Difference between revisions of "CNI-PV 2.1: Nano Imprint Lithography"

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== Specifications ==
== Specifications ==
* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
* UV nanoImprint up to 200 mm wafers
* UV NanoImprint up to 200 mm wafers
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== Related Instrumentation in the KNI ==
== Related Instrumentation in the KNI ==
===== Electron Beam Lithography =====
===== Electron Beam Lithography =====

Revision as of 23:30, 28 September 2020

NIL Technology CNI-PV 2.1 Nano Imprint Lithography System
Instrument Type Lithography
Techniques Thermal and UV Nanoimprint Lithography
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Request training by email
Sign up for kni-photolith email list
Lab Location B217 Steele
Lab Phone 626-395-1536
Manufacturer NIL Technology


Description

The NIL Technology CNI-PV 2.1 Nano Imprint Lithography System is a lithography tool that is used to enable nanoscale printing by thermal or UV exposure of photoresist with an imprint stamp. Vacuum in the imprint chamber is enabled down to 1 micron, and thermal imprint of up to 240°C is available. The system is compatible with UV-cured resists, and has an integral UV light source for those processes. It allows up to 200 mm diameter substrates with UV, or up to 150x150 mm substrates with thermal processing.

Operational Applications
  • Thermal Nano Imprint Lithography
  • UV Nano Imprint Lithography
Scientific / Technical Applications
  • Nanophotonics
  • Nano-optics
  • Waveguides

Resources

Equipment Data
General SOPs
Training Materials
Sample Prep and Writing SOPs
Advanced Troubleshooting SOPs
Data Preparation Resources
Lithography Process Information
Manufacturer Manuals

Specifications

  • Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
  • UV NanoImprint up to 200 mm wafers



Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography