

Matt joined the KNI in 2014 after completing his PhD related to the high temperature oxidation of turbine engine materials, through which he developed expertise in a number of electron, ion and x-ray microscopy techniques. His research interests lie in the development of new lithography and microscopy techniques that utilize various beam species (e.g. helium ions, neon ions, gallium ions, electrons) and the application thereof to the kinds of novel materials and devices that are important to users of the KNI.

Education

Matt received his Ph.D. and M.S. in Materials Science & Engineering from the University of California, Irvine and a B.S. in Chemical Engineering from the University of Notre Dame.

Lecture Materials

A slide from the microscopy presentations showing schematics of three emission sources – a field emission gun (FEG) for an SEM, a liquid metal ion source (LMIS) for a Ga-FIB, and a gas field ion source (GFIS) for a He- & Ne-FIB
Microscopy Presentations
Video Demonstrations
  • SEM & Ga-FIB Alignments (Playlist)
  • SEM & Ga-FIB Techniques (Playlist)
  • Cutting & Imaging Cross-Sections (Playlist)
  • TEM Lamella Sample Preparation with SEM/Ga-FIB (Playlist)
  • Helium & Neon Ion Microscopy Alignments & Techniques (Playlist)
  • Preparing a gas field ion source (GFIS) trimer for He- & Ne-FIB (Playlist)
  • Introduction to AFM (Playlist)

Selected Publications

Articles
Figure 4a-c from "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," depicting 5.4 nm wide lines of resist, spaced 17 nm apart, written with 35 keV helium ions on silicon, shown before etch in (a) plan view and (b) tilted view, then (c) after etch in titled view. All images were captured using 30 keV helium ion microscopy. As of publication in 2019, these represent the smallest features ever reactive-ion-etched into silicon, setting a new record for one of the world’s foremost nanofabrication benchmarks. https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911
  • Scott M. Lewis, Matthew S. Hunt, Guy A. DeRose, Hayden R. Alty, Jarvis Li, Alex Wertheim, Lucia De Rose, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, and Richard E. P. Winpenny, "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," ACS Nano Letters 2019, available online: https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911.
  • Scott M. Lewis, Guy A. DeRose, Matthew S. Hunt, Hayden Alty, Alex Wertheim, Jarvis Li, Trevor Fowler, Axel Scherer, Stepen G. Yeates, Richard E. P. Winpenny et al, "Design and Implementation of the Next Generation Electron Beam Resists for the Production of EUVL Photomasks," Photomask Technology 2018, p 24. https://doi.org/10.1117/12.2501808.
  • Scott M. Lewis, Antonio Fernandez, Guy A. DeRose, Matthew S. Hunt, Axel Scherer, Stephen G. Yeates, Richard E. P. Winpenny et al, "Use of Supramolecular Assemblies as Lithographic Resists," Angew. Chem. Int. Ed. 2017, 56 (24), 6749–6752. https://doi.org/10.1002/anie.201700224.
  • Matthew (Sullivan) Hunt, Daniel R. Mumm, "Transient stage oxidation of MCrAlY bond coat alloys in high temperature, high water vapor content environments," Surface and Coatings Technology 2014, Vol 258, 963-972. https://doi.org/10.1016/j.surfcoat.2014.07.048
  • Matthew (Sullivan) Hunt, Daniel R. Mumm, "Vapor-Phase-Mediated Phenomena Associated with High Temperature, High Water Content Oxidation of MCrAlX Bond Coats," Oxidation of Metals 2014, Vol 82. 1. https://doi.org/10.1007/s11085-014-9473-8
Conference Presentations

List of Managed Instruments

Microscopy & Lithography
Support Tools for Microscopy

Personal

Note that Matt changed his name from Matthew Hunt Sullivan to Matthew Sullivan Hunt in 2016 after getting married (and while working at Caltech).