|DWL-66 Direct-Write Laser System
The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi (dots per inch) is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.
- Direct Writing
- Grayscale Writing
Labrunr Reservation Rules:
||Advanced Res (days)
||Limit per Res (hrs)
||Limit per week (hrs)
For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.
Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.
Optical Lithography Resources
- Exposure: 442 nm wavelength HeCd laser
Related Instrumentation in the KNI
Electron Beam Lithography
Ion Beam Lithography